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Laser method for shaping of optical lenses 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B23K-026/38
출원번호 US-0925067 (2001-08-07)
발명자 / 주소
  • Brandinger, Jay J.
  • Hoffman, Brian D.
  • Polkowski, Edward T.
출원인 / 주소
  • Westar Photonics, Inc.
대리인 / 주소
    Woodbridge & Associates, P.C.
인용정보 피인용 횟수 : 27  인용 특허 : 17

초록

A method for making accurate and precise customized corrections to the surface of an optical lens is described. An electronic correction contour is generated from a measured refractive correction for a patient, and transferred to the surface of the lens by ablation etching with one or more laser pul

대표청구항

1. A method for contouring the surface of a standard optical lens, said method comprising the steps of: (a) measuring the refractive error of a patient in need of a refractive correction; (b) providing the refractive function of said standard optical lens to a computer; (c) generating, using sa

이 특허에 인용된 특허 (17)

  1. David R. Williams ; Geun-Young Yoon ; Antonio Guirao, Apparatus and method for improving vision and retinal imaging.
  2. L\Esperance ; Jr. Francis A. (Englewood NJ), Apparatus for performing ophthalmic laser surgery.
  3. Freeman Jerre M. (6485 Poplar Ave. Memphis TN 38119) Driggers Ronald G. (1121 Natchez Point #95 Memphis TN 38104) Williams Roy E. (3982 Mary Lee Dr. Memphis TN 38116) Halford Carl E. (1538 Cordova Mi, High resolution, high speed, programmable laser beam modulating apparatus for microsurgery.
  4. Trokel Stephen L. (New York NY), Laser surgery method.
  5. Greshes Martin, Lens blanks and method of making a lens therefrom.
  6. Williams David R. ; Liang Junzhong, Method and apparatus for improving vision and the resolution of retinal images.
  7. Williams David R. ; Liang Junzhong, Method and apparatus for improving vision and the resolution of retinal images.
  8. Roy E. Williams, Method and system for controlling a digital mircomirror device for laser refractive eye surgery.
  9. L\Esperance ; Jr. Francis A. (Englewood NJ), Method for ophthalmological surgery.
  10. McIntyre Kevin J. (Rochester NY), Method for shaping contact lens surfaces.
  11. Neefe Charles W. (P.O. Box 429 Big Spring TX 79720), Method of laser machining contact lenses.
  12. Brannon James H. (Wappingers Falls NY) Lankard ; Sr. John R. (Mahopac NY), Patterning of polyimide films with ultraviolet light.
  13. Pan Ju-Don T. (Saratoga CA), Rework of polymeric dielectric electrical interconnect by laser photoablation.
  14. Shimmick John K. ; Hinkson Stephen J. ; Munnerlyn Charles R., Systems and methods for imaging corneal profiles.
  15. Kim Dong-Kuk,KRX ; Ji Jeong-Beom,KRX ; Lee Seok-Won,KRX, Thin film actuated mirror array.
  16. Smith Robert F. (3714 Henley Dr. Pittsburgh PA 15235), Topography feedback control system for photoablation.
  17. Kohan George, Wafer deforming composite ophthalmic lens method.

이 특허를 인용한 특허 (27)

  1. Gross,Abraham; Kotler,Zvi; Lipman,Eliezer; Alon,Dan, Dynamic beam splitter outputting a selectable number of beams.
  2. Fishbaine, David, Inspection system and method.
  3. Blumberg, Girsh, Light wave front construction.
  4. Melzer,Frank; Singer,Wolfgang, Lighting system, particularly for use in extreme ultraviolet (EUV) lithography.
  5. Simonian,Dmitri; Feinstein,Casey, Method and apparatus for characterizing microelectromechanical devices on wafers.
  6. Sandström, Torbjörn, Methods and device for laser processing.
  7. Sandström, Torbjörn, Methods and device for laser processing.
  8. Gross,Abraham; Kotler,Zvi; Lipman,Eliezer; Alon,Dan, Micro-machining employing multiple independently focused and independently steered beams.
  9. Gross, Abraham; Kotler, Zvi; Lipman, Eliezer, Micro-machining system employing a two stage beam steering mechanism.
  10. Gross, Abraham; Kotler, Zvi; Lipman, Eliezer, Multiple beam micro-machining system and method.
  11. Gross, Abraham; Kotler, Zvi; Lipman, Eliezer, Multiple beam micro-machining system and method.
  12. Gross, Abraham; Kotler, Zvi; Lipman, Eliezer; Alon, Dan, Multiple beam micro-machining system and method.
  13. Gross,Abraham; Kotler,Zvi; Lipman,Eliezer, Multiple beam micromachining system for removing at least two different layers of a substrate.
  14. Kohl,Alexander; Holderer,Hubert; Lang,Werner; Brandenburg,Hartmut, Objective, particularly a projection objective for use in semiconductor lithography.
  15. Melzer, Frank; M?hlbeyer, Michael; Gellrich, Bernhard; Sorg, Franz; Xalter, Stefan; Ittner, Thomas, Optical element deformation system.
  16. Dinger, Udo; Hauf, Markus, Projection illumination system for EUV microlithography.
  17. Kugler, Jens; Sorg, Franz; Wurmbrand, Andreas; Schletterer, Thomas; Ittner, Thomas, Replacement apparatus for an optical element.
  18. Kugler, Jens; Sorg, Franz; Wurmbrand, Andreas; Schletterer, Thomas; Ittner, Thomas, Replacement apparatus for an optical element.
  19. Kugler, Jens; Sorg, Franz; Wurmbrand, Andreas; Schletterer, Thomas; Ittner, Thomas, Replacement apparatus for an optical element.
  20. Kugler, Jens; Sorg, Franz; Wurmbrand, Andreas; Schletterer, Thomas; Ittner, Thomas, Replacement apparatus for an optical element.
  21. Kugler, Jens; Sorg, Franz; Wurmbrand, Andreas; Schletterer, Thomas; Ittner, Thomas, Replacement apparatus for an optical element.
  22. Kugler, Jens; Sorg, Franz; Wurmbrand, Andreas; Schletterer, Thomas; Ittner, Thomas, Replacement apparatus for an optical element.
  23. Kugler,Jens; Sorg,Franz; Wurmbrand,Andreas; Schletterer,Thomas; Ittner,Thomas, Replacement apparatus for an optical element.
  24. Fuergut,Edward; Groeninger,Horst, Singulating surface-mountable semiconductor devices and fitting external contacts to said devices.
  25. Cavan, Daniel L.; Chen, Grace, System and method for reducing dynamic range in images of patterned regions of semiconductor wafers.
  26. Sorg, Franz; Xalter, Stefan; Melzer, Frank; Gellrich, Bernhard; Muehlbeyer, Michael, System for damping oscillations.
  27. Chen, Grace Hsiu Ling; Fu, Tao Yi; Sullivan, Jamie; Lee, Shing; Kirk, Greg, Systems configured to inspect a specimen.
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