초록 ▼

A system for heating solvents in processing semiconductor wafers has a coiled solvent tube, a coiled cooling water tube, and electric heater elements, cast in place within an aluminum casting. The solvent flows through the solvent tube and is heated by conduction of heat through the casting. The sol

A system for heating solvents in processing semiconductor wafers has a coiled solvent tube, a coiled cooling water tube, and electric heater elements, cast in place within an aluminum casting. The solvent flows through the solvent tube and is heated by conduction of heat through the casting. The solvent is safely isolated from the heating elements. Water is pumped through the cooling water tube, to cool the casting if solvent flow is interrupted, or if the measured casting temperature exceeds a predetermined set point temperature. Solvent temperature is maintained by controlling power to the heating elements based on the measured solvent temperature at the processing chamber.

대표청구항 ▼

1. A machine for processing semiconductor wafers, comprising: a combustible solvent supply; a cooling water supply; a processing chamber; a solvent heater including a solvent coil within the metal block, the solvent coil connecting with the solvent supply and the processing chamber; a cooling

1. A machine for processing semiconductor wafers, comprising: a combustible solvent supply; a cooling water supply; a processing chamber; a solvent heater including a solvent coil within the metal block, the solvent coil connecting with the solvent supply and the processing chamber; a cooling water coil within the metal block, the cooling water coil connecting with the cooling water supply; and at least one heating element in the metal block. 2. The machine of claim 1 further comprising a layer of insulation around the metal block. 3. The machine of claim 2 further comprising a container surrounding the metal block, wherein a purge gas space is provided between the layer of insulation and inner walls of the container. 4. The machine of claim 1 further comprising a container surrounding the metal block, wherein inner walls of the container are separated from the metal block by an air gap. 5. The machine of claim 1 wherein the solvent coil surrounds the cooling water coil. 6. The machine of claim 5 wherein the solvent coil is concentric with a longitudinal axis of the cooling water coil, and where a plurality of solvent heating elements are equally spaced apart around the longitudinal axis of the cooling water coil. 7. The machine of claim 1 wherein the solvent heating element includes a first leg within the cooling coil and a second leg outside of the cooling coil. 8. The machine of claim 1 wherein the metal block comprises a casting and the solvent heating element is cast in place within the metal casting. 9. A machine for processing semiconductor wafers using a combustible solvent, comprising: a combustible solvent supply; a cooling water supply; a processing chamber; a combustible solvent heater having a block of metal; a solvent coil extending through the block of metal and connecting with the solvent supply and an outlet connecting with the processing chamber; a cooling coil extending through the block of metal and having an inlet connecting with the cooling water supply; at least one heating element in the block of metal; a container around the block metal with a purge gas space between the container and the block of metal; and a purge gas supply connecting with the purge gas space.