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An apparatus and system for extracorporeal treatment utilizes a hemodialysis machine capable of heating dialysis fluid to 48° C., an optional parallel plate hemodialyzer together with a sorbent-based detoxifier, a tubular heat exchanger and a high flow pump--in addition to various probes and cathete

An apparatus and system for extracorporeal treatment utilizes a hemodialysis machine capable of heating dialysis fluid to 48° C., an optional parallel plate hemodialyzer together with a sorbent-based detoxifier, a tubular heat exchanger and a high flow pump--in addition to various probes and catheters--to effect extracorporeal treatment without adverse physiological effect and without the specific need for general anesthesia. The system inheres in the combined high flow of the pump-up to 2400 ml per minute--and the high temperature--52° C.--achievable in the heat exchanger, which together provide unprecedented speed and efficiency in the administration of hyperthemia treatments. The system is also a potentiating system in the administration of heat sensitive pharmaceutically active agents and is praticularly useful in the isolated anatomic areas of a patient.

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An apparatus and system for extracorporeal treatment utilizes a hemodialysis machine capable of heating dialysis fluid to 48° C., an optional parallel plate hemodialyzer together with a sorbent-based detoxifier, a tubular heat exchanger and a high flow pump--in addition to various probes and cathete

An apparatus and system for extracorporeal treatment utilizes a hemodialysis machine capable of heating dialysis fluid to 48° C., an optional parallel plate hemodialyzer together with a sorbent-based detoxifier, a tubular heat exchanger and a high flow pump--in addition to various probes and catheters--to effect extracorporeal treatment without adverse physiological effect and without the specific need for general anesthesia. The system inheres in the combined high flow of the pump-up to 2400 ml per minute--and the high temperature--52° C.--achievable in the heat exchanger, which together provide unprecedented speed and efficiency in the administration of hyperthemia treatments. The system is also a potentiating system in the administration of heat sensitive pharmaceutically active agents and is praticularly useful in the isolated anatomic areas of a patient. connected to provide electrical power to the target to bias said target to attract sputtering ions; a second ionization electrical power supply adapted to provide RF power to a region within the chamber between the target and the workpiece position so as to ionize a substantial portion of the material sputtered from the target; a third bias electrical power supply connected to provide electrical power to the workpiece; and an ionized target material deflecting magnet positioned adjacent the workpiece support chuck and adapted to provide an ionized target material deflecting magnetic field having a magnitude sufficient to deflect a portion of the ionized target material in a direction transverse to said first axis prior to being deposited on the workpiece. 2. A chamber according to claim 1, wherein the ionized target material deflecting magnet is controllable to adjust the magnitude of the magnetic field, so as to adjust deflection of the ionized target material in a direction transverse to said first axis. 3. A chamber according to claim 2, wherein the workpiece defines openings having sidewalls and the magnetic field has a magnitude sufficient to increase the rate at which material sputtered from the target deposits on upper portions of side walls of openings in the workpiece relative to the rate at which it deposits on lower portions of said side walls. 4. A chamber according to claim 1, wherein: the position at which the chuck holds the workpiece is planar and is perpendicular to said first axis; and the magnetic field produced by the ionized target material deflecting magnet is parallel to the planar workpiece position. 5. A chamber according to claim 1, wherein the ionized target material deflecting magnet is adapted to rotate the magnetic field around said first axis. 6. A chamber according to claim 5, wherein the ionized target material deflecting magnet comprises: a magnet assembly including a plurality of permanent magnets encircling the chamber; and a motor adapted to mechanically rotate the permanent magnets. 7. A chamber according to claims, wherein the ionized target material deflecting magnet comprises: four electromagnets azimuthally spaced around the chamber, each electromagnet having an axis perpendicular to said first axis; and a fourth electrical power supply connected to supply an alternating current to the four electromagnets in a quadrature phase relationship, so that the current produces in the four electromagnets a magnetic field that rotates around said first axis. 8. The chamber according to claim 5, wherein said ionized target material deflecting magnetic field rotates at a frequency between 0.1 and 60 Hz. 9. The chamber according to claim 1, wherein said ionized target material deflecting magnetic field is oriented perpendicular to said first axis. 10. The chamber according to claim 1, wherein the magnitude of said ionized target material deflecting magnetic field is within a range of 200-500 gauss. 11. The chamber according to claim 1, wherein said chamber has a sheath region above the surface of the workpiece and a presheath region extending from 1 to 3 cm. above the sheath region through which the ionized material passes prior to being deposited onto said workpiece, and wherein said ionized target material deflecting magnetic field extends through at least said presheath region. 12. The chamber according to claim 1, wherein the sputtering gas is excited into a plasma state by the electrical power supplied by one or more of the power supplies, so as to produce a plasma within the chamber between the target and the workpiece position; wherein the third bias electrical power supply provides to the workpiece a bias voltage that is negative relative to the plasma so as to accelerate the ionized target material toward the workpiece position; and wherein a portion of the ionized target material is deflected by said ionized target material deflecting magnetic field of said ion