초록 ▼

A flexible chuck for supporting a substrate during lithographic processing is described. This flexible chuck includes an electrode layer, a piezoelectric layer disposed on the electrode layer, and a substrate support layer disposed above the piezoelectric layer. By providing electrical signals to th

A flexible chuck for supporting a substrate during lithographic processing is described. This flexible chuck includes an electrode layer, a piezoelectric layer disposed on the electrode layer, and a substrate support layer disposed above the piezoelectric layer. By providing electrical signals to the piezoelectric layer through the electrode layer, the support layer can be flexed, thereby changing surface topography on a substrate disposed on the flexible chuck. The contact layer can include projections, each of the projections corresponding to a respective electrode within the electrode layer. Furthermore, the substrate support layer can be formed of a conductive material and thus serve as the ground layer. Alternatively, separate substrate support and ground layers can be provided. The flexible chuck in accordance with the instant invention can be a vacuum chuck. Also described is a method of monitoring topographic changes in a flexible chuck in accordance with the instant invention.

대표청구항 ▼

1. A flexible chuck for supporting a substrate during lithographic processing, comprising: an electrode layer; a piezoelectric layer disposed on said electrode layer; a substrate support layer disposed above said piezoelectric layer, wherein said electrode layer provides electrical signals to s

1. A flexible chuck for supporting a substrate during lithographic processing, comprising: an electrode layer; a piezoelectric layer disposed on said electrode layer; a substrate support layer disposed above said piezoelectric layer, wherein said electrode layer provides electrical signals to said piezoeletric layer thereby causing said piezoelectric layer to deform in response to said electric signals; and a cooling plate. 2. A flexible chuck for supporting a substrate during lithographic processing, comprising: an electrode layer; a piezoelectric layer disposed on said electrode layer; a substrate support layer disposed above said piezoelectric layer, wherein said electrode layer provides electrical signals to said piezoeletric layer thereby causing said piezoelectric layer to deform in response to said electric signals; and a main chuck assembly and a riser assembly that lift the substrate off of said substrate support layer. 3. The flexible chuck of claim 2, wherein said flexible chuck is a vacuum chuck. 4. A flexible chuck for adjusting the height of a substrate during lithographic processing, comprising: an electrode layer; a plurality of discrete piezoelectric elements formed from a substantially flat piezoelectric layer disposed on said electrode layer; a ground plane; and a cooling plate. 5. A flexible chuck for adjusting the height of a substrate during lithographic processing, comprising: an electrode layer; a plurality of discrete piezoelectric elements formed from a substantially flat piezoelectric layer disposed on said electrode layer; a ground plane; and a main chuck assembly and a riser assembly that lift the substrate off of said plurality of discrete piezoelectric elements.