초록 ▼

A method is disclosed for a endian correction at load time, thereby eliminating the need to perform multiple endian correction routines during execution. The method comprises obtaining a platform endian context corresponding to the processor; obtaining a operand endian context indicating the orderin

A method is disclosed for a endian correction at load time, thereby eliminating the need to perform multiple endian correction routines during execution. The method comprises obtaining a platform endian context corresponding to the processor; obtaining a operand endian context indicating the ordering of operands contained in the set of instructions to be loaded; reading an instruction in the set of instructions; determining whether an operational code for the instruction is endian antithetical to the platform endian context; if the operational code for the instruction is endian antithetical, reversing the endian order of the instruction; loading the instruction into an appropriate memory location; and repeating the above steps as required for each instruction until all of the instructions have been loaded into memory.

대표청구항 ▼

A method is disclosed for a endian correction at load time, thereby eliminating the need to perform multiple endian correction routines during execution. The method comprises obtaining a platform endian context corresponding to the processor; obtaining a operand endian context indicating the orderin

A method is disclosed for a endian correction at load time, thereby eliminating the need to perform multiple endian correction routines during execution. The method comprises obtaining a platform endian context corresponding to the processor; obtaining a operand endian context indicating the ordering of operands contained in the set of instructions to be loaded; reading an instruction in the set of instructions; determining whether an operational code for the instruction is endian antithetical to the platform endian context; if the operational code for the instruction is endian antithetical, reversing the endian order of the instruction; loading the instruction into an appropriate memory location; and repeating the above steps as required for each instruction until all of the instructions have been loaded into memory. otrudes from the opening at the end of the tapered guide portion. 4. A focused ion beam apparatus according to claim 2; wherein the solid inflexible pipes are formed of stainless steel and the flexible portion is formed of Teflon. 5. A focused ion beam apparatus according to claim 1; wherein each of the nozzles is provided with an engaging portion which contacts an inner surface of the tapered guide portion in the vicinity of the opening when a respective nozzle protrudes from the opening at the end of the tapered guide portion. 6. A focused ion beam apparatus having a gas injector, the gas injector comprising: a plurality of gas supply pipes each having a nozzle at one end; a cylindrical member for accommodating the gas supply pipes and having a tapered nozzle guide portion provided with an opening having a size sufficient to allow only one of the nozzles to protrude outwardly at an end thereof, the tapered nozzle guide portion extending from the cylindrical portion to the opening and having a tapered profile; and a driving mechanism for selectively driving a desired one of the nozzles to protrude out of the opening. 7. In a focused particle beam apparatus, a gas injector comprising: a plurality of gas supply pipes each having a nozzle at one end for ejecting a gas; and a housing in which the plurality of gas supply pipes are slidably accommodated, the housing having a tip portion with a hole provided at a terminal end thereof, the hole having a size set so that only one of the nozzles can extend therefrom, and having a tapered nozzle guide portion for guiding a selected nozzle from a retracted position at which the selected nozzle does not extend from the hole to an extended position at which the selected nozzle extends from the hole. 8. A focused particle beam apparatus according to claim 7; wherein the gas supply pipes each comprise solid inflexible pipes connected by a flexible member such that the respective gas supply pipes can be guided through the tapered nozzle guide portion to allow the respective nozzles to smoothly protrude from the opening at the end thereof. 9. A focused particle beam apparatus according to claim 8; wherein the solid inflexible pipes are formed of stainless steel. 10. A focused particle beam apparatus according to claim 8; wherein the flexible portion is formed of teflon. 11. A focused particle beam apparatus according to claim 7; wherein each of the nozzles is provided with an engaging portion which contacts an inner surface of the tapered nozzle guide portion in the vicinity of the opening when a respective nozzle protrudes from the opening at the end of the tapered nozzle guide portion. 12. A focused particle beam apparatus according to claim 7; wherein the housing has a substantially cylindrical shape. 13. A focused particle beam apparatus according to claim 7; wherein the tip portion has a tapered profile forming the tapered nozzle guide portion.