초록 ▼

An abrasion resistant garment and method of producing same. A garment that is highly ventilated while providing abrasion protection for a wearer during a slide, as for instance that may occur during a fall from a motorcycle. A material is produced wherein abrasion-resistant, low sliding friction, be

An abrasion resistant garment and method of producing same. A garment that is highly ventilated while providing abrasion protection for a wearer during a slide, as for instance that may occur during a fall from a motorcycle. A material is produced wherein abrasion-resistant, low sliding friction, beads are held within a matrix of high-tensile strength, abrasion-resistant, cords. The beaded matrix within the garment can be augmented with layers to form a lining and exterior layers to enhance visibility. The force of a sliding rider is retained over the beaded matrix, away from the road surface. Under abrasive sliding friction, the beads additionally rotate to an extent which tightens the cord matrix and thereby helps constrain the skin surface of the wearer from making contact with the roadway surface.

대표청구항 ▼

An abrasion resistant garment and method of producing same. A garment that is highly ventilated while providing abrasion protection for a wearer during a slide, as for instance that may occur during a fall from a motorcycle. A material is produced wherein abrasion-resistant, low sliding friction, be

An abrasion resistant garment and method of producing same. A garment that is highly ventilated while providing abrasion protection for a wearer during a slide, as for instance that may occur during a fall from a motorcycle. A material is produced wherein abrasion-resistant, low sliding friction, beads are held within a matrix of high-tensile strength, abrasion-resistant, cords. The beaded matrix within the garment can be augmented with layers to form a lining and exterior layers to enhance visibility. The force of a sliding rider is retained over the beaded matrix, away from the road surface. Under abrasive sliding friction, the beads additionally rotate to an extent which tightens the cord matrix and thereby helps constrain the skin surface of the wearer from making contact with the roadway surface. terial, wherein the carbon-containing dielectric is characterized by a dielectric constant; exposing the workpiece to a first atmosphere produced by plasma decomposition of at least one gas, wherein the at least one gas includes oxygen, so as to remove said organic material from the surface of the workpiece; and subsequently exposing the workpiece to a second atmosphere produced by plasma decomposition of a gas mixture, wherein the gas mixture includes helium and at least one hydrogen-containing gas species; wherein the step of exposing the workpiece to the second atmosphere is performed for a time long enough to decrease the dielectric constant of the carbon-containing dielectric. 13. A method of removing organic material from a semiconductor workpiece that includes a carbon-containing dielectric, comprising the steps of: providing a semiconductor workpiece having an organic material exposed on a surface of the workpiece and having a carbon-containing dielectric underlying the organic material, wherein the carbon-containing dielectric is characterized by a dielectric constant; exposing the workpiece to a first atmosphere produced by plasma decomposition of at least one gas, wherein the at least one gas includes oxygen, so as to remove said organic material from the surface of the workpiece; and subsequently exposing the workpiece to a second atmosphere that is effective to decrease the dielectric constant of the carbon-containing dielectric, wherein the second atmosphere is produced by plasma decomposition of a gas mixture that includes helium and at least one hydrogen-containing gas species. 14. A method according to claim 13, wherein the organic material comprises photoresist. 15. A method according to claim 13, wherein the step of providing the workpiece comprises the step of: etching an opening in the carbon containing dielectric and simultaneously depositing an organic residue on a surface of the opening; wherein said organic material comprises the organic residue deposited in the etching step. 16. A method according to claim 13, wherein said gas mixture has a hydrogen content of ten percent or less by atomic molar concentration.