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Direct write all-glass photomask blanks 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G03P-001/08
  • G03C-005/00
  • C03F-001/14
출원번호 US-0507039 (2000-02-18)
발명자 / 주소
  • Wu, Che-Kuang
  • Wu, Laurie Ann
출원인 / 주소
  • Canyon Materials, Inc.
대리인 / 주소
    Fish & Richardson P.C.
인용정보 피인용 횟수 : 16  인용 특허 : 32

초록

A narrowly defined range of zinc silicate glass compositions is found to produce High Energy Beam Sensitive-glass (HEBS-glass) that possesses the essential properties of a true gray level mask which is necessary for the fabrication of general three dimensional microstructures with one optical exposu

대표청구항

A narrowly defined range of zinc silicate glass compositions is found to produce High Energy Beam Sensitive-glass (HEBS-glass) that possesses the essential properties of a true gray level mask which is necessary for the fabrication of general three dimensional microstructures with one optical exposu

이 특허에 인용된 특허 (32)

  1. Araujo Roger J. (Horseheads NY) Borrelli Nicholas F. (Elmira NY) Tick Paul A. (Corning NY) Trotter Donald M. (Corning NY), Composite photochromic glass article and method of making.
  2. Plumat ; Emile ; Baudin ; Pol ; Laethem ; Robert Van ; Deliere ; Jean, Diffusion treatments for modifying the properties of glass and vitrocrystalline materials.
  3. Loukes ; David Gordon, Electrolytic ion migration into glass.
  4. Ichimura Takeo (Tokyo JA) Kaneko Teruo (Tokyo JA), Glass body having a fluorescent pattern inwardly of a surface thereof.
  5. Coenen Matthias Christian (Mainz DT), Glass compositions suitable for incorporation into concrete.
  6. Erickson Thomas D. (Newark OH) Wolf Warren W. (Reynoldsburg OH), Glass compositions, fibers and methods of making same.
  7. Gal George (Palo Alto CA) Anderson William W. (Half Moon Bay CA) Herman Bruce J. (Mountain View CA) Stiller Marc A. (Boulder Creek CA), Gray scale microfabrication for integrated optical devices.
  8. Wu Che-Kuang (Riverside CA), High energy beam colored glasses exhibiting insensitivity to actinic radiation.
  9. Wu Che-Kuang (Riverside CA), High energy beam sensitive glasses.
  10. Wu Che-Kuang (Riverside CA), High energy beam sensitive glasses.
  11. Wu Che-Kuang (Riverside CA), High energy beam-sensitive glasses.
  12. Rinehart Dale W. (Natrona Heights PA), Ion exchange strengthening of soda-lime-silica glass.
  13. Chen Lee (Poughkeepsie NY) Chuang Tung J. (Los Gatos CA) Mathad Gangadhara S. (Poughkeepsie NY), Laser induced dry etching of vias in glass with non-contact masking.
  14. Houde-Walter Susan (Rochester NY) Moore Duncan (Rochester NY), Method and composition for creating gradient-index glass.
  15. Gulati Suresh T. (Elmira NY) Spycher Anton A. (Big Flats NY), Method for finishing glass-plastic laminated lens blanks.
  16. Pierson Joseph E. (Painted Post NY) Stookey Stanley D. (Painted Post NY), Method for making photosensitive colored glasses.
  17. Bartholomew Roger F. (Painted Post NY) Mach Joseph F. (Corning NY) Wu Che-Kuang (Horseheads NY), Method for making silver-containing glasses exhibiting thermoplastic properties and photosensitivity.
  18. Mutter Walter E. (Poughkeepsie NY), Method for manufacturing Fresnel phase reversal plate lenses.
  19. Lee Sing H. ; Daschner Walter, Method for producing micro-optic elements with gray scale mask.
  20. Livesay William R. (San Diego CA), Method for three-dimensional control of solubility properties of resist layers.
  21. Nigrin Jaroslava M. (Corning NY), Method of coating glass or ceramics with a colored frit.
  22. Smoot Stephen W. (Wilkes-Barre PA) Hayden Joseph S. (Clarks Summit PA), Method of forming stable images in electron beam writable glass compositions.
  23. Smoot Stephen W. (Wilkes-Barre PA) Hayden Joseph S. (Clarks Summit PA) Clement Marc (Mainz DEX) Grabowski Danuta (Taunusstein DEX) Holzel Eva (Ober-Olm DEX) Nass Peter (Mainz DEX) Heming Martin (Saul, Method of forming stable images in electron beam writable glass compositions.
  24. Wedding Brent M. (Corning NY), Method of making colored photochromic glasses.
  25. Deeg Emil W. (Woodstock CT) Courtemanche Richard D. (Southbridge MA), Method of making hardened ophthalmic lenses by ion exchange.
  26. Wu Che-Kuang (Riverside CA), Method of making high energy beam sensitive glasses.
  27. Wu Che-Kuang (Horseheads NY), Method of making photosensitive colored glasses exhibiting alterable photo-anisotropic effects.
  28. Sagara Hiroji (Akikawa JPX), Optical glass.
  29. Araujo ; Roger J. ; Borrelli ; Nicholas F. ; Chodak ; Jan B. ; Hares ; G eorge B. ; Meiling ; Gerald S. ; Seward ; III ; Thomas P., Photochromic glasses exhibiting dichroism, birefringence and color adaptation.
  30. Gliemeroth Georg (Mainz-Mombach DT), Process for producing photochromicity in untreated glasses of suitable composition by a temperature treatment in a liqui.
  31. Ritze ; Willi, Steep absorption edge filter glass.
  32. Wedding ; Brent M., Treating polychromatic glass in reducing atmospheres.

이 특허를 인용한 특허 (16)

  1. Liu,Xinbing, 3D lithography with laser beam writer for making hybrid surfaces.
  2. Mizuyama,Yosuke; Liu,Xinbing, Apparatus and method of making a grayscale photo mask and an optical grayscale element.
  3. Kato, Yasuo; Matsumoto, Hiroshi, Charged particle beam writing apparatus and charged particle beam writing method.
  4. Kato, Yasuo; Matsumoto, Hiroshi, Charged particle beam writing apparatus and method utilizing a sum of the weighted area density of each figure pattern.
  5. Morris, James; Feldman, Michael R, Compensation and/or variation of wafer level produced lenses and resultant structures.
  6. Morris, James; Feldman, Michael R, Compensation and/or variation of wafer level produced lenses and resultant structures.
  7. Yu, Tsung-Hsin, Digital pattern generator (DPG) for E-beam lithography.
  8. Koyo, Hirotaka; Koyama, Tadashi; Tsunetomo, Keiji, Glass for laser processing.
  9. Koyo,Hirotaka; Tsunetomo,Keiji, Glass for laser processing.
  10. Amemiya, Hiroki, Method for forming micro lenses.
  11. Amemiya, Hiroki, Method for forming micro lenses.
  12. Liu, Xinbing, Method of making grayscale mask for grayscale DOE production by using an absorber layer.
  13. Johnson, Eric G.; Pitchumani, Mahesh; Sung, Jin Won; Hockel, Heidi J., Micro-sculpting using phase masks for projection lithography.
  14. Te Kolste,Robert; Feldman,Michael R., Reduced loss diffractive structure.
  15. Te Kolste, Robert; Feldman, Michael R., Reduced loss high efficiency diffractive and associated methods.
  16. Te Kolste,Robert; Feldman,Michael R., Reduced loss high efficiency diffractive and associated methods.
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