초록

Disclosed is a vacuum cleaning device and system for maintaining the operability of a vacuum cleaner. The device has a releasably attachable/detachable filter unit and a releasably attachable/detachable motor unit. Various filter units and motor units are interchangeable.

대표청구항 ▼

Disclosed is a vacuum cleaning device and system for maintaining the operability of a vacuum cleaner. The device has a releasably attachable/detachable filter unit and a releasably attachable/detachable motor unit. Various filter units and motor units are interchangeable. ewmark, D., et al., "Phase-

Disclosed is a vacuum cleaning device and system for maintaining the operability of a vacuum cleaner. The device has a releasably attachable/detachable filter unit and a releasably attachable/detachable motor unit. Various filter units and motor units are interchangeable. ewmark, D., et al., "Phase-Shifting Mask Design Tool", SPIE--11th Annual BACUS Symposium on Photmask Technology, vol. 1604, pp. 226-235, Sep. 25-27, 1991. Nolscher, C., et al., "Investigation of Self-Aligned Phase-Shifting Reticles by Simulation Techniques", SPIE--Optical/Laser Microlithography IV, vol. 1463, pp. 135-150 (1991). Inoue, S., et al., "Simulation Study on Phase-Shifting Masks for Isolated Patterns", Japanese Journal of Applied Physics, vol. 30, No. 11B, pp. 3010-3015, Nov. 1991. Watanabe, H., et al., "Detection and Printability of Shifter Defects in Phase-Shifting Masks", Japanese Jornal of Applied Physics, vol. 30, No. 11B, pp. 3016-3020, Nov. 1991. Watanabe, H., et al., "Pattern Transfer Characteristics of Transparent Phase Shifting Mask", Japanese Journal of Applied Physics, vol. 30, No. 11B, pp. 3004-3009, Nov. 1991. Burggraaf, P., "Lithography's Leading Edge, Part 1: Phase-Shift Technology and Part 2: I-Line and Beyond", Semiconductor International, pp. 43-47 and 52-56, Feb. 1992. IBM, "Phase-Shift Mask Utilizing Silicon Oxy-Nitride as a Low Reflectivity Phase-Shift Layer", IBM Technical Disclosure Bulletin, vol. 34, No. 10B, pp. 360-361, Mar. 1992. Moniwa, A., et al., "Algorithm for Phase-Shift Mask Design with Priority on Shifter Placement", Jpn. J. Appl. Phys., vol. 32. Pt. 1, No. 12B, pp. 5874-5879, Dec. 1193. Ooi, K., et al., "Computer Aided Design Software for Designing Phase-Shifting Masks", Jpn. J. Appl. Phys., vol. 32, Pt. 1, No. 12B, pp. 5887-5891, Dec. 1993. Ohtsuka, H., et al., "Evaluation of Repair Phase and Size Tolerance for Phase-Shift Mask", J. Vac. Sci. Technol. B. vol. 11, No. 6, pp. 2665-2668, Nov./Dec. 1993. Ronse, K., et al., "Comparison of Various Phase Shift Strategies and Application to 0.35um ASIC Designs", SPIE--Optical/Laser Microlithography VI, vol. 1927, pp. 2-16 (1993). Waas, T., et al., "Automatic Generation of Phase Shift Mask Layouts", Microelectronic Engineering, vol. 23, pp. 139-142 (1994). Moniwa, A., et al., "Heuristic Method for Phase-Confict Minimization in Automatic Phase-Shift Mask Design", Jpn. J. Appl. Phys., vol. 34, Pt. 1, No. 12B, pp. 6584-6589, Dec. 1995. Langston, J., et al., "Extend