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A process for forming a extremely low dielectric constant film over a substrate. The process includes coating a substrate with a solution comprising a soluble source of silicon oxide, water, a solvent, a surfactant and a catalyst using an ultrasonic spray nozzle. The coated substrate is then subsequ

A process for forming a extremely low dielectric constant film over a substrate. The process includes coating a substrate with a solution comprising a soluble source of silicon oxide, water, a solvent, a surfactant and a catalyst using an ultrasonic spray nozzle. The coated substrate is then subsequently treated to harden the solution into an extremely low dielectric constant film.

대표청구항 ▼

1. A process for forming an extremely low dielectric constant film over a substrate, said process comprising: coating said substrate with a solution comprising a soluble source of silicon oxide, water, a solvent, a surfactant and a catalyst using an ultrasonic spray nozzle, wherein said solution

1. A process for forming an extremely low dielectric constant film over a substrate, said process comprising: coating said substrate with a solution comprising a soluble source of silicon oxide, water, a solvent, a surfactant and a catalyst using an ultrasonic spray nozzle, wherein said solution is delivered to said ultrasonic spray nozzle from at least first and second separate sources that are combined at or immediately prior to said ultrasonic spray nozzle; and treating said coated substrate to harden the solution into said extremely low dielectric constant film. 2. The method of claim 1 wherein said coating step is performed in a sealed chamber having an exhaust port. 3. The method of claim 2 wherein said substrate is positioned within said sealed chamber on a rotatable substrate support during said coating step and said substrate is rotated during said coating step. 4. The method of claim 3 wherein during said coating step said ultrasonic spray nozzle is moved along a track while spraying said solution toward said substrate. 5. The method of claim 2 wherein said coating step comprises scanning said ultrasonic spray nozzle across an upper surface of said substrate. 6. The method of claim 5 wherein said scanning wherein said scanning moves said ultrasonic spray nozzle along a first x axis and a second y axis. 7. The method of claim 2 wherein said solvent has a boiling point below 100° C. 8. The method of claim 7 wherein said solvent is selected from the group consisting of ethanol, isopropanol and methanol. 9. The method of claim 1 wherein said catalyst is an acid catalyst. 10. The method of claim 1 wherein said first source comprises said soluble source of silicon oxide, said solvent and said surfactant and said second source comprises said water. 11. The method of claim 1 wherein said extremely low dielectric constant film is a interconnected porous structured silicon oxide film. 12. A process for forming an extremely low dielectric constant film over a substrate according to claim 1 wherein the first and second separate sources are combined at the ultrasonic spray nozzle and homogenized by the spray nozzle without the use of a separate mixing tank. 13. A process for forming an extremely low dielectric constant film over a substrate, said process comprising: coating said substrate with a solution comprising a soluble source of silicon oxide, water, a solvent, a surfactant and a catalyst using an ultrasonic spray nozzle in a vacuum chamber having an exhaust port and a vacuum pump operatively coupled to the exhaust port to enable the creation of a reduced pressure atmosphere within the chamber; and treating said coated substrate to harden the solution into said extremely low dielectric constant film. 14. The process of claim 13 wherein said solution is delivered to said ultrasonic spray nozzle from at least first and second separate sources that are combined at or immediately prior to said ultrasonic spray nozzle.