IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
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출원번호 |
US-0994230
(2001-11-27)
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발명자
/ 주소 |
- Gehlsen, Mark David
- Vall, David Loren
- Perman, Craig Allen
- Albrecht, Bonnie Weiskopf
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출원인 / 주소 |
- 3M Innovative Properties Company
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대리인 / 주소 |
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인용정보 |
피인용 횟수 :
8 인용 특허 :
22 |
초록
▼
A continuous method for making foams having uniform and/or small cell sizes and articles made with these foams are described. The method allows for adjusting or controlling cell size and cell size distribution by controlling temperature and/or blowing agent concentration. The foams feature small and
A continuous method for making foams having uniform and/or small cell sizes and articles made with these foams are described. The method allows for adjusting or controlling cell size and cell size distribution by controlling temperature and/or blowing agent concentration. The foams feature small and/or uniform cell sizes and may be comprised of amorphous thermoplastic polymers, pressure sensitive adhesive compositions, and immiscible thermoplastic polymer compositions. A method for coextruding the foams is also described.
대표청구항
▼
A continuous method for making foams having uniform and/or small cell sizes and articles made with these foams are described. The method allows for adjusting or controlling cell size and cell size distribution by controlling temperature and/or blowing agent concentration. The foams feature small and
A continuous method for making foams having uniform and/or small cell sizes and articles made with these foams are described. The method allows for adjusting or controlling cell size and cell size distribution by controlling temperature and/or blowing agent concentration. The foams feature small and/or uniform cell sizes and may be comprised of amorphous thermoplastic polymers, pressure sensitive adhesive compositions, and immiscible thermoplastic polymer compositions. A method for coextruding the foams is also described. xy; and R16is selected from the group consisting of --H, --OH, alkyl, alkoxy, --C(O)--R27a,--C(O)--O--R28,and --C(O)--S--R29; wherein when R15and R16independently are alkyl or alkoxy, R15and R16independently are optionally substituted with one or more moieties selected from the group consisting of cycloalkyl, heterocyclyl, aryl, and heteroaryl; or R15is --H; and R16is selected from the group consisting of cycloalkyl, heterocyclyl, aryl, and heteroaryl; R17,R18,R19,R20,R21,R22,R23,R24,R25,R26,R27,R27a,R28,and R29independently are selected from the group consisting of --H and alkyl, wherein alkyl is optionally substituted by one or more moieties selected from the group consisting of cycloalkyl, heterocyclyl, aryl, and heteroaryl; with the proviso that when R2is methyl, then R1,R2,R3,R4,R5,R6,R7,R8,R9,R10,R11,and R12are not simultaneously H, and when any of R1,R2,R3,R4,R5,R6,R7,R8,R9, R10,R11,R12,R13,R14,R15,R16,R17,R18,R19,R20,R21,R22,R23,R24,R25,R26,R27,R27a,R28,and R29independently is a moiety selected from the group consisting of alkyl, alkenyl, alkynyl, alkoxy, alkylthio, cycloalkyl, heterocyclyl, aryl, and heteroaryl, then the moiety is optionally substituted by one or more substituent selected from the group consisting of --OH, alkoxy, and halogen. 2. The compound of claim 1 wherein R8is --OH. 3. The compound of claim 2 wherein X is S. 4. The compound of claim 3 wherein R3,R4,R11and R12each is --H. 5. The compound of claim 4 wherein R1,R5,R6,R7,R9,and R10independently are selected from the group consisting of --H and C1-C3alkyl. 6. The compound of claim 5 wherein R5,R6,R7,R9,and R10each is --H. 7. The compound of claim 6 wherein R13is fluoromethyl. 8. The compound of claim 6 wherein R13is methyl. 9. The compound of claim 8 wherein R2is C1-C6alkyl optionally substituted with a substituent selected from the group consisting of --OH, alkoxy, and halogen. 10. The compound of claim 9 wherein R2is C1alkyl optionally substituted with halogen. 11. The compound of claim 10 wherein R2is fluoromethyl. 12. The compound of claim 9 wherein R2is hydroxymethyl. 13. The compound of claim 9 wherein R2is methoxymethyl. 14. The compound of claim 8 wherein R1is selected from the group consisting of --H and C1-C6alkyl optionally substituted with a substituent selected from the group consisting of --OH, alkoxy, and halogen. 15. The compound of claim 14 wherein R1is --H. 16. The compound of claim 14 wherein R1is C1-C6alkyl optionally substituted with a substituent selected from the group consisting of alkoxy and halogen. 17. The compound of 16 wherein R1is ethyl. 18. The compound of claim 14 wherein R1is C1alkyl optionally substituted with a substituent selected from the group consisting of --OH, alkoxy, and halogen. 19. The compound of claim 18 wherein R1is methyl. 20. The compound of claim 18 wherein R
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