초록 ▼

An object of the present invention is to provide a process and an apparatus for treating a gas containing reducing substances to efficiently degrade and remove the reducing substances. As a means to achieve this object, the present invention provides a process for treating a gas containing reducing

An object of the present invention is to provide a process and an apparatus for treating a gas containing reducing substances to efficiently degrade and remove the reducing substances. As a means to achieve this object, the present invention provides a process for treating a gas containing reducing substances by hydrothermal electrolysis, comprising supplying a gas containing reducing substances into a reactor charged with an aqueous medium containing a halide ion under application of a direct current at a temperature of 100° C. or more but the critical temperature of said aqueous medium or less and at a pressure that allows said aqueous medium to be kept in the liquid phase.

대표청구항 ▼

1. A process for treating a gas containing reducing substances by hydrothermal electrolysis, comprising supplying an influent gas containing reducing substances into a reactor charged with an aqueous medium containing a halide ion under application of a direct current at a temperature of 100° C. or

1. A process for treating a gas containing reducing substances by hydrothermal electrolysis, comprising supplying an influent gas containing reducing substances into a reactor charged with an aqueous medium containing a halide ion under application of a direct current at a temperature of 100° C. or more but not more than the critical temperature of said aqueous medium and at a pressure that allows said aqueous medium to be kept in the liquid phase. 2. The process of claim 1 wherein the influent gas contains an organic halide. 3. The process of claim 1 further comprising the step of adding an oxidizer to said aqueous medium. 4. The process of claim 3 wherein oxygen in the influent gas is used as said oxidizer. 5. The process of claim 3 wherein air is added to the reaction system as said oxidizer. 6. The process of claim 1 further comprising the step of adding an alkali to said aqueous medium when said influent gas containing reducing substances is acidic. 7. The process of claim 1 further comprising the step of adding an acid to said aqueous medium when said influent gas containing reducing substances is basic. 8. A process for treating reducing substances contained in a liquid medium comprising transferring reducing substances contained in a liquid medium to a gas and supplying said gas as an influent gas to treat said gas by the process of claim 1. 9. The process of claim 1 further comprising the step of adding conductive particles into said aqueous medium. 10. The process of claim 9 further comprising the step of separating the conductive particles from said aqueous medium treated in the reactor. 11. A process for treating a gas containing reducing substances by hydrothermal electrolysis, comprising supplying a gas containing reducing substances into a reactor charged with an aqueous medium containing a strong acid ion under application of a direct current at a temperature of 100° C. or more but not more than the critical temperature of said aqueous medium and at a pressure that allows said aqueous medium to be kept in the liquid phase. 12. An apparatus for treating a gas containing reducing substances by hydrothermal electrolysis, comprising a reactor having an inlet for introducing a gas containing reducing substances and an outlet for discharging the gas treated and capable of resisting the pressure of hydrothermal reaction, and a pair of electrodes for performing electrolysis in said reactor. 13. The apparatus of claim 12 further comprising a heater for heating the reactor. 14. The apparatus of claim 12 further comprising an inlet for introducing an aqueous medium and an outlet for discharging the aqueous medium used. 15. The apparatus of claim 12 further comprising a means for introducing an oxidizer into the reactor. 16. The apparatus of claim 15 wherein the means for introducing an oxidizer is a nozzle for mixing it with an influent gas. 17. The apparatus of claim 15 further comprising a heating means for heating an oxidizer before it is introduced into the reactor. 18. The apparatus of claim 12 further comprising a heating means for heating an influent gas before it is introduced into the reactor. 19. The apparatus of claim 12 wherein the electrode has a cylindrical shape. 20. The apparatus of claim 19 wherein a filler is charged in the cylindrical electrode. 21. The apparatus of claim 20 wherein said filler is a ceramic material in the form of a sphere, cylinder or Raschig ring. 22. The apparatus of claim 12 comprising a feeder for supplying conductive particles into the aqueous medium. 23. The apparatus of claim 22 comprising a separator for separating conductive particles from the aqueous medium treated in the reactor. 24. The apparatus of claim 23 wherein said separator comprises a liquid cyclone. 25. The apparatus of claim 23 wherein said separator comprises a filter device.