초록

A method and an apparatus for controlling aircraft rudder movement are disclosed. The system including a yaw damping control portion integrated with a directional compensation rudder control portion, such that the system may simultaneously provide yaw damping control and directional compensation.

대표청구항 ▼

A method and an apparatus for controlling aircraft rudder movement are disclosed. The system including a yaw damping control portion integrated with a directional compensation rudder control portion, such that the system may simultaneously provide yaw damping control and directional compensation. ol

A method and an apparatus for controlling aircraft rudder movement are disclosed. The system including a yaw damping control portion integrated with a directional compensation rudder control portion, such that the system may simultaneously provide yaw damping control and directional compensation. oller controls the peak value of said high-frequency output to be said preset peak value; and a second control loop including a monitor for detecting an average value of said intermittent high-frequency output, an arithmetic operation means for calculating an average value of said intermittent high-frequency output on the basis of the preset peak setting value and a preset duty ratio setting value, and a pulse generator for generating a modulation reference signal for controlling said modulator on the basis of the average value of said high-frequency output detected by said monitor and the average value of said high-frequency output calculated by said arithmetic operation means. 2. The high-frequency power supply apparatus for a plasma generation apparatus according to claim 1, wherein said pulse generator includes a display for displaying at least the average value of said high-frequency output detected by said monitor and the average value of said high-frequency output calculated by said arithmetic operation means. 3. The high-frequency power supply apparatus for a plasma generation apparatus according to claim 1, further comprising setting change-over means for changing-over setting of said peak value setting signal. 4. The high-frequency power supply apparatus for a plasma generation apparatus according to claim 2, wherein said pulse generator includes a display for displaying at least the average value of said high-frequency output detected by said monitor and the average value of said high-frequency output calculated by said arithmetic operation means. 5. The thigh-frequency power supply apparatus for a plasma generation apparatus according to claim 1, wherein said output monitor includes a monitor of a thermocouple system. 6. The high-frequency power supply apparatus for a plasma generation apparatus according to claim 3, wherein said output monitor includes a monitor of a thermocouple system. 7. A high-frequency power supply apparatus for a plasma generation apparatus according to claim 3, wherein said pulse generator includes a display for displaying at least the average value of said high-frequency output detected by said monitor and the average value of said high-frequency output calculated by said arithmetic operation means. 8. A high-frequency power supply apparatus for a plasma generation apparatus having a modulator for generating intermittent high-frequency output on the basis of a modulation reference signal, said high-frequency power supply apparatus comprising: a monitor for detecting an average value of said intermittent high-frequency output; and an arithmetic operation means for calculating an average value of said intermittent high-frequency output on the basis of a peak value setting signal and a duty ratio setting signal for said high-frequency output; wherein said modulator is controlled on the basis of the average value of said high-frequency output detected by said monitor and the average value of said high-frequency output calculated by said arithmetic operation means.