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A fuel cell system determines each of a battery charging current error, a battery voltage error, and a stack current error. The fuel cell system regulates current through a series pass element in response to a greater of the determined errors, operating in three modes: battery voltage limiting mode,

A fuel cell system determines each of a battery charging current error, a battery voltage error, and a stack current error. The fuel cell system regulates current through a series pass element in response to a greater of the determined errors, operating in three modes: battery voltage limiting mode, stack current limiting mode and battery charging current limiting mode. Additionally, there can be a fourth "saturation" mode where the stack voltage VSdrops below the battery voltage VB. A voltage difference across the series pass element is compared to a desired condition such as a saturation level, and a partial pressure of a reactant flow to the fuel cell stack adjusted based on the determined amount of deviation limiting the energy dissipated by the series pass element. Individual fuel cell systems can be combined in series and/or parallel to produce a combined fuel cell system having a desired output voltage and current.

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A fuel cell system determines each of a battery charging current error, a battery voltage error, and a stack current error. The fuel cell system regulates current through a series pass element in response to a greater of the determined errors, operating in three modes: battery voltage limiting mode,

A fuel cell system determines each of a battery charging current error, a battery voltage error, and a stack current error. The fuel cell system regulates current through a series pass element in response to a greater of the determined errors, operating in three modes: battery voltage limiting mode, stack current limiting mode and battery charging current limiting mode. Additionally, there can be a fourth "saturation" mode where the stack voltage VSdrops below the battery voltage VB. A voltage difference across the series pass element is compared to a desired condition such as a saturation level, and a partial pressure of a reactant flow to the fuel cell stack adjusted based on the determined amount of deviation limiting the energy dissipated by the series pass element. Individual fuel cell systems can be combined in series and/or parallel to produce a combined fuel cell system having a desired output voltage and current. sers," J. Nat'l Cancer Inst., 85:912-916, 1993. Jacoby et al., "Chemopreventive efficacy of combined piroxicam and difluoromethylornithine treatment of Apc mutant min mouse adenomas, and selective toxicity against Apc mutant embryos," Cancer Res., 60:1864-1870, 2000. Kawamori et al., "Chemopreventive activity of celecoxib, a specific cyclooxygenase-2 inhibitor, against colon carcinogenesis." Cancer Res 58: 409-412, 1998. Kulkarni et al., "Effect of the chemopreventive agents piroxicam and D,L-α-difluoromethylornithine on intermediate biomarkers of colon carcinogenesis," Carcinogenesis, 13:995-1000, 1992. Li et al., "Prevention by aspirin and its combination with α- difluoromethylornithine of azoxymethane-induced tumors, aberrant crypt foci and prostaglandin E2 levels in rat colon." Carcinogenesis 20: 425-30, 1999. Luk and Baylin, "Onithine decarboxylase as a biological marker in familial colonic polyposis," N. Eng. J. Med., 311:80-83, 1984. McCann and Pegg, "Ornithine decarboxylase as an enzyme target for therapy," Pharmacol. Ther.,54:195-215, 1992. Meyskens and Gerner, "Development of difluoromethylornithine as a chemoprevention agent for the management of colon cancer," J. Cell. Biochem., 22:126-131, 1995. Muscat et al., "Nonsteroidal antiinflammatory drugs and colorectal cancer," Cancer, 74:1847-1854, 1994. Pegg, "Polyamine metabolism and its importance in neoplastic growth and a target for chemotherapy," Cancer Res., 48:759-774, 1988. Reddy et al., "Chemoprevention of colon carcinogenesis by concurrent administration of piroxicam, a nonsteroidal anti-inflammatory drug with D,L-α-difluoromethylornithine, and ornithine decarboxylase inhibitor, in diet," Cancer Res., 50:2562-2568, 1990. Ritland and Gendler, "Chemoprevention of intestinal adenomas in the ApcMinmouse by piroxicam: kinetics, strain effects and resistance to chemosuppression." Carcinogenesis 20: 51-58, 1999. Singh and Lippman, "Cancer chemoprevention--Part 1: retinoids and carotenoids and other classic antioxidants," Oncology, 12:1643-1660, 1998. Tempero et al., "Chemoprevention of mouse colon tumors with difluromethylornithine during and after carcinogen treatment," Cancer Res., 49:5793-5797, 1989. ee radical generating compound is selected from the group consisting of peroxides and azo compounds. 6. The method of claim 5, wherein the peroxides are selected from the group consisting of dibenzoyl peroxide, t-butylperoxide, t-butyl hydroperoxide, and di-tert butyl peroxide. 7. The method of claim 5, wherein the azo compounds are selected from the group consisting of 1,1'-azobis(cyclohexanecarbonitrile); azodicarbonamide; 2,2'-azobis(2,4-dimethylpentenenitrile); 2,2'-azobis(2-ethylpropanimidamide).2HCl; 2,2'-azobis(isbutyronitrile); 2,2'-azobis(2-methyl-butanenitrile); 4,4'-azobis(4-cyanopentanoic acid); 2,2'-azobis(2-acetoxypropane); 2-(tert-butylazo)-4-methoxy-2,4-dimethylpentanenitrile; 2-(tert-butylazo)-2,4-dimethylpentanenitrile; 4-(tert-butylazo)-4-cyanopentanoic acid; 2-(tert-butylazo) isobutyronitrile; 2-(tert-butylazo)-2-methylbutanenitrile; 1-(tert-amylazo)cyclohexanecarbonitrile; 1-(tert-butylazo)cyclohexanecarbonitrile; and 1-(tert-butylazo)-formamide. 8. The method of claim 1, wherein the thermoplastic material is melted is melted before melt blending with the thermoset rubber material. 9. The method of claim 8, wherein the free radical generating compound is added to the thermoset rubber material before melt blending the thermoset rubber material with the thermoplastic material. 10. The method of claim 1, wherein the thermoplastic material, the thermoset rubber material, and the free radical generating compound are combined and melt blended simultaneously. 11. The method of claim 1, wherein the free radical generating compound is combined with the thermoset rubber material before combining and melt blending with the thermoplastic material. 12. A thermoplastic product produced by melt blending particles of a thermoset rubber compound with particles of a thermoplastic compound in the presence of about 0.5 to 5 wt. % of a free radical generating compound at a temperature at or above the activation temperature of the free radical generating compound, the thermoplastic product having an elongational capability at least double that of the thermoplastic component. 13. The method of claim 12, wherein the free radical generating compound is selected from the group consisting of peroxides and azo compounds. 14. The method of claim 13, wherein the peroxides are selected from the group consisting of dibenzoyl peroxide, t-butylperoxide, t-butyl hydroperoxide, and di-tert butyl peroxide. 15. The method of claim 13, wherein the azo compounds are selected from the group consisting of 1,1'-azobis(cyclohexanecarbonitrile); azodicarbonamide; 2,2'-azobis(2,4-dimethylpentenenitrile); 2,2'-azobis(2-ethylpropanimidamide).2HCl; 2,2'-azobis(isbutyronitrile); 2,2'-azobis(2-methyl-butanenitrile); 4,4'-azobis(4-cyanopentanoic acid); 2,2'-azobis(2-acetoxypropane); 2-(tert-butylazo)-4-methoxy-2,4-dimethylpentanenitrile; 2-(tert-butylazo)-2,4-dimethylpentanenitrile; 4-(tert-butylazo)-4-cyanopentanoic acid; 2-(tert-butylazo) isobutyronitrile; 2-(tert-butylazo)-2-methylbutanenitrile; 1-(tert-amylazo)cyclohexanecarbonitrile; 1-(tert-butylazo)cyclohexanecarbonitrile; and 1-(tert-butylazo)-formamide. mine and tributylamine, and the selected deactivating agent is phosphoric acid at 85%. y another vacuum valve and has a volume smaller than that of said first chamber and enables adjustment of evacuation; an X-Y stage, provided with a stage upper part for placing the sample thereon, for moving the sample placed on said stage upper part to a position for drawing on the sample with said electron beam within said first chamber, said stage upper part having a structure separable from said X-Y stage; and a loading means for removing said stage upper part from said X-Y stage and moving said stage upper part to said third chamber in the evacuation atmosphere condition from said first chamber; wherein said stage upper part removed from said X-Y stage is removable from said third chamber to outside of said third chamber without setting said first chamber to atmospheric condition, independently of exchanging of the sample as the drawing object on which the drawing has been completed. 2. An electron beam lithography system according to claim 1, wherein said stage upper part includes an electrostatic chuck part and a ground pin part contactable with the sample on said X-Y stage, wherein said electrostatic chuck part is enabled to be cleaned and said ground pin part is enabled to be exchanged upon removal from said third chamber to outside of said third chamber. 3. An electron beam lithography system to conduct drawing on a sample with an electron beam within a stage chamber in an evacuation atmosphere condition, comprising: a sample exchange chamber which is separated from said stage chamber by a vacuum valve to enable exchange of the sample on which the drawing has been completed on the sample as a drawing object; an evacuation chamber in an adjusted evacuation condition for loading a sample as the drawing object and unloading a sample having completed the drawing; an adjustment chamber which is separated from said stage chamber by a vacuum valve and has a volume smaller than that of said stage chamber and enables adjustment of evacuation; an X-Y stage, provided with a stage upper part for placing said sample thereon, for moving the sample placed on said stage upper part to a position for drawing on the sample with said electron beam within said stage chamber, said stage upper part having a structure separable from said X-Y stage; and a loading means for removing said stage upper part from said X-Y stage and moving said stage upper part to said adjustment chamber in the evacuation atmosphere condition from said stage chamber; wherein said stage upper part is removable from said adjustment chamber to outside of said adjustment chamber without setting said stage chamber to atmospheric condition, independently of exchanging of the sample as the drawing object having the drawing completed thereon through the sample exchange chamber. 4. An electron beam lithography system according to claim 3, wherein said stage upper part includes an electrostatic chuck part and a ground pin part contactable with the sample on said X-Y stage, wherein said electrostatic chuck part is enabled to be cleaned and said ground pin part is enabled to be exchanged upon removal from said adjustment chamber to outside of said adjustment chamber. 5. An electron beam lithography system to conduct drawing on a sample with an electron beam within a stage chamber in an evacuation atmosphere condition; comprising: an evacuation chamber in an adjusted evacuation condition for loading a sample as a drawing object and unloading a sample having completed the drawing; a sample exchange chamber which is separated from said evacuation chamber and said stage chamber vacuum valves for exchanging the sample as the drawing object and the sample having completed the drawing between said evacuation chamber and stage chamber in the evacuation atmosphere condition; another chamber which is separated from said stage chamber by a vacuum valve, said another chamber being adjustable in evacuation condition and having a volume smaller than said stage chamber; an X-Y stage disposed in said stage chamber and having a separable stage upper part for placing said sample thereon and for moving to a position for drawing on said sample with the electron beam within said stage chamber; and a loading means for separating said separable stage upper part from said X-Y stage and for moving said separable stage upper part to said another chamber in the evacuation atmosphere condition from said stage chamber; wherein said separable stage upper part of said X-Y stage is removable from said another chamber independently of said sample without setting said stage chamber to atmosphere condition. 6. An electron beam lithography system according to claim 5, wherein said loading means includes an arm in which a first projection to place both edges provided opposed with each other of said sample as the moving object and said projections to place both edges provided opposed with each other of said separable stage upper part as the moving object are arranged in order to select either of said sample or said separable stage upper part through vertical movement on said arm. 7. An electron lithography system for conducting drawing with an electron beam through positioning with an X-Y stage by individually loading samples to a first chamber in an evacuation atmosphere condition through a second chamber, wherein a stage upper part of said X-Y stage which is separable from said X-Y stage and which includes an electrostatic chuck for attracting the sample and a ground pin for maintaining the sample to the equal potential through contact with said sample attracted by said electrostatic chuck is loaded to the X-Y stage in said first chamber and is separately unloaded therefrom through a third chamber without setting said first chamber to atmosphere condition, and thereby said stage upper part can be loaded and unloaded independently of the sample. 8. An electron beam lithography system to conduct drawing on a sample with an electron beam within a first chamber in an evacuation atmosphere condition, comprising: a second chamber which is separated from said first chamber by a vacuum valve to enable exchange of the sample on which the drawing has been completed on the sample as a drawing object; a third chamber which is separated from said first chamber by another vacuum valve and has a volume smaller than that of said first chamber and enables adjustment of evacuation; an X-Y stage disposed in said first chamber and having a separable stage upper part for placing the sample thereon and for moving said separable stage upper part with said sample thereon to a position for drawing on said sample with said electron beam within said first chamber; and a loading means for removing the separable stage upper part from said X-Y stage and for moving said separated stage upper part to said third chamber in the evacuation atmosphere condition from said first chamber; wherein said separable stage upper part of said X-Y stage is independently removable from the sample through said third chamber to outside of said third chamber without setting said first chamber to atmosphere condition. X is CN; Y is N or NH; Z is CH or CH2,with Z being CH2when Y is NH, with Y--Z forming a single bond, and Z being CH when Y is N, with Y--Z forming a double bond; R1,R2,R3and R4are the same or different and are independently selected from hydrogen, alkyl, alkenyl, alkynyl, cycloalkyl, cycloalkylalkyl, bicycloalkyl, bicycloalkylalkyl, alkylthioalkyl, arylalkylthioalkyl, cycloalkenyl, aryl, aralkyl; all optionally substituted through available carbon atoms with 1, 2, 3, 4 or 5 groups selected from hydrogen, halo, alkyl, polyhaloalkyl, alkoxy, haloalkoxy, polyhaloalkoxy, alkoxycarbonyl, alkenyl, alkynyl, cycloalkyl, cycloalkylalkyl, polycycloalkyl, arylamino, hydroxy, hydroxyalkyl, nitro, cyano, amino, substituted amino, alkylamino, dialkylamino, thiol, alkylthio, alkylcarbonyl, acyl, alkoxycarbonyl, aminocarbonyl, alkynylaminocarbonyl, alkylaminocarbonyl, alkenylaminocarbonyl, alkylcarbonyloxy, alkylcarbonylamino, arylcarbonylamino, alkylsulfonylamino, alkylaminocarbonylamino, alkoxycarbonylamino, alkylsulfonyl, aminosulfinyl, aminosulfonyl, alkylsulfinyl, sulfonamido or sulfonyl; and R1and R3may optionally be taken together to form --(CR5R6)m-- where m is 2 to 6, and R5and R6are the same or different and are independently selected from hydroxy, alkoxy, H, alkyl, alkenyl, alkynyl, cycloalkyl, cycloalkylalkyl, cycloalkenyl, aryl, arylalkyl, alkylcarbonylamino, arylcarbonylamino, alkoxycarbonylamino, aryloxycarbonylamino, alkoxycarbonyl, aryloxycarbonyl, or alkylaminocarbonylamino, or R1and R4may optionally be taken together to form --(CR7R8)p-- wherein p is 3 to 6, and R7and R8are the same or different and are independently selected from hydroxy, alkoxy, cyano, H, alkyl, alkenyl, alkynyl, cycloalkyl, cycloalkylalkyl, cycloalkenyl, aryl, arylalkyl, alkylcarbonylamino, arylcarbonylamino, alkoxycarbonylamino, aryloxycarbonylamino, alkoxycarbonyl, aryloxycarbonyl, or alkylaminocarbonylamino, all stereoisomers thereof; and a pharmaceutically acceptable salt thereof. 2. The compound as defined in claim 1 having the structure 3. The compound as defined in claim 1 having the structure 4. The compound as defined in claim 1 having the structure 5. The compound as defined in claim 1 having the structure wherein R1is H, alkyl, cycloalkyl or bicycloalkyl. 6. The compound as defined in claim 1 wherein R3is H or alkyl, R1is H, alkyl, cycloalkyl or bicycloalkyl, R2is H or alkyl, n is 0, and X is CN. 7. The compound as defined in claim 1 wherein X is CN and has the configuration 8. The compound as defined in claim 1 having the structure 9. A pharmaceutical composition comprising a compound as defined in claim 1 and a pharmaceutically acceptable carrier therefor. r streams at said location adjacent said upstream ends of the conversion stages; withdrawing said combined cooling air streams from said converter at a location adjacent the upstream ends of said channels; sensing the temperature of the gaseous oxide-containing stream in a channel, adjacent the upstream end of the conversion stage in said channel; controlling the flow of the first cooling air stream into said converter in response to said sensing of the temperature in said gaseous oxide-containing stream; sensing the temperature of the second gaseous mixture flowing out of the converter; and controlling the flow of the second cooling air stream into said converter in response to said sensing of the temperature of said second gaseous mixture. 25. A process as recited in claim 17 wherein each of said channels comprises a downstream cooling stage located between (a) said downstream end of said conversion stage in said channel and (b) said downstream channel end, said downstream cooling stage having upstream and downstream ends, and wherein said cooling of said gaseous oxide-containing streams in the channels comprises: flowing a first cooling air stream into said converter at a first location adjacent the upstream end of each channel; flowing a second cooling air stream into said converter at a second location adjacent said upstream end of said conversion stage; flowing a third cooling air stream into said converter at a third location adjacent the upstream end of said downstream cooling stage; sensing the temperature of the gaseous oxide-containing stream in a channel, adjacent the upstream end of the conversion stage in the channel; controlling the flow of said first cooling air stream in response to said temperature sensed adjacent the upstream end of the conversion stage; sensing the temperature of the gaseous oxide-containing stream in a channel, adjacent the downstream end of the conversion stage in the channel; controlling the flow of said second cooling air stream into said converter in response to said temperature sensed adjacent the downstream end of the conversion stage; sensing the temperature of the gaseous oxide-containing stream in a channel adjacent the downstream end of the downstream cooling stage in said channel; and controlling the flow of said third cooling air stream into said converter in response to the temperature sensed at the downstream end of the downstream cooling stage. 26. A process as recited in claim 25 and comprising: combining said first and second cooling air streams at said second location; combining said third cooling air stream with the first and second cooling air streams at said third location; and withdrawing said combined cooling air streams from said converter at a fourth location adjacent the downstream end of the downstream cooling stage. 27. A process as recited in claim 25 and comprising: combining said first and second cooling air streams at said second lo