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A surveying instrument includes a sighting for sighting an object; a beam-splitting optical system positioned between an objective lens and an eyepiece, and having a wavelength selection mirror which reflects light with specific wavelengths while allowing light having wavelengths other than the spec

A surveying instrument includes a sighting for sighting an object; a beam-splitting optical system positioned between an objective lens and an eyepiece, and having a wavelength selection mirror which reflects light with specific wavelengths while allowing light having wavelengths other than the specific wavelengths to pass therethrough; an optical distance meter which includes a light-transmitting optical system for transmitting measuring light toward the object, and a light-receiving optical system for receiving light reflected by the object; and a phase-difference detection type focus detecting device which detects a focus state from a correlation between a pair of images respectively formed by two light bundles which are passed through two different pupil areas on the objective lens and the wavelength selection mirror. The two different pupil areas are positioned so that the two light bundles are incident on the wavelength selection mirror at the same incident angle.

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A surveying instrument includes a sighting for sighting an object; a beam-splitting optical system positioned between an objective lens and an eyepiece, and having a wavelength selection mirror which reflects light with specific wavelengths while allowing light having wavelengths other than the spec

A surveying instrument includes a sighting for sighting an object; a beam-splitting optical system positioned between an objective lens and an eyepiece, and having a wavelength selection mirror which reflects light with specific wavelengths while allowing light having wavelengths other than the specific wavelengths to pass therethrough; an optical distance meter which includes a light-transmitting optical system for transmitting measuring light toward the object, and a light-receiving optical system for receiving light reflected by the object; and a phase-difference detection type focus detecting device which detects a focus state from a correlation between a pair of images respectively formed by two light bundles which are passed through two different pupil areas on the objective lens and the wavelength selection mirror. The two different pupil areas are positioned so that the two light bundles are incident on the wavelength selection mirror at the same incident angle. ighted delta by subtracting the average from the Y distortion factor; calculating a weighting ratio by dividing the smaller of the vertical and horizontal mask dimensions by the larger of said vertical and horizontal dimensions; selecting the distortion factor delta of the X or Y axis aligned with the smaller of the horizontal and vertical mask dimensions multiplying the selected distortion factor delta by the weighting ratio, thereby generating a weighted delta; calculating a composite weighted distortion factor by adding the distortion factor average to the weighted delta and the remaining non-weighted delta; and selecting the projection lens magnification or reduction setting responsive to the composite weighted distortion factor. 3. The method of claim 1 wherein the step of selecting a projection lens magnification or reduction setting more responsive to the distortion factor of the X or Y axis aligned with the greater of the horizontal and vertical mask dimensions further comprises the steps of: calculating a denominator by adding the mask horizontal dimension to the mask vertical dimension; generating a weighted X distortion factor by multiplying the X distortion factor by the mask horizontal or vertical dimension aligned to the X axis and dividing by the denominator; generating a weighted Y distortion factor by multiplying the Y distortion factor by the mask horizontal or vertical dimension aligned to the Y axis and dividing by the denominator; calculating a total distortion factor by adding the weighted X distortion factor to the weighted Y distortion factor; and selecting the projection lens magnification or reduction setting responsive to the total distortion factor. 4. The method of claim 1 wherein the photosensitive substrate surface is a glass substrate coated with a photo "resist." 5. The method of claim 1 wherein the photosensitive substrate surface is a metallic substrate coated with a photo "resist." 6. The method of claim 1, further comprising the steps of: providing a plurality of fiducials on the planar surface; providing a data set, the data set comprising a predicted X axis coordinate and a predicted Y axis coordinate for each of the fiducials; observing an actual X axis coordinate and an actual Y axis for each of the panel fiducials; calculating an X axis distortion factor by comparing the predicted fiducial X axis coordinate of each fiducial to the actual X axis coordinate for that fiducial; calculating a Y axis distortion factor by comparing the predicted fiducial Y axis coordinate of each fiducial to the actual Y axis coordinate for that fiducial; aligning a first panel projection site on said panel to said image mask responsive to the fiducials; providing a light source above the mask; projecting light from the light source through the mask, thereby generating a mask image; the projection lens receiving the mask image, magnifying or reducing the mask image and projecting a magnified or reduced mask image upon the panel surface first site position. 7. The method of claim 6, further comprising the steps of: providing a second site position on the panel surface; utilizing the fiducials to position said second site of said panel in alignment to said image mask; selecting a projection lens magnification or reduction setting responsive to the X and Y axis distortion factors, wherein the magnification or reduction selection is more responsive to the distortion factor of the X or Y axis aligned with the greater of the horizontal and vertical mask dimensions; and projecting light from the light source through the mask, thereby generating a mask image; and the projection lens receiving the mask image, and magnifying or reducing and projecting a magnified or reduced mask image upon the panel surface second site position. 8. An imaging projection system and apparatus, comprising: a programmable system controller; a table for receiving substrate panels having a generally planar photosensitive surface having an X axis and a Y axis normal to the X axis; a mask holder connected to the system controller and configured to receive an image mask having a horizontal side dimension and a vertical side dimension normal to the horizontal, wherein one of the horizontal and vertical dimensions is greater than the other, wherein the mask holder is further configured to align either of the horizontal and vertical mask side dimensions with one of the panel X or Y axes, thereby aligning the other of the horizontal and vertical mask side dimensions with the other of the panel X or Y axes; a projection lens with a range of magnification and reduction settings connected to the system controller and disposed below the mask holder and above the table, the projection lens configured to receive a mask image projected through an image mask held by the mask holder and magnify or reduce and project the mask image upon a substrate panel surface, the lens further configured to select a magnification or reduction setting responsive to the system controller; wherein the controller system is programmed to select a projection lens magnification or reduction setting responsive to an X axis distortion factor and a Y axis distortion factor, wherein the magnification or reduction selection is more responsive to the distortion factor of the X or Y axis aligned with the greater of the horizontal and vertical mask dimensions. 9. The imaging projection system and apparatus of claim 8, wherein the controller system programming selecting a projection lens magnification or reduction setting more responsive to the distortion factor of the X or Y axis aligned with the greater of the horizontal and vertical mask dimensions further comprises: a program step configured to calculate an average of the X and Y distortion factors; a program step configured to then calculate an X distortion factor non-weighted delta by subtracting the average from the X distortion factor; a program step configured to then calculate a Y distortion factor non-weighted delta by subtracting the average from the Y distortion factor; a program step configured to then calculate a weighting ratio by dividing the smaller of the vertical and horizontal mask dimensions by the larger of said vertical and horizontal dimensions; a program step configured to then select the distortion factor delta of the X or Y axis aligned with the smaller of the horizontal and vertical mask dimensions; a program step configured to then multiply the selected distortion factor delta by the weighting ratio, thereby generating a weighted delta; a program step configured to then calculate a composite weighted distortion factor by adding the distortion factor average to the weighted delta and the remaining non-weighted delta; and a program step configured to then select the projection lens magnification or reduction responsive to the composite weighted distortion factor. 10. The imaging projection system and apparatus of claim 8, wherein the controller system programming selecting a projection lens magnification or reduction setting more responsive to the distortion factor of the X or Y axis aligned with the greater of the horizontal and vertical mask dimensions further comprises: a program step configured to calculate a denominator by adding the mask horizontal dimension to the mask vertical dimension; a program step configured to calculate a weighted X distortion factor by multiplying the X distortion factor by the mask horizontal or vertical dimension aligned to the X axis and dividing by the denominator; a program step configured to calculate a weighted Y distortion factor by multiplying the Y distortion factor by the mask horizontal or vertical dimension aligned to the Y axis and dividing by the denominator; a program step configured to calculate a total distortion factor by adding the weighted X distortion factor to the weighted Y distortion factor; and a program step