IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0521073
(2000-03-07)
|
발명자
/ 주소 |
|
출원인 / 주소 |
- Personal Electronic Devices, Inc.
|
대리인 / 주소 |
Wolf, Greenfield & Sacks, P.C.
|
인용정보 |
피인용 횟수 :
220 인용 특허 :
46 |
초록
▼
An apparatus to be secured to a person or an article of clothing includes a housing, at least one retaining member, and an elastic member. The housing is adapted to house at least one item. The at least one retaining member is supported by the housing. The elastic member is releasably engageable wit
An apparatus to be secured to a person or an article of clothing includes a housing, at least one retaining member, and an elastic member. The housing is adapted to house at least one item. The at least one retaining member is supported by the housing. The elastic member is releasably engageable with the at least one retaining member and is adapted to stretchably encompass at least a portion of the person or article of clothing and to secure the housing to the person or article of clothing when engaged with the at least one retaining member. A method for securing a housing to a person or an article of clothing involves providing a housing and an elastic member, the housing having at least one retaining member supported thereby. The elastic member is wrapped about at least a portion of the person or article of clothing and is stretched. At least a first portion of the elastic member is releasably engaged with the at least one retaining member so that tension remains in the elastic member, thereby securing the housing to the person or article of clothing.
대표청구항
▼
An apparatus to be secured to a person or an article of clothing includes a housing, at least one retaining member, and an elastic member. The housing is adapted to house at least one item. The at least one retaining member is supported by the housing. The elastic member is releasably engageable wit
An apparatus to be secured to a person or an article of clothing includes a housing, at least one retaining member, and an elastic member. The housing is adapted to house at least one item. The at least one retaining member is supported by the housing. The elastic member is releasably engageable with the at least one retaining member and is adapted to stretchably encompass at least a portion of the person or article of clothing and to secure the housing to the person or article of clothing when engaged with the at least one retaining member. A method for securing a housing to a person or an article of clothing involves providing a housing and an elastic member, the housing having at least one retaining member supported thereby. The elastic member is wrapped about at least a portion of the person or article of clothing and is stretched. At least a first portion of the elastic member is releasably engaged with the at least one retaining member so that tension remains in the elastic member, thereby securing the housing to the person or article of clothing. 0; US-RE37258, 20010700, Patel et al., 358/001.13; US-6324683, 20011100, Fuh et al., 717/124; US-6327623, 20011200, Watts, 709/229; US-6442663, 20020800, Sun et al., 711/202 ing The Solid Lithography Simulator", Microelectronics Eng., vol. 14, pp. 283-297 (1991). Ibsen, K. et al., "Clear Field Reticle Defect Disposition For Advanced Sub-Half Micron Lithography", SPIE, Proceedings of the 17thAnnual Symposium on Photomask Technology and Management, vol. 3236, pp. 124-135 (1997). Karklin, L., "A Comprehensive Simulation Study Of The Photomask Defects Printability", SPIE, vol. 2621, pp. 490-504 (1995). Kubota, H. et al., "A Fast Method Of Simulating Resist Pattern Contours Based On Mean Inhibitor Concentration", Jpn. J. Appl. Phys., vol. 37, pp. 5815-5820 (1998). Neureuther, A., "Modeling Phase Shifting Masks", SPIE, 10thAnnual Symposium on Microlithography, vol. 1496, pp. 80-85 (1990). Nistler, J. et al., "Large Area Optical Design Rule Checker For Logic PSM Application", SPIE, Photomask and X-Ray Mask Technology, vol. 2254, pp. 78-92 (1994). Nistler, J. et al., "Phase Shift Mask Defect Printability Analysis", Proceedings of the Microlithography Seminar Interface '93, OCG Microelectronic Materials, Inc., pp. 11-28 (1993). Ohtsuka, H. et al., "Phase Defect Repair Method For Alternating Phase Shift Masks Conjugate Twin-Shifter Method", Jpn. J. Appl. Phys., vol. 31, pp. 4143-4149 (1992). Pati, Y.C. et al., "Exploiting Structure In Fast Aerial Image Computation For Integrated Circuit Patterns", IEEE Transactions on Semiconductor Manufacturing, vol. 10, No. 1, pp. 62-74, Feb. 1997. Pati, Y.C. et al., "Phase-Shifting Mas
※ AI-Helper는 부적절한 답변을 할 수 있습니다.