초록 ▼

An improved spit assembly which may be fitted on a variety barbeques. A preferred embodiment uses twin parallel horizontal spit rods to hold food and food supporting accessories. An adjustable bearing adapts to various barbeque widths. Cavity shaped receptacles with hand tightened set screws make as

An improved spit assembly which may be fitted on a variety barbeques. A preferred embodiment uses twin parallel horizontal spit rods to hold food and food supporting accessories. An adjustable bearing adapts to various barbeque widths. Cavity shaped receptacles with hand tightened set screws make assembly and disassembly of the spit simpler and improve space efficiency for storage, shipment or other purposes.

대표청구항 ▼

An improved spit assembly which may be fitted on a variety barbeques. A preferred embodiment uses twin parallel horizontal spit rods to hold food and food supporting accessories. An adjustable bearing adapts to various barbeque widths. Cavity shaped receptacles with hand tightened set screws make as

An improved spit assembly which may be fitted on a variety barbeques. A preferred embodiment uses twin parallel horizontal spit rods to hold food and food supporting accessories. An adjustable bearing adapts to various barbeque widths. Cavity shaped receptacles with hand tightened set screws make assembly and disassembly of the spit simpler and improve space efficiency for storage, shipment or other purposes. d first and second relative heights to obtain said relative height of said first feature with respect to said second feature. 5. The method of claim 1, wherein said determining the relative height of said first feature with respect to said second feature comprises directly measuring said relative height of said first feature with respect to said second feature. 6. The method of claim 1, wherein said first and second features are of different widths. 7. The method of claim 1, wherein said first and said second features are of different materials. 8. The method of claim 1, wherein said second feature is surrounded by a third material that is different than said second material. 9. The method of claim 1, wherein said determining the relative height of said first feature with respect to said second feature is performed after a planarization process is used. 10. The method of claim 1, wherein said first material is an opaque material and said second material is a dielectric material. 11. The method of claim 10, wherein said opaque material comprises at least one of copper, aluminum, and tungsten. 12. The method of claim 1, further comprising generating calibration data that is the difference in dishing between a first calibration feature and a second calibration feature with respect to said dishing of said first calibration feature, wherein said first calibration feature has approximately the same dishing rate as said first feature and said second calibration feature has approximately the same dishing rate as said second feature. 13. The method of claim 12, wherein generating calibration data comprises: providing a sample substrate having a first calibration feature of said first material surrounded by a second material and having a second calibration feature; processing said sample substrate to produce dishing of said first and second calibration features; measuring the actual dishing values of said first and second calibration features; calculating the difference in actual dishing values between said first and second calibration features; and producing calibration data by relating the difference in actual dishing values between said first and second calibration features to the actual dishing of said first calibration feature. 14. The method of claim 13, wherein calculating the difference in actual dishing is done at two or more values of actual dishing. 15. The method of claim 13, wherein processing said sample substrate comprises polishing said sample substrate. 16. The method of claim 13, wherein said measuring the actual dishing of said first and second calibration features on said sample substrate comprises measuring the actual dishing using at least one of an atomic force microscope, contact profilometer, and a differential interferometer. 17. The method of claim 13, wherein said sample substrate is coated with an opaque material prior to said measuring the actual dishing values. 18. The method of claim 13, further comprising generating additional sets of calibration data for different polishing parameters. 19. A method of determining dishing in a metal line using calibration data, said method comprising: providing a substrate having a plurality of metal lines having differing widths embedded in a dielectric layer; determining a relative height between two of said plurality of metal lines; and correlating said relative height to said calibration data to determine the dishing of at least one of said two of said plurality of metal lines. 20. The method of claim 19, wherein said determining the relative height between two of said plurality of metal lines is performed after a planarization process is used. 21. The method of claim 19, further comprising generating calibration data that is the difference in dishing between a first calibration feature and a second calibration feature with respect to said dishing of said first calibration feature, wherein said first calibration feature has approximately the same di