IPC분류정보
국가/구분 |
United States(US) Patent
등록
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국제특허분류(IPC7판) |
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출원번호 |
US-0782236
(2001-02-13)
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발명자
/ 주소 |
- Dee, Douglas Paul
- Chiang, Robert Ling
- Miller, Edwin John
- Whitley, Roger Dean
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출원인 / 주소 |
- Air Products and Chemicals, Inc.
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대리인 / 주소 |
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인용정보 |
피인용 횟수 :
16 인용 특허 :
15 |
초록
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Pressure swing adsorption process for the recovery of high purity oxygen from a feed gas comprising oxygen, nitrogen, and argon. The process includes a forward flow stage which comprises (a) passing the feed gas into a first adsorption zone containing an adsorbent selective for the adsorption of nit
Pressure swing adsorption process for the recovery of high purity oxygen from a feed gas comprising oxygen, nitrogen, and argon. The process includes a forward flow stage which comprises (a) passing the feed gas into a first adsorption zone containing an adsorbent selective for the adsorption of nitrogen over oxygen and argon, and withdrawing therefrom a nitrogen-depleted intermediate gas; (b) passing the nitrogen-depleted intermediate gas into a second adsorption zone containing an adsorbent which is selective for the adsorption of nitrogen over argon and selective for the adsorption of argon over oxygen; (c) withdrawing an oxygen-enriched product gas from the second adsorption zone; and (d) terminating the passing of feed gas into the first adsorption zone and withdrawing an oxygen-enriched depressurization gas from the second adsorption zone in the same flow direction as (c). During (a) or during (d), nitrogen breakthrough from the first adsorption zone can occur and nitrogen can be adsorbed in the second adsorption zone.
대표청구항
▼
Pressure swing adsorption process for the recovery of high purity oxygen from a feed gas comprising oxygen, nitrogen, and argon. The process includes a forward flow stage which comprises (a) passing the feed gas into a first adsorption zone containing an adsorbent selective for the adsorption of nit
Pressure swing adsorption process for the recovery of high purity oxygen from a feed gas comprising oxygen, nitrogen, and argon. The process includes a forward flow stage which comprises (a) passing the feed gas into a first adsorption zone containing an adsorbent selective for the adsorption of nitrogen over oxygen and argon, and withdrawing therefrom a nitrogen-depleted intermediate gas; (b) passing the nitrogen-depleted intermediate gas into a second adsorption zone containing an adsorbent which is selective for the adsorption of nitrogen over argon and selective for the adsorption of argon over oxygen; (c) withdrawing an oxygen-enriched product gas from the second adsorption zone; and (d) terminating the passing of feed gas into the first adsorption zone and withdrawing an oxygen-enriched depressurization gas from the second adsorption zone in the same flow direction as (c). During (a) or during (d), nitrogen breakthrough from the first adsorption zone can occur and nitrogen can be adsorbed in the second adsorption zone. group; R3and R4,which are identical or different, are each chosen from: a hydrogen atom and halogen atoms; a group Z as defined above; linear and branched, saturated and unsaturated groups containing from 1-20 carbon atoms, optionally substituted with at least one halogen atom, wherein at least one carbon atom is optionally and independently replaced by an oxygen atom, a nitrogen atom, a sulfur atom, or an SO2group, and at least one branch of said branched groups optionally form at least one 3- to 7-membered ring comprising at least one carbon atom, with the provisos that: (i) said R3and said R4do not comprise a group chosen from a peroxide group, a diazo group, a nitro group, and a nitroso group; (ii) said R3and said R4are not a hydroxyl group; and (iii) said R3and said R4are not directly linked to the benzene ring of formula (I) by an --NH--NH-- group; R5is chosen from: a hydrogen atom and halogen atoms; a group Z as defined above; linear and branched, saturated and unsaturated groups containing from 1-20 carbon atoms, optionally substituted with at least one halogen atom, wherein at least one carbon atom is optionally and independently replaced by an oxygen atom, a nitrogen atom, a sulfur atom, or an SO2group, and at least one branch of said branched groups optionally forms at least one 3- to 7-membered ring comprising at least one carbon atom, with the provisos that: (i) said R5does not comprise a group chosen from a peroxide group, a diazo group, a nitro group, and a nitroso group; (ii) said R5is chosen from a group other than a hydroxyl group, a thio group, an amino group, and an optionally substituted sulphonylamino
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