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A gas tubing reel includes a housing having a tubing-reel rotatably positioned therein for unwinding and retracting tubing. The tubing-reel is biased in a retracting direction and includes ratcheting and releasing means for selectably paying out or retracting the tubing. One side wall of the housing

A gas tubing reel includes a housing having a tubing-reel rotatably positioned therein for unwinding and retracting tubing. The tubing-reel is biased in a retracting direction and includes ratcheting and releasing means for selectably paying out or retracting the tubing. One side wall of the housing defines an opening through which the tubing-reel may be slidably removed. The cable reel includes a line guide engaged with a worm gear for reciprocative movement between side walls of the housing whereby to evenly distribute the gas tubing on the tubing-reel. A swivel housing is coupled to the tubing-reel in a bearing relationship and includes an inlet port for receiving an end of the tubing and an outlet port for coupling to a nasal cannula. Thus, a gas may be delivered from a gas source through the gas tubing, swivel coupling, and cannula to a patient without tangling or twisting the tubing.

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A gas tubing reel includes a housing having a tubing-reel rotatably positioned therein for unwinding and retracting tubing. The tubing-reel is biased in a retracting direction and includes ratcheting and releasing means for selectably paying out or retracting the tubing. One side wall of the housing

A gas tubing reel includes a housing having a tubing-reel rotatably positioned therein for unwinding and retracting tubing. The tubing-reel is biased in a retracting direction and includes ratcheting and releasing means for selectably paying out or retracting the tubing. One side wall of the housing defines an opening through which the tubing-reel may be slidably removed. The cable reel includes a line guide engaged with a worm gear for reciprocative movement between side walls of the housing whereby to evenly distribute the gas tubing on the tubing-reel. A swivel housing is coupled to the tubing-reel in a bearing relationship and includes an inlet port for receiving an end of the tubing and an outlet port for coupling to a nasal cannula. Thus, a gas may be delivered from a gas source through the gas tubing, swivel coupling, and cannula to a patient without tangling or twisting the tubing. Microlithography III: Technology for the Next Decade, vol. 470, pp. 164-175 (1984). Baumgartner, H., et al., "Ozone Cleaning of the SI-SIO2System," Appl. Phys. A, vol. 43, pp. 223-223 (1987). Isagawa, Tatsuhiko, et al., "Ultra Clean Surface Preparation Using Ozonized Ultrapure Water," Extended Abstracts of the 1982 Int'l. Conf. on Solid State Devices and Materials, pp. 193-195 (1992). Shimada, H., et al., "Residual-Surfactant-Free Photoresist Development Process," J. Electrochem., Soc., 139(6):1721-1730 (Jun. 1992). Tong, Jeremy K. et al., "Aqueous Ozone Cleaning of Silicon Wafers," Proc. of 2ndInt'l. Symposium on Cleaning Tech. In Semiconductor Device Mfg., pp. 18-25 (Oct. 1992). Tong, Jeremy K., et al., "Aqueous Ozone Cleaning of Silicon Wafers," Res. Soc. Symp., pp. 18-25 (1993). Ohmi, T., et al., "Native Oxide Growth and Organic Impurity Removal on Si Surface with Ozone-Injected Ultrapure Water," J. Electrochem. Soc., 140(3):804-810 (Mar. 1993). Vig, John R., et al., "UV/Ozone Cleaning of Surfaces," IEEE Transactions on Parts, Hybrids, and Packaging, vol. PHP-12(4):365-370 (Dec. 1976). Vig, John R., "UV/ozone cleaning of surfaces," U.S. Army Electronics Technology and Devices Laboratory, ERADCOM, Ft. Monmouth, NJ, 07703-5302, pp. 1027-1034 (Sep./Oct. 1984). Tabe, Michiharu, "UV ozone cleaning of silicon substrates in silicon molecular beam epitaxy," Appl. Phys. Lett., 45(10):1073-1075 (Nov. 1984). Zazzera, L.A., et al., "XPS and SIMS Study of Anhydrous HF and UV/Ozone-Modified Silicon (100) Surfaces," J. Electrochem. Soc., 136(2):484-491 (Feb. 1989). Gabriel, Calvin, et al., "Reduced Device Damage Using An Ozone Based Photoresist Removal Process," SPIE Advances in Resist Technology and Processing V1, vol. 1086, pp. 598-604 (1989). Suemitsu, Maki, et al., "Low Temperature Silicon surface Cleaning by HF Etching/Ultraviolet Ozone Cleaning (HF/UVOC) Method (I)-Optimization of the HF Treatment-," Japan