$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Method of making mosaic array of thin semiconductor material of large substrates 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C30B-002/02
  • C30B-025/04
출원번호 US-0046534 (2002-01-16)
발명자 / 주소
  • Kud, Francis
  • Hobart, Karl
  • Spencer, Mike
출원인 / 주소
  • The United States of America as represented by the Secretary of the Navy
대리인 / 주소
    Karasek, John J.Kap, George A.
인용정보 피인용 횟수 : 76  인용 특허 : 16

초록

A method for making an array of thin single-crystal substrates on a handle substrate comprising the steps: attaching a plurality of single-crystal substrates to a face of a support wafer; polishing said plurality of attached single-crystal substrates so that said single-crystal substrates surfaces a

대표청구항

A method for making an array of thin single-crystal substrates on a handle substrate comprising the steps: attaching a plurality of single-crystal substrates to a face of a support wafer; polishing said plurality of attached single-crystal substrates so that said single-crystal substrates surfaces a

이 특허에 인용된 특허 (16)

  1. Henley Francois J. ; Cheung Nathan, Controlled cleavage process using pressurized fluid.
  2. Lakin Kenneth M. (Redmond OR), Method and apparatus for fabricating a piezoelectric resonator to a resonant frequency.
  3. Nakahata Hideaki (Hyogo JPX) Shikata Shinichi (Hyogo JPX) Hachigo Akihiro (Hyogo JPX) Fujimori Naoji (Hyogo JPX), Method for manufacturing a surface acoustic wave device.
  4. Goesele Ulrich M. ; Tong Q.-Y., Method for the transfer of thin layers of monocrystalline material to a desirable substrate.
  5. Doyle Brian S., Method of delaminating a pre-fabricated transistor layer from a substrate for placement on another wafer.
  6. Aspar Bernard,FRX ; Biasse Beatrice,FRX ; Bruel Michel,FRX, Method of obtaining a thin film of semiconductor material.
  7. Aspar Bernard,FRX ; Bruel Michel,FRX ; Poumeyrol Thierry,FRX, Method of producing a thin layer of semiconductor material.
  8. Sullivan Gerard J. (Thousand Oaks CA) Szwed Mary K. (Huntington Beach CA) Chang Mau-Chung F. (Thousand Oaks CA), Method of transferring a thin film to an alternate substrate.
  9. Sakaguchi Kiyofumi,JPX ; Yonehara Takao,JPX, Process for producing semiconductor article.
  10. Bruel Michel,FRX, Process for the manufacture of thin films of semiconductor material.
  11. Bruel Michel (Veurey FRX), Process for the production of thin semiconductor material films.
  12. Henley Francois J. ; Cheung Nathan W., Reusable substrate for thin film separation.
  13. Kub Francis J. ; Hobart Karl D., Single-crystal material on non-single-crystalline substrate.
  14. Srikrishnan Kris V., Smart-cut process for the production of thin semiconductor material films.
  15. Eda Kazuo (Nara JPX) Taguchi Yutaka (Settsu JPX) Onishi Keiji (Settsu JPX) Seki Shun-ichi (Osaka JPX), Surface acoustic wave device having a lamination structure.
  16. Eda Kazuo (Nara JPX) Taguchi Yutaka (Ibaraki JPX), Surface acoustic wave-semiconductor composite device.

이 특허를 인용한 특허 (76)

  1. Tudryn, Carissa; Borenstein, Jeffrey; Hopkins, Ralph, Anodic bonding of silicon carbide to glass.
  2. Meisberger, Stephen P.; Warkentin, Matthew A.; Hopkins, Jesse B.; Katz, Andrea M.; Pollack, Lois; Thorne, Robert E., Apparatus and methods for low temperature small angle X-ray scattering.
  3. Yoshida, Yasunori; Shimomura, Akihisa; Sato, Yurika, Display device and method for manufacturing the same.
  4. Kubota, Hajime; Itoh, Masayuki; Kishi, Masakazu, Electronic device manufacturing method and chip assembly.
  5. Loboda, Mark; Parfeniuk, Christopher, Flat SiC semiconductor substrate.
  6. Loboda, Mark; Parfeniuk, Christopher, Flat SiC semiconductor substrate.
  7. Eickhoff, Steven J., Fuel cell based power generator.
  8. Hsu, Po Shan; McLaurin, Melvin; Raring, James W.; Sztein, Alexander; Buller, Benyamin, Gallium and nitrogen containing laser device having confinement region.
  9. Linares, Robert C., Gallium nitride light emitting devices on diamond.
  10. Linares, Robert C., Gallium nitride light emitting devices on diamond.
  11. Usenko, Alex, Handle substrate for use in manufacture of semiconductor-on-insulator structure and method of manufacturing thereof.
  12. Takagi, Kazutaka, High frequency circuit having multi-chip module structure.
  13. Choi, Sang Hyouk; Park, Yeonjoon; King, Glen C.; Kim, Hyun-Jung; Lee, Kunik, High mobility transport layer structures for rhombohedral Si/Ge/SiGe devices.
  14. Choi, Sang Hyouk; Park, Yeonjoon; King, Glen C.; Kim, Hyun-Jung; Lee, Kunik, High mobility transport layer structures for rhombohedral Si/Ge/SiGe devices.
  15. Peidous, Igor; Kommu, Srikanth; Wang, Gang; Thomas, Shawn George, High resistivity SOI wafers and a method of manufacturing thereof.
  16. Liu, Qingmin; Standley, Robert Wendell, High resistivity silicon-on-insulator substrate comprising a charge trapping layer formed by He-N2 co-implantation.
  17. Liu, Qingmin; Wang, Gang, High resistivity silicon-on-insulator wafer manufacturing method for reducing substrate loss.
  18. Loboda, Mark; Chung, Gilyong, High voltage power semiconductor device on SiC.
  19. Loboda, Mark; Chung, Gilyong, High voltage power semiconductor devices on SiC.
  20. Zandian, Majid; Cooper, Donald E.; Fischer, Lisa L.; Gil, Victor; Sullivan, Gerard, Hybrid assembly with improved thermal performance.
  21. Park, Yeonjoon; Choi, Sang H.; King, Glen C.; Elliott, James R., Hybrid bandgap engineering for super-hetero-epitaxial semiconductor materials, and products thereof.
  22. McLaurin, Melvin; Sztein, Alexander; Hsu, Po Shan; Raring, James W., Laser diode device with a plurality of gallium and nitrogen containing substrates.
  23. Shimomura, Akihisa; Mizoi, Tatsuya; Miyairi, Hidekazu; Tanaka, Koichiro, Layer transfer process for semiconductor device.
  24. McLaurin, Melvin; Sztein, Alexander; Hsu, Po Shan; Goutain, Eric; Raring, James W.; Rudy, Paul; Novotny, Vlad, Manufacturable RGB laser diode source.
  25. McLaurin, Melvin; Raring, James W.; Sztein, Alexander; Hsu, Po Shan, Manufacturable laser diode formed on C-plane gallium and nitrogen material.
  26. McLaurin, Melvin; Sztein, Alexander; Hsu, Po Shan; Raring, James W., Manufacturing a laser diode device from a plurality of gallium and nitrogen containing substrates.
  27. Meade, Roy, Method and structure providing optical isolation of a waveguide on a silicon-on-insulator substrate.
  28. Meade, Roy E., Method and structure providing optical isolation of a waveguide on a silicon-on-insulator substrate.
  29. Bader,Stefan; Fehrer,Michael; Hahn,Berthold; H채rle,Volker; Lugauer,Hans J체rgen, Method for fabricating a radiation-emitting semiconductor chip based on III-V nitride semiconductor.
  30. Loboda, Mark; Drachev, Roman; Hansen, Darren; Sanchez, Edward, Method for growing a SiC crystal by vapor deposition onto a seed crystal provided on a support shelf which permits thermal expansion.
  31. Loboda, Mark, Method for growing a SiC crystal by vapor deposition onto a seed crystal provided on a supporting shelf which permits thermal expansion.
  32. Wong,William S.; Chabinyc,Michael L.; Ready,Steven E.; Kneissl,Michael A.; Teepe,Mark R., Method for integration of microelectronic components with microfluidic devices.
  33. Hansen, Darren; Loboda, Mark; Manning, Ian; Moeggenborg, Kevin; Mueller, Stephan; Parfeniuk, Christopher; Quast, Jeffrey; Torres, Victor; Whiteley, Clinton, Method for manufacturing SiC wafer fit for integration with power device manufacturing technology.
  34. Hansen, Darren; Loboda, Mark; Manning, Ian; Moeggenborg, Kevin; Mueller, Stephan; Parfeniuk, Christopher; Quast, Jeffrey; Torres, Victor; Whiteley, Clinton, Method for manufacturing SiC wafer fit for integration with power device manufacturing technology.
  35. Akiyama, Shoji, Method for manufacturing composite substrate comprising wide bandgap semiconductor layer.
  36. Sztein, Alexander; McLaurin, Melvin; Hsu, Po Shan; Raring, James W., Method for manufacturing gallium and nitrogen bearing laser devices with improved usage of substrate material.
  37. Sztein, Alexander; McLaurin, Melvin; Hsu, Po Shan; Raring, James W., Method for manufacturing gallium and nitrogen bearing laser devices with improved usage of substrate material.
  38. Nishiguchi, Taro; Sasaki, Makoto; Harada, Shin; Okita, Kyoko; Inoue, Hiroki; Fujiwara, Shinsuke; Namikawa, Yasuo, Method for manufacturing silicon carbide substrate.
  39. Maleville,Christophe; Maunand Tussot,Corinne, Method for preparing a bonding surface of a semiconductor layer of a wafer.
  40. Peterson, Jeffrey M., Method for preparing a device structure having a wafer structure deposited on a composite substrate having a matched coefficient of thermal expansion.
  41. Kerdiles, Sébastien; Michel, Willy; Schwarzenbach, Walter; Delprat, Daniel; Ben Mohamed, Nadia, Method of bonding two substrates.
  42. Wei,Jun; Wong,Stephen Chee Khuen; Wu,Yongling; Ng,Fern Lan, Method of fabricating microelectromechanical system structures.
  43. Bennett, Andrew Michael; Hutton, Laura Anne; Scarsbrook, Geoffrey Alan, Method of fabricating plates of super-hard material using a collimated cutting beam.
  44. Wort, Christopher John Howard; Twitchen, Daniel James; Scarsbrook, Geoffrey Alan, Method of manufacturing diamond substrates.
  45. Eickhoff, Steven J., Method of manufacturing fuel cell based power generator.
  46. Libbert, Jeffrey L.; Vaypayee, Shilpi, Method of manufacturing high resistivity SOI substrate with reduced interface conductivity.
  47. Thomas, Shawn George; Liu, Qingmin, Method of manufacturing high resistivity silicon-on-insulator substrate.
  48. Leonard, Robert Tyler; Powell, Adrian; Tsvetkov, Valeri F., Method of producing high quality silicon carbide crystal in a seeded growth system.
  49. Loboda, Mark, Method to reduce dislocations in SiC crystal growth.
  50. Guenard, Pascal; Faure, Bruce; Letertre, Fabrice; Krames, Michael R.; Gardner, Nathan F.; McLaurin, Melvin B., Methods for relaxation and transfer of strained layers and structures fabricated thereby.
  51. Ghyselen, Bruno; Letertre, Fabrice, Methods for transferring a useful layer of silicon carbide to a receiving substrate.
  52. Ghyselen,Bruno; Letertre,Fabrice, Methods for transferring a useful layer of silicon carbide to a receiving substrate.
  53. Letertre, Fabrice; Faure, Bruce; Krames, Michael R.; Gardner, Nathan F., Methods of forming relaxed layers of semiconductor materials, semiconductor structures, devices and engineered substrates including same.
  54. Bhattacharya, Rabi S.; Xu, Yongli, Methods of splitting CdZnTe layers from CdZnTe substrates for the growth of HgCdTe.
  55. Peidous, Igor; Jones, Andrew M.; Kommu, Srikanth; Libbert, Jeffrey L., Process flow for manufacturing semiconductor on insulator structures in parallel.
  56. Tokuda,Satoshi, Radiation detector and radiation imaging device equipped with the same.
  57. Letertre, Fabrice; Faure, Bruce; Guenard, Pascal, Relaxation and transfer of strained material layers.
  58. Letertre, Fabrice; Mazure, Carlos; Krames, Michael R.; McLaurin, Melvin B.; Gardner, Nathan F., Relaxation of strained layers.
  59. Ogihara, Mitsuhiko; Fujiwara, Hiroyuki, Semiconductor device and method of manufacturing the same.
  60. Tachioka, Masaaki; Nakajima, Tsunehiro, Semiconductor device manufacturing method.
  61. McLaurin, Melvin; Sztein, Alexander; Hsu, Po Shan; Raring, James W., Semiconductor laser diode on tiled gallium containing material.
  62. McLaurin, Melvin; Sztein, Alexander; Hsu, Po Shan; Raring, James W., Semiconductor laser diode on tiled gallium containing material.
  63. Kweskin, Sasha Joseph, Semiconductor on insulator structure comprising a sacrificial layer and method of manufacture thereof.
  64. Kweskin, Sasha Joseph, Semiconductor on insulator structure comprising a sacrificial layer and method of manufacture thereof.
  65. Arena, Chantal, Semiconductor structures, devices and engineered substrates including layers of semiconductor material having reduced lattice strain.
  66. Arena, Chantal, Semiconductor structures, devices and engineered substrates including layers of semiconductor material having reduced lattice strain.
  67. Loboda, Mark J.; Zhang, Jie, SiC substrate with SiC epitaxial film.
  68. Faure, Bruce, Stiffening layers for the relaxation of strained layers.
  69. Werkhoven, Christiaan J., Strain relaxation using metal materials and related structures.
  70. Werkhoven, Christiaan J., Strain relaxation using metal materials and related structures.
  71. Dotsenko, Vladimir V., Superconductive multi-chip module for high speed digital circuits.
  72. Park, Yeonjoon; Choi, Sang H.; King, Glen C.; Elliott, James R.; Talcott, Noel A., Thermoelectric materials and devices.
  73. Zandian, Majid; Cooper, Donald E.; Fischer, Lisa L.; Gil, Victor; Sullivan, Gerard, Tiled hybrid array and method of forming.
  74. White,John M., Vacuum elastomer bonding apparatus and method.
  75. Eickhoff, Steven J., Valve for fuel cell based power generator.
  76. Peterson, Jeffrey M; Schulte, Eric F, Wafer bonded composite structure for thermally matching a readout circuit (ROIC) and an infrared detector chip both during and after hybridization.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로