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Apparatus and method for detecting a presence or position of a substrate 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B05C-011/00
  • C23F-001/10
출원번호 US-0322102 (1999-05-27)
발명자 / 주소
  • Welch, Michael D.
  • Herchen, Harald
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Janah, AshokBach, Joseph
인용정보 피인용 횟수 : 15  인용 특허 : 30

초록

A chamber 25 comprises a support 45 for holding a substrate 20 and a sensor system 135 adapted to detect the presence or proper placement of the substrate 20 on the support 45. The support 45 comprises a window 155 that is transparent and adapted to transmit light therethrough. The sensor system 135

대표청구항

A chamber 25 comprises a support 45 for holding a substrate 20 and a sensor system 135 adapted to detect the presence or proper placement of the substrate 20 on the support 45. The support 45 comprises a window 155 that is transparent and adapted to transmit light therethrough. The sensor system 135

이 특허에 인용된 특허 (30)

  1. Davenport Robert E., Apparatus and method for rotationally aligning and degassing semiconductor substrate within single vacuum chamber.
  2. Yoshijiro Ushio JP; Takehiko Ueda JP; Eiji Matsukawa JP; Motoo Koyama JP, Apparatus and methods for detecting thickness of a patterned layer.
  3. Thurfjell Henrik (Sunnyvale CA) Ozarski Robert G. (Livermore CA), Apparatus and process for positioning wafers in receiving devices.
  4. Nanbu Mitsuhiro (Kumamoto-ken JPX) Iida Naruaki (Kumamoto JPX) Gotou Hideaki (Kumamoto-ken JPX) Tateyama Masanori (Kumamoto JPX) Yoshimoto Yuji (Kumamoto-ken JPX) Ishimoto Tomoko (Kumamoto JPX) Yaega, Apparatus for processing substrates having a film formed on a surface of the substrate.
  5. Davis Cecil J. (Greenville TX) Spencer John E. (Plano TX) Hockersmith Dan T. (Garland TX) Hildenbrand Randall C. (Richardson TX) Brown Frederick W. (Colleyville TX) Kohan Stanford P. (Garland TX), Automated single slice powered load lock plasma reactor.
  6. Jamieson John (Los Gatos CA) Hsu May M. (Fremont CA), Automatic alignment apparatus having low and high resolution optics for coarse and fine adjusting.
  7. Nakahara Kanefumi (Yokohama JPX) Nakajima Masao (Yokohama JPX) Tsuruya Toshinori (Kawasaki JPX), Exposure apparatus.
  8. Inoue Takashi,JPX ; Nagano Hiroyuki,JPX ; Ishii Yoshimichi,JPX, Exposure apparatus for transferring a mask pattern onto a substrate.
  9. Fujioka Hidehiko (Atsugi JPX), Exposure control method for adjusting the temperature of a workpiece holding chuck attracting surface based on memorized.
  10. Xuan Jialuo Jack, Fiber optic laser texturing with optical probe feedback control.
  11. Ehrlich Daniel J. (Lexington MA), Integrated circuit micro-fabrication using dry lithographic processes.
  12. Whelan Paul L. (Dallas TX), Material handling system and method for manufacturing line.
  13. Brock Earl, Method and apparatus for orienting a disk via edge contact.
  14. Listwan Andrew, Method and apparatus for testing an electrically conductive substrate.
  15. Champetier Robert J. ; Egozi David,ILX, Method for determining the temperature of a semi-transparent radiating body.
  16. Shiota Iku,JPX ; Tsuboi Kyo,JPX, Method of detaching object to be processed from electrostatic chuck.
  17. Jacobsen Stephen C. (Salt Lake City UT) Wood John E. (Salt Lake City UT) Price Richard H. (Salt Lake City UT), Micropositioner systems and methods.
  18. Genov ; deceased Genco, Prealigner and planarity teaching station.
  19. Fay Bernard (Sarotoga CA), Process and apparatus for theoptical alignment of patterns in two close-up planes in an exposure means incorporating a d.
  20. Takahashi Kazuo (Tokyo JPX), Semiconductor printing apparatus with multiple independent temperature control.
  21. Hanson Kyle M., Semiconductor processing workpiece support with sensory subsystem for detection of wafers or other semiconductor workpieces.
  22. Imai Yuji,JPX, Surface position detecting method, surface position adjusting apparatus and projection exposure apparatus effecting accurate positioning of a substrate.
  23. Shmookler Simon (San Francisco CA) Weinberg Andrew G. (San Jose CA) McGrath Martin J. (Sunnyvale CA), System and method for automated positioning of a substrate in a processing chamber.
  24. Stonestreet Paul (Cowfold GB2) Allum Clive (Crawley GB2) Webber Bert (Crawley GB2) Cooke Richard (West Worthing GB2) Robinson Frederick J. L. (Crawley GB2) Wauk ; II Michael T. (Haywards Heath GB2), Systems and methods for wafer handling in semiconductor process equipment.
  25. Altman Norman G. (Stamford CT), Television monitoring system for automatically aligning semiconductor devices during manufacture.
  26. Galburt Daniel N. (Norwalk CT) Buckley Jere D. (Wilton CT), Universal edged-based wafer alignment apparatus.
  27. Sagues Paul ; Gaudio Stephen A. ; Wong Tim K., Wafer aligner system.
  28. Perkins John D. ; Mohr David, Wafer orientation sensor.
  29. Berken Lloyd M. (Fremont CA) Freerks Frederik W. (Cupertino CA) Jarvi William H. (San Jose CA) Sahin Hatice (Cupertino CA), Wafer positioning system.
  30. Hertel Richard J. (Bradford MA) Delforge Adrian C. (Rockport MA) Mears Eric L. (Rockport MA) MacIntosh Edward D. (Gloucester MA) Jennings Robert E. (Nethuen MA) Bhargava Akhil (Reading MA), Wafer transfer system.

이 특허를 인용한 특허 (15)

  1. Habu, Tomoyuki, Light projection device.
  2. Meulen, Peter van der, Linear semiconductor processing facilities.
  3. van der Meulen, Peter, Linear semiconductor processing facilities.
  4. Machiyama,Wataru, Method for detecting transfer shift of transfer mechanism and semiconductor processing equipment.
  5. Chino, Takashi; Gomi, Satoshi; Miyashita, Koichi; Nagasawa, Minoru; Eda, Yoshie, Method of detecting abnormal placement of substrate, substrate processing method, computer-readable storage medium, and substrate processing apparatus.
  6. Elliott, Martin R.; Shah, Vinay, Methods and apparatus for mapping carrier contents.
  7. Schauer, Ronald Vern, Methods and apparatus for sensing a substrate in a chamber.
  8. Schauer, Ronald Vern, Methods and apparatus for sensing a substrate in a chamber.
  9. Chen, Wen-Ming; Wang, Wen-Chi, Microchip fabrication chamber wafer detection.
  10. van der Meulen, Peter, Mid-entry load lock for semiconductor handling system.
  11. Takahashi, Syuichi; Matsumaru, Hiroki; Nakao, Nobutaka; Komatsu, Kenji, Plasma processing apparatus.
  12. van der Meulen, Peter, Semiconductor manufacturing systems.
  13. van der Meulen, Peter; Kiley, Christopher C; Pannese, Patrick D.; Ritter, Raymond S.; Schaefer, Thomas A., Semiconductor wafer handling and transport.
  14. van der Meulen, Peter; Kiley, Christopher C; Pannese, Patrick D.; Ritter, Raymond S.; Schaefer, Thomas A., Semiconductor wafer handling and transport.
  15. van der Meulen, Peter; Kiley, Christopher C.; Pannese, Patrick D.; Ritter, Raymond S.; Schaefer, Thomas A., Semiconductor wafer handling transport.
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