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A method for removing organic contaminants from a semiconductor surface whereby the semiconductor is held in a tank and the tank is filled with a fluid such as a liquid or a gas. Organic contaminants, such as photoresist, photoresidue, and dry etched residue, occur in process steps of semiconductor

A method for removing organic contaminants from a semiconductor surface whereby the semiconductor is held in a tank and the tank is filled with a fluid such as a liquid or a gas. Organic contaminants, such as photoresist, photoresidue, and dry etched residue, occur in process steps of semiconductor fabrication and at times, require removal. The organic contaminants are removed from the semiconductor surface by holding the semiconductor inside a tank. The method is practiced using gas phase processing. The tank is filled with a gas mixture, comprising water vapor and ozone.

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A method for removing organic contaminants from a semiconductor surface whereby the semiconductor is held in a tank and the tank is filled with a fluid such as a liquid or a gas. Organic contaminants, such as photoresist, photoresidue, and dry etched residue, occur in process steps of semiconductor

A method for removing organic contaminants from a semiconductor surface whereby the semiconductor is held in a tank and the tank is filled with a fluid such as a liquid or a gas. Organic contaminants, such as photoresist, photoresidue, and dry etched residue, occur in process steps of semiconductor fabrication and at times, require removal. The organic contaminants are removed from the semiconductor surface by holding the semiconductor inside a tank. The method is practiced using gas phase processing. The tank is filled with a gas mixture, comprising water vapor and ozone. ed on points of intersection of diagonals extending between center points of neighboring filter bundles (7). 5. The dust filter according to claim 4, wherein the washing nozzles (16) have exit openings ending flush with an underside of the partition (2) and wherein the washing liquid exits substantially radially from the washing nozzles (16) such that the washing liquid flows through individual passages between the filter bundles (7) as well as between the self-supporting filter tubes (5) of the filter bundles (7) and impacts on the outer surfaces of the filter tubes (5). 6. The dust filter according to claim 4, wherein the washing liquid exiting from the washing nozzles (16) cleans an inner side of the filter housing (1). 7. The dust filter according to claim 4, further comprising at least one second washing nozzle (16) arranged at a lower part of the filter housing (1) and configured for a directed dispensing of washing liquid. 8. The dust filter according to claim 4, further comprising: an annular channel (8) surrounding an outer side of the filter housing (1) in a lower area of the filter bundles (7); and a dust-contaminated air supply channel (9) opening tangentially into the annular channel (8). 9. The dust filter according to claim 8, wherein the at least one second washing nozzle (16) is arranged in an area where dust-contaminated air coming from the dust-contaminated supply channel (9) enters the annular channel (8). 10. The dust filter according to claim 8, wherein the at least one second washing nozzle (16) is arranged in the annular channel (8) and in an area where dust-contaminated air coming from the dust-contaminated supply channel (9) enters the annular channel (8). 11. The dust filter according to claim 8, wherein the at least one washing nozzle (16) is arranged in the annular channel (8). 12. The dust filter according to claim 7, comprising a washing system comprised of several liquid circuits (18, 19) for supplying the first and second washing nozzles (16) with the washing liquid. 13. The dust filter according to claim 12, wherein the washing system comprises a washing program control (20). 14. The dust filter according to claim 13, wherein the self-supporting filter tubes (5) are comprised of a self-supporting needled felt having a smooth surface, a high air permeability, and a wall thickness of less than 1 mm. 15. The dust filter according to claim 14, wherein the wall thickness is approximately 0.6 mm. 16. The dust filter according to claim 1, wherein the self-supporting filter tubes (5) have a diameter of less than 100 mm. 17. The dust filter according to claim 16, wherein the diameter is 40 to 50 mm. 18. The dust filter according to claim 1, wherein the self-supporting filter tubes (5) have a length of less than 4 m. 19. The dust filter according to claim 18, wherein the length is approximately 2 m. 20. The dust filter according to claim 1, wherein seven of the self-supporting filter tubes (5) form one of the filter bundles (7), respectively. 21. The dust filter according to claim 20, wherein a trace circle of the filter bundles (7) is less than 200 mm. 22. The dust filter according to claim 21, wherein the trace circle is approximately 170 mm.