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Spent caustic and other wastewater streams are pretreated by continuous chemical oxidation. According to one aspect, a wastewater stream is pretreated by continuous chemical oxidation in a plug flow reactor. According to another aspect, a catalyst and an oxidizer are fed into a wastewater stream at

Spent caustic and other wastewater streams are pretreated by continuous chemical oxidation. According to one aspect, a wastewater stream is pretreated by continuous chemical oxidation in a plug flow reactor. According to another aspect, a catalyst and an oxidizer are fed into a wastewater stream at first and second predetermined points of addition. Compounds in the wastewater stream susceptible to chemical oxidation are reacted with the chemical oxidizer. A modular, optionally fully automated apparatus is provided for pretreating spent caustic and other wastewater streams.

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Spent caustic and other wastewater streams are pretreated by continuous chemical oxidation. According to one aspect, a wastewater stream is pretreated by continuous chemical oxidation in a plug flow reactor. According to another aspect, a catalyst and an oxidizer are fed into a wastewater stream at

Spent caustic and other wastewater streams are pretreated by continuous chemical oxidation. According to one aspect, a wastewater stream is pretreated by continuous chemical oxidation in a plug flow reactor. According to another aspect, a catalyst and an oxidizer are fed into a wastewater stream at first and second predetermined points of addition. Compounds in the wastewater stream susceptible to chemical oxidation are reacted with the chemical oxidizer. A modular, optionally fully automated apparatus is provided for pretreating spent caustic and other wastewater streams. 19890700, Finch; US-4871351, 19891000, Feingold; US-4871440, 19891000, Nagata et al.; US-4874500, 19891000, Madou et al.; US-4890620, 19900100, Gough; US-4894137, 19900100, Takizawa et al.; US-4897162, 19900100, Lewandowski et al.; US-4897173, 19900100, Nankai et al.; US-4909908, 19900300, Ross et al.; US-4911794, 19900300, Parce et al.; US-4917800, 19900400, Lonsdale et al.; US-4919141, 19900400, Zier et al.; US-4919767, 19900400, Vadgama et al.; US-4923586, 19900500, Katayama et al.; US-4927516, 19900500, Yamaguchi et al.; US-4934369, 19900600, Maxwell; US-4935105, 19900600, Churchouse; US-4935345,