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Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/00
출원번호 US-0087860 (2002-03-05)
우선권정보 JP-0164695 (2001-05-31)
발명자 / 주소
  • Itoh, Masamitsu
출원인 / 주소
  • Kabushiki Kaisha Toshiba
대리인 / 주소
    Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
인용정보 피인용 횟수 : 25  인용 특허 : 4

초록

There is disclosed a manufacturing method for exposure mask, which comprises acquiring a first information showing surface shape of surface of each of a plurality of mask substrates, and a second information showing the flatness of the surface of each of mask substrates before and after chucked on a

대표청구항

There is disclosed a manufacturing method for exposure mask, which comprises acquiring a first information showing surface shape of surface of each of a plurality of mask substrates, and a second information showing the flatness of the surface of each of mask substrates before and after chucked on a

이 특허에 인용된 특허 (4)

  1. Emery David Garth ; Saidin Zain Kahuna ; Wihl Mark J. ; Fu Tao-Yi ; Zywno Marek ; Kvamme Damon F. ; Fein Michael E., Automated photomask inspection apparatus and method.
  2. Akiyama Nobuyuki (Yokohama JPX) Kembo Yukio (Yokohama JPX) Nakagawa Yasuo (Yokohama JPX) Aiuchi Susumu (Yokohama JPX) Nomoto Mineo (Yokohama JPX), Light exposure device and method.
  3. Kakizaki Yukio,JPX ; Kiuchi Toru,JPX ; Amano Kesayoshi,JPX ; Umatate Toshikazu,JPX, Mask substrate, projection exposure apparatus equipped with the mask substrate, and a pattern formation method utilizing the projection exposure apparatus.
  4. Takekuma Toshitsugu (Ohme JPX) Suzuki Toshio (Hatoyama-machi JPX) Iwai Hidetoshi (Ohme JPX) Ishihara Masamichi (Hamura JPX), Method of making mask pattern data and process for manufacturing the mask.

이 특허를 인용한 특허 (25)

  1. Itoh,Masamitsu, Exposure mask blank manufacturing method and exposure mask manufacturing method.
  2. Itoh, Masamitsu, Exposure mask manufacturing method, drawing apparatus, semiconductor device manufacturing method, and mask blanks product.
  3. Itoh, Masamitsu, Exposure mask manufacturing method, drawing apparatus, semiconductor device manufacturing method, and mask blanks product.
  4. Itoh, Masamitsu, Exposure mask manufacturing method, drawing apparatus, semiconductor device manufacturing method, and mask blanks product.
  5. Yu, Ching-Fang; Hsu, Ting-Hao; Chin, Sheng-Chi, Lithographic photomask with inclined sides.
  6. Itoh, Masamitsu, Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server.
  7. Itoh, Masamitsu, Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server.
  8. Itoh,Masamitsu, Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server.
  9. Itoh,Masamitsu, Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server.
  10. Tanabe, Masaru; Kawaguchi, Atsushi; Akagawa, Hiroyuki; Kawahara, Akihiro, Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing method.
  11. Tanabe, Masaru; Kawaguchi, Atsushi; Akagawa, Hiroyuki; Kawahara, Akihiro, Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing method.
  12. Xiong, Zhiyong; Qian, Dong; Wei, Yunyan, Mask, method for manufacturing the same and process device.
  13. Itoh, Masamitsu, Maunfacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server.
  14. Kuo, Birgie, Mechanism for inter-fab mask process management.
  15. LaFontaine, Bruno M.; Lavolic, Ivan, Method and system for monitoring EUV lithography mask flatness.
  16. Numanami,Tsuneo; Nakatsu,Masayuki; Mogi,Masayuki; Hagiwara,Tsuneyuki; Kondo,Naoto, Method of making photomask blank substrates.
  17. Tanabe, Masaru, Method of manufacturing a substrate for a mask blank, method of manufacturing a mask blank, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device.
  18. Nakatsu,Masayuki; Numanami,Tsuneo; Mogi,Masayuki; Hagiwara,Tsuneyuki; Kondo,Naoto, Method of selecting photomask blank substrates.
  19. Nakatsu,Masayuki; Numanami,Tsuneo; Mogi,Masayuki; Itoh,Masamitsu; Hagiwara,Tsuneyuki; Kondo,Naoto, Method of selecting photomask blank substrates.
  20. Tanabe, Masaru, Methods of manufacturing a mask blank substrate, a mask blank, a photomask, and a semiconductor device.
  21. Tanabe, Masaru, Methods of manufacturing a mask blank substrate, a mask blank, a photomask, and a semiconductor device.
  22. Pikus, Fedor G.; Abercrombie, David A., Model-based design verification.
  23. Nakatsu,Masayuki; Numanami,Tsuneo; Mogi,Masayuki; Itoh,Masamitsu; Hagiwara,Tsuneyuki; Kondo,Naoto, Photomask blank substrate, photomask blank and photomask.
  24. Abe, Tetsuya; Nitta, Yuhei; Kimura, Yukiyasu, Photomask substrate, photomask substrate forming member, photomask substrate fabricating method, photomask, and exposing method that uses the photomask.
  25. Itoh,Masamitsu, Semiconductor device manufacturing method.
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