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System and method for controlling humidity in a cryogenic aerosol spray cleaning system 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B24C-009/00
출원번호 US-0919545 (2001-07-31)
발명자 / 주소
  • DePalma, Philip W.
  • Sherman, Robert
출원인 / 주소
  • Applied Surface Technologies
대리인 / 주소
    Fortunato, DavidRiker, Danzig
인용정보 피인용 횟수 : 9  인용 특허 : 23

초록

Humidity within the workspace of a cryogenic aerosol spray cleaning system is controlled by circulating the workspace atmosphere through a dehumidifier. Advantageously, the need for purging of the workspace atmosphere prior to each cleaning cycle is eliminated. A system and method are thereby provid

대표청구항

1. A humidity control system for a cleaning chamber of a cryogenic cleaning system, the cleaning chamber having a workspace defined therein within which a workpiece may be removably placed for cleaning during a cryogenic cleaning cycle, the workspace having a partly gaseous atmosphere therein and th

이 특허에 인용된 특허 (23)

  1. You Nam-hee,KRX ; Hwang Jung-sung,KRX ; Kim Gee-do,KRX ; Han Young-jin,KRX, Air conditioning system for semiconductor clean room including a chemical filter downstream of a humidifier.
  2. Satoh Kazuo (Nishi-Okitama JPX) Ogawa Yohji (Nishi-Okitama JPX) Okano Hirofumi (Nishi-Okitama JPX) Suzuki Kiyomi (Higashi-Okitama JPX), Apparatus for preventing clouding of a semiconductor wafer.
  3. McDermott Wayne T. (Allentown PA) Wu Jin J. (Ossining NY) Ockovic Richard C. (Northampton PA), Apparatus to clean solid surfaces using a cryogenic aerosol.
  4. Herb Brett J. (Salem OR), Cleaning process for enhancing the bond integrity of multi-layered zirconium and zirconium alloy tubing.
  5. Tanaka Masato (Nagano) Ichikawa Tadayoshi (Nagano JPX), Cleaning system using a solvent.
  6. Krone-Schmidt Wilfried (Fullerton CA) Markle James R. (Palm Harbor FL), Environment control apparatus.
  7. Johnson Roy P. (Yacolt WA) Wilkinson Donald L. (Camus WA), Flowhood work station.
  8. Cherry Roger L. (2636 Maria Ct. West Linn OR 97068), High-purity cleaning system, method, and apparatus.
  9. Cherry Roger L. (West Linn OR) Burke Joseph J. (Portland OR) Platt Christopher W. (Portland OR) Cowles Craig H. (Tigard OR), High-purity cleaning system, method, and apparatus.
  10. Bjornard Erik J. (Northfield MN) Kurman Eric W. (Northfield MN) Shogren David A. (Lakeville MN) Hoffman Jeffrey J. (Inver Grove Heights MN), Method and apparatus for cleaning substrates in preparation for deposition of thin film coatings.
  11. Yokokawa Kazuhiko,JPX ; Yokokawa Munehiko,JPX ; Hirao Yasuhiro,JPX, Method and apparatus for processing in cold air blast.
  12. Gileta John (Chateauguay CAX), Method of cleaning workpieces with a potentially flammable or explosive liquid and drying in the tunnel.
  13. Gillis ; Jr. Patrick J. (Stoughton MA) Sklar Benjamin (Plymouth MA) Kral Andrew J. (Walpole MA) Randolph Marshall C. (Wellesley MA), Mobile CO2 blasting decontamination system.
  14. Cavaliere William A. (Verbank NY) Kuder ; II Robert P. (Hopewell Junction NY) Wu Jin J. (Ossining NY), Mounting apparatus for cryogenic aerosol cleaning.
  15. Bauer Tibor L. (Hopewell Junction NY) Cavaliere William A. (Verbank NY) Linnell David C. (Poughkeepsie NY) Wu Jin J. (Ossining NY), Nozzle apparatus for producing aerosol.
  16. Hayashi Chikara (Chigasaki JPX), Process for removing covering film and apparatus therefor.
  17. Tada Masuo (Yao JPX) Hata Takeki (Kobe JPX) Fukumoto Takaaki (Itami JPX) Ohmori Toshiaki (Itami JPX), Processing apparatus for semiconductor wafers.
  18. Fong Calvin C. (Beverly Hills CA), Sandblasting with pellets of material capable of sublimation.
  19. Nanbu Mitsuhiro,JPX ; Iida Naruaki,JPX ; Gotou Hideaki,JPX ; Tateyama Masanori,JPX ; Yoshimoto Yuji,JPX ; Ishimoto Tomoko,JPX ; Yaegashi Hidetami,JPX ; Kawakami Yasunori,JPX ; Fukuda Takahide,JPX ; F, Semiconductor wafer processing apparatus including localized humidification between coating and heat treatment sections.
  20. Hiroki Taniyama JP; Youichi Tanaka JP; Toshihiko Takahashi JP, Substrate cleaning apparatus and method.
  21. McDermott Wayne T. (Allentown PA) Ockovic Richard C. (Allentown PA) Wu Jin J. (Ossining NY) Cooper Douglas W. (Millwood NY) Schwarz Alexander (Allentown PA) Wolfe Henry L. (Pleasant Valley NY), Surface cleaning using a cryogenic aerosol.
  22. McDermott Wayne T. (Allentown PA) Ockovic Richard C. (Northampton PA) Wu Jin J. (Ossining NY) Cooper Douglas W. (Milwood NY) Schwarz Alexander (Bethlehem PA) Wolfe Henry L. (Pleasant Valley NY), Surface cleaning using an argon or nitrogen aerosol.
  23. Peterson Ronald V. (Thousand Oaks CA) Krone-Schmidt Wilfried (Fullerton CA), System for precision cleaning by jet spray.

이 특허를 인용한 특허 (9)

  1. Seasly, Elaine E.; Seasly, Zachariah A., Automated non-contact cleaning.
  2. Eliasson, Bertil; Hallberg, Per-Åke; Carlsson, Lennart; Engman, Fredrik, Device and use in connection with measure for combating.
  3. Ahmadi, Goodarz; Lewis, Paul E.; Tannous, Adel George; Makhamreh, Khalid; Compton, Keith H., Methods for cleaning surfaces substantially free of contaminants utilizing filtered carbon dioxide.
  4. Ahmadi, Goodarz; Lewis, Paul E.; Tannous, Adel George; Makhamreh, Khalid, Methods for cleaning utilizing multi-stage filtered carbon dioxide.
  5. Boumerzoug,Mohamed; Tannous,Adel George, Methods for residue removal and corrosion prevention in a post-metal etch process.
  6. Boumerzoug,Mohamed; Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and cleaning surfaces substantially free of contaminants.
  7. Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants.
  8. Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants.
  9. Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants.
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