Sheet material positioning method and apparatus
원문보기
IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0808013
(2001-03-15)
|
우선권정보 |
JP-0073059 (2000-03-15) |
발명자
/ 주소 |
|
출원인 / 주소 |
- Fuji Photo Film Co., Ltd.
|
대리인 / 주소 |
|
인용정보 |
피인용 횟수 :
8 인용 특허 :
7 |
초록
▼
In order to minimize the amount by which a sheet material must be moved for positioning, using a small number of sensors, and to achieve improvement of the operation and stabilization of the positioning accuracy, the size of the sheet material is recognized in advance, a sensor, which requires the s
In order to minimize the amount by which a sheet material must be moved for positioning, using a small number of sensors, and to achieve improvement of the operation and stabilization of the positioning accuracy, the size of the sheet material is recognized in advance, a sensor, which requires the smallest amount of movement of the sheet material for positioning the sheet material at a predetermined position, is selected from a plurality of sensors based on the recognized size, and the sheet material is detected by the selected sensor.
대표청구항
▼
In order to minimize the amount by which a sheet material must be moved for positioning, using a small number of sensors, and to achieve improvement of the operation and stabilization of the positioning accuracy, the size of the sheet material is recognized in advance, a sensor, which requires the s
In order to minimize the amount by which a sheet material must be moved for positioning, using a small number of sensors, and to achieve improvement of the operation and stabilization of the positioning accuracy, the size of the sheet material is recognized in advance, a sensor, which requires the smallest amount of movement of the sheet material for positioning the sheet material at a predetermined position, is selected from a plurality of sensors based on the recognized size, and the sheet material is detected by the selected sensor. e marks are measured with shape measurement means with no possibility of coming into contact with the mark, through calibration with reference to shape measurement means with a possibility of coming into contact with the mark. 8. A profiler for measuring a shape of an alignment mark on an exposure target substrate before and after coating with a resist, said profiler comprising: first shape measurement means for measuring the shape of the mark while having a possibility of coming into contact with the mark; second shape measurement means for measuring the shape of the mark while having no possibility of coming into contact with the mark; and calibration measurement means for performing calibration with reference to said first shape measurement means in order to measure the shape of the alignment mark with said second shape measurement means. 9. The profiler according to claim 8, wherein said calibration measurement means performs calibration based on a predetermined causal relationship, obtained by measuring the shape of the mark with said first and second shape measurement means before and after coating of the resist, while changing a coverage of the resist with respect to the mark by slightly changing a condition for a coater that coats the mark with a resist from an optimal one. 10. The profiler according to claim 8, wherein said calibration measurement means performs calibration based on information concerning a thickness of the resist applied to the exposure target substrate. 11. An exposure apparatus for exposing a pattern on a master mask onto a substrate, said apparatus comprising: mark detecting means for detecting a plurality of marks on the substrate; aligning means for aligning first and second objects with each other; and means for measuring shapes of the plurality of the marks on the substrate, thereby obtaining offsets that should be reflected in the measured values of the mark detection means, wherein the shapes of the plurality of the marks are measured with shape measurement means with no possibility of coming into contact with the mark, through calibration with reference to shape measurement means with a possibility of coming into contact with the mark. 12. The apparatus according to claim 11, further comprising: a display; a network interface; and a computer for executing network software, wherein maintenance information of the exposure apparatus can be communicated via a computer network. 13. The apparatus according to claim 12, wherein the network software provides on the display a user interface connected to an external network of a factory where the exposure apparatus is installed to access a maintenance database provided by a vendor or user of the exposure apparatus, and enables obtaining information from the database via the external network.
이 특허에 인용된 특허 (7)
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Rinke Ronald A. ; Simonian Richard P. ; Powers John W., Apparatus for and method of exposing lithographic plates.
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Nishiyama Mikio (Kanagawa JPX) Okutsu Hirokazu (Kanagawa JPX), Method and apparatus for maintaining registration when making a printing plate.
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Iino Shinji,JPX ; Hayakawa Noboru,JPX, Unit for transferring to-be-inspected object to inspection position.
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Eid Bradley Franz ; Durkee Scott Robert ; Darwin Keith Patrick, Universal sensor interface system and method.
이 특허를 인용한 특허 (8)
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Yuen, William; Wight, Martin C., Method and apparatus for separating media combinations from a media stack.
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Yuen, William; Wight, Martin C., Method and apparatus for separating media combinations from a media stack.
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Yuen, William, Methods and apparatus for separating image recordable materials from a media stack.
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Gromadzki, Jo A. L.; Wight, Martin C., Methods and apparatus for storing slip-sheets.
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Williams, Kelly F.; Andrew, Gordon D., Separating media combination from a media stack.
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Yee,Chang J.; Berrigan,John; Dougherty,James A., System and method for interleaf sheet and/or plate sheet removal and/or transport for use with a printing apparatus.
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Yee, Chang J., System for interleaf sheet removal in an imaging system.
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