$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Auto-switching gas delivery system utilizing sub-atmospheric pressure gas supply vessels 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • F17C-013/04
  • G05B-011/01
  • G05D-007/06
  • G06F-015/00
출원번호 US-0562300 (2000-05-01)
발명자 / 주소
  • Carpenter, Kent
  • Dietz, James
출원인 / 주소
  • Advanced Technology Materials, Inc.
대리인 / 주소
    Chappuis, MargaretHultquist, Steven J.Ryann, William F.
인용정보 피인용 횟수 : 32  인용 특허 : 20

초록

An auto-switching sub-atmospheric pressure gas delivery system, for dispensing gas to a gas-consuming process unit, e.g., a semiconductor manufacturing tool, without the occurrence of pressure spikes or flow perturbations.

대표청구항

An auto-switching sub-atmospheric pressure gas delivery system, for dispensing gas to a gas-consuming process unit, e.g., a semiconductor manufacturing tool, without the occurrence of pressure spikes or flow perturbations. al of oil and water vapor from compressed air; An air heat exchanger for coo

이 특허에 인용된 특허 (20)

  1. Berry Gaylord L. (Salt Lake City UT) Shan Yansong (Ann Arbor MI), Automated gas delivery system for blood gas exchange devices.
  2. Nakamura Masaki (Yokohama JPX) Fujie Nobuo (Kawasaki JPX) Okamoto Hiroyuki (Kawasaki JPX), Automatic gas distributing device controlled by a direct application of high gas pressure of a source for supplying a pi.
  3. Mese Hisayoshi (Taishibashi JPX) Kanaya Shigeo (Suita JPX), Ball valve.
  4. Philbin Brian (150 E. Wagon Wheel Dr. Phoenix AZ 85020), Control apparatus and method for controlling fluid flows and pressures.
  5. Loiseau Grard (Bois D\Arcy FRX) Molozay Maurice (Le Mesnil-Saint-Denis FRX) Rigo Michel (Lozanne FRX), Device for supplying a pipe with a fluid at a particular pressure from alternative sources.
  6. Wilmer Michael E., Dynamic gas flow controller.
  7. Stemporzewski ; Jr. Francis V. ; Shea Arthur W. ; Cadman Gary R. ; Beaulieu Richard O. ; Tougas Stephen F., Fail-safe fluid transfer controller.
  8. Thompson Gary E. (P.O. Box 773222 Steamboat Springs CO 80477), Fluid management system.
  9. Ohmi Tadahiro,JPX ; Kagazume Tetu,JPX ; Sugiyama Kazuhiko,JPX ; Dohi Ryousuke,JPX ; Minami Yukio,JPX ; Nishino Kouji,JPX ; Kawata Kouji,JPX ; Ikeda Nobukazu,JPX ; Yamaji Michio,JPX, Fluid supply apparatus.
  10. Ohmi Tadahiro,JPX ; Kagatsume Satoshi,JPX ; Hirose Jun,JPX ; Nishino Kouji,JPX, Fluid-switchable flow rate control system.
  11. Ohmi Tadahiro,JPX ; Kagatsume Satoshi,JPX ; Ikeda Nobukazu,JPX ; Nishino Kouji,JPX ; Yoshikawa Kazuhiro,JPX ; Ideta Eiji,JPX ; Dohi Ryousuke,JPX ; Uno Tomio,JPX ; Yamaji Michio,JPX, Gas supply system equipped with pressure-type flow rate control unit.
  12. Damrath Joachim,DEX ; Rothenberger Gerhard,DEX ; Kornberger Martin,DEX, Method and device for control of the flame size of gas-fired cooking or baking appliances.
  13. Brown Timothy R., Method for wide range gas flow system with real time flow measurement and correction.
  14. Nishino Koji,JPX ; Ikeda Nobukazu,JPX ; Morimoto Akihiro,JPX ; Minami Yukio,JPX ; Kawada Koji,JPX ; Dohi Ryosuke,JPX ; Fukuda Hiroyuki,JPX, Pressure type flow rate control apparatus.
  15. Ohmi Tadahiro,JPX ; Nishino Koji,JPX ; Ikeda Nobukazu,JPX ; Morimoto Akihiro,JPX ; Minami Yukio,JPX ; Kawada Koji,JPX ; Dohi Ryosuke,JPX ; Fukuda Hiroyuki,JPX, Pressure type flow rate control apparatus.
  16. Ohmi Tadahiro,JPX ; Kagazume Tetu,JPX ; Sugiyama Kazuhiko,JPX ; Dohi Ryousuke,JPX ; Uno Tomio,JPX ; Nishino Kouji,JPX ; Fukuda Hiroyuki,JPX ; Ikeda Nobukazu,JPX ; Yamaji Michio,JPX, Pressure-type flow rate control apparatus.
  17. Sierk Dennis A. (Huntsville AL) DuRoss Ronald R. (Huntsville AL) Geist Stephen G. (Union Grove AL) Hayes Gregory L. (Fayetteville TN), Process gas distribution system and method.
  18. Moriya Shuji (Yamanashi JPX) Matsuo Takenobu (Kofu JPX) Wakabayashi Tsuyoshi (Kofu JPX) Miura Kazutoshi (Tokyo JPX) Mori Takahiro (Sagamihara JPX), Processing apparatus using gas.
  19. Tom Glenn M. (New Milford CT) McManus James V. (Danbury CT), Storage and delivery system for gaseous hydride, halide, and organometallic group V compounds.
  20. Twerdochlib Michael (Oviedo FL) Bateman David E. (Geneva FL), Valve control apparatus.

이 특허를 인용한 특허 (32)

  1. Sawada, Yohei; Ikeda, Nobukazu; Dohi, Ryousuke; Nishino, Kouji, Apparatus for dividing and supplying gas and method for dividing and supplying gas by use of this apparatus.
  2. Wodjenski, Michael J., Auto-switching system for switch-over of gas storage and dispensing vessels in a multi-vessel array.
  3. Wodjenski,Michael J., Auto-switching system for switch-over of gas storage and dispensing vessels in a multi-vessel array.
  4. Sweeney, Joseph D.; Avila, Anthony M.; Wodjenski, Michael J.; Despres, Joseph R.; Baum, Thomas H., Endpoint determination for capillary-assisted flow control.
  5. Sweeney, Joseph D.; Avila, Anthony M.; Wodjenski, Michael J.; Despres, Joseph R.; Baum, Thomas H., Endpoint determination for capillary-assisted flow control.
  6. Sawusch, Stefan, Flow control method for multizone gas distribution.
  7. Heitz, Bernhard; Kirspel, Kevin, Fluid pressure control device for an analyzer.
  8. Dietz, James; Bishop, Steven E.; McManus, James V.; Lurcott, Steven M.; Wodjenski, Michael J.; Kaim, Robert; DiMeo, Jr., Frank, Fluid storage and dispensing system including dynamic fluid monitoring of fluid storage and dispensing vessel.
  9. Dietz, James; Bishop, Steven E.; McManus, James V.; Lurcott, Steven M.; Wodjenski, Michael J.; Kaim, Robert; Dimeo, Jr., Frank, Fluid storage and dispensing system including dynamic fluid monitoring of fluid storage and dispensing vessel.
  10. Dietz, James; Bishop, Steven E.; McManus, James V.; Lurcott, Steven M.; Wodjenski, Michael J.; Kaim, Robert; Dimeo, Jr., Frank, Fluid storage and dispensing system including dynamic fluid monitoring of fluid storage and dispensing vessel.
  11. McManus, James V.; Dietz, James; Lurcott, Steven M., Fluid storage and dispensing system including dynamic fluid monitoring of fluid storage and dispensing vessel.
  12. Okabe, Tsuneyuki, Gas supply apparatus for semiconductor manufacturing apparatus.
  13. Yamaguchi, Yuji; Yasuda, Tadahiro, Gas supply system.
  14. Okabe, Tsuneyuki, Gas supplying apparatus, cylinder cabinet provided with the same, valve box, and substrate process apparatus.
  15. Fujiwara,Akihiro; Hiramatsu,Shoji, MOCVD apparatus and method.
  16. Bell, Ian Tyler; Siverns, Steven Lloyd, Method and apparatus for changeover of container in a fluid dispenser.
  17. Monkowski, Adam J.; Chen, Jialing; Ding, Tao; Monkowski, Joseph R., Method and apparatus for gas flow control.
  18. Monkowski, Adam J.; Chen, Jialing; Ding, Tao; Monkowski, Joseph R., Method and apparatus for gas flow control.
  19. Monkowski, Adam J.; Chen, Jialing; Ding, Tao; Monkowski, Joseph R., Method and apparatus for gas flow control.
  20. Strang, Eric J., Method and apparatus for gas injection system with minimum particulate contamination.
  21. Lull, John M.; Valentine, William S., Method and apparatus for providing a determined ratio of process fluids.
  22. Lull, John M.; Valentine, William S., Method and apparatus for providing a determined ratio of process fluids.
  23. Lull,John M.; Valentine,William S., Method and apparatus for providing a determined ratio of process fluids.
  24. Lull,John M.; Valentine,William S., Method and apparatus for providing a determined ratio of process fluids.
  25. Lull,John M; Valentine,William S, Method and apparatus for providing a determined ratio of process fluids.
  26. Olander, W. Karl; Donatucci, Matthew B.; Wang, Luping; Wodjenski, Michael J., Pressure-based gas delivery system and method for reducing risks associated with storage and delivery of high pressure gases.
  27. Olander, W. Karl; Donatucci, Matthew B.; Wang, Luping; Wodjenski, Michael J., Pressure-based gas delivery system and method for reducing risks associated with storage and delivery of high pressure gases.
  28. Olander, W. Karl; Donatucci, Matthew B.; Wang, Luping; Wodjenski, Michael J., Pressure-based gas delivery system and method for reducing risks associated with storage and delivery of high pressure gases.
  29. Olander,W. Karl; Donatucci,Matthew B; Wang,Luping; Wodjenski,Michael J., Pressure-based gas delivery system and method for reducing risks associated with storage and delivery of high pressure gases.
  30. Eichelberger,Donald Paul; Farese,David John; Cohen,Joseph Perry; Colwell,Richard Layton, Self-contained mobile fueling station.
  31. Sato, Taketoshi; Tsuneda, Masayuki, Semiconductor device manufacturing method and substrate processing apparatus.
  32. Monkowski, Joseph R.; Monkowski, Adam J.; Chen, Jialing; Ding, Tao, Transient measurements of mass flow controllers.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로