초록 ▼

The present invention provides compositions which reduce the possibility of inducing microbial resistance. The compositions comprise a fast-acting antimicrobial agent and a long-lasting antimicrobial agent. The combined effect of the antimicrobial agents reduces microbial infection and resistance. A

The present invention provides compositions which reduce the possibility of inducing microbial resistance. The compositions comprise a fast-acting antimicrobial agent and a long-lasting antimicrobial agent. The combined effect of the antimicrobial agents reduces microbial infection and resistance. Articles comprising the compositions of the present invention and methods for their manufacture are also provided.

대표청구항 ▼

The present invention provides compositions which reduce the possibility of inducing microbial resistance. The compositions comprise a fast-acting antimicrobial agent and a long-lasting antimicrobial agent. The combined effect of the antimicrobial agents reduces microbial infection and resistance. A

The present invention provides compositions which reduce the possibility of inducing microbial resistance. The compositions comprise a fast-acting antimicrobial agent and a long-lasting antimicrobial agent. The combined effect of the antimicrobial agents reduces microbial infection and resistance. Articles comprising the compositions of the present invention and methods for their manufacture are also provided. ; US-4944878, 19900700, Lockridge; US-4954324, 19900900, Hooper; US-5000930, 19910300, Boguslawski; US-5009872, 19910400, Chuang et al.; US-5023063, 19910600, Stiles; US-5112796, 19920500, Iannicelli; US-5176888, 19930100, Stiles; US-5192515, 19930300, Gardner-Chavis et al.; US-5199263, 19930400, Green et al.; US-5200160, 19930400, Benson et al.; US-5246554, 19930900, Cha; US-5277890, 19940100, Wang et al.; US-5348726, 19940900, Wang et al.; US-5366710, 19941100, Chou et al., 423/235; US-5384301, 19950100, Flytzani-Stephanopouluos et al.; US-5391365, 19950200, Wang et al.; US-5439658, 19950800, Johnson et al.; US-5456892, 19951000, Yang et al.; US-5607496, 19970300, Brooks; US-5658544, 19970800, Goodes; US-5672323, 19970900, Bhat et al.; US-5700439, 19971200, Goyette et al.; US-5780000, 19980700, Strickland; US-5798088, 19980800, Dorchak et al.; US-5853684, 19981200, Fang et al.; US-5888926, 19990300, Biswas et al., 502/406; US-6010666, 20000100, Chihiro et al.; US-6039783, 20000300, Lueck et al.; US-6066590, 20000500, Horil