초록 ▼

A mult-tier crop residue flow guide for a rotary crop residue spreader of an agricultural combine including an element disposed in a housing and rotatable in a predetermined direction about an axis which is oriented horizontally or at a small acute angle to horizontal for driving a flow of crop resi

A mult-tier crop residue flow guide for a rotary crop residue spreader of an agricultural combine including an element disposed in a housing and rotatable in a predetermined direction about an axis which is oriented horizontally or at a small acute angle to horizontal for driving a flow of crop residue through a discharge opening of the housing located at a predetermined angular position around the axis, the flow guide including at least two guide surfaces or tiers having inlet ends disposed in at least generally axially side by side relation adjacent to the discharge opening in position for directing portions of the flow of crop residue in generally the predetermined direction radially outwardly.

대표청구항 ▼

A mult-tier crop residue flow guide for a rotary crop residue spreader of an agricultural combine including an element disposed in a housing and rotatable in a predetermined direction about an axis which is oriented horizontally or at a small acute angle to horizontal for driving a flow of crop resi

A mult-tier crop residue flow guide for a rotary crop residue spreader of an agricultural combine including an element disposed in a housing and rotatable in a predetermined direction about an axis which is oriented horizontally or at a small acute angle to horizontal for driving a flow of crop residue through a discharge opening of the housing located at a predetermined angular position around the axis, the flow guide including at least two guide surfaces or tiers having inlet ends disposed in at least generally axially side by side relation adjacent to the discharge opening in position for directing portions of the flow of crop residue in generally the predetermined direction radially outwardly. y have a diameter of at most one micrometer. 6. The polishing apparatus according to claim 1, wherein said grindstone configuration normalizing mechanism further includes a pure water supply nozzle member. 7. A polishing apparatus comprising: a polishing table having a polishing surface; a substrate holding member for holding a substrate and for urging said substrate against said polishing surface; a dressing apparatus including a dressing surface of a dresser which is slidable on said polishing surface of said polishing table while said dressing surface is urged against said polishing surface, said dressing surface being formed from a grindstone, said grindstone comprising abrasive particles and resin for binding said abrasive particles; and a configuration normalizing mechanism for flattening said dressing surface, said grindstone configuration normalizing mechanism including a configuration correcting table which is to contact said dressing surface. 8. The polishing apparatus according to claim 7, further comprising a fluid supplying mechanism for supplying fluid to said polishing surface of said polishing table or to said dressing surface of said dresser. 9. The polishing apparatus according to claim 7, further comprising a residual abrasive particle cleaning nozzle, for removing abrasive particles from said polishing table which have become separated from said grindstone, disposed in the vicinity of said polishing table. 10. The polishing apparatus according to claim 7, further comprising a fluid supplying mechanism for supplying fluid to said polishing surface of said polishing table or to said dressing surface of said dresser. 11. The polishing apparatus according to claim 7, further comprising a residual abrasive particle cleaning nozzle, for removing abrasive particles from said polishing table which have become separated from said grindstone, disposed in the vicinity of said polishing table. 12. The polishing apparatus according to claim 7, wherein said dressing surface includes a number of grooves or minute holes. 13. The polishing apparatus according to claim 12, further comprising a fluid supplying mechanism for supplying fluid to said polishing surface of said polishing table or to said dressing surface of said dresser. 14. The polishing apparatus according to claim 12, further comprising a residual abrasive particle cleaning nozzle, for removing abrasive particles from said polishing tale which have become separated from said grindstone, disposed in the vicinity of said polishing table. 15. A polishing apparatus according to claim 12, further comprising a fluid supplying mechanism for supplying fluid to said polishing surface of said polishing table or to said dressing surface of said dresser. 16. The polishing apparatus according to claim 12, further comprising a residual abrasive particle cleaning nozzle, for removing abrasive particles from said polishing table which have become separated from said grindstone table, disposed in the vicinity of said polishing table. 17. The polishing apparatus according to claim 7, wherein said polishing surface is formed on a polishing cloth. 18. The polishing apparatus according to claim 7, wherein said polishing surface is formed from a grindstone including fixed abrasive particles. 19. The polishing apparatus according to claim 7, wherein said grindstone is thin, circular and plate-shaped. 20. The polishing apparatus according to claim 7, wherein said grindstone further comprises voids. 21. The polishing apparatus according to claim 7, wherein said resin is destructible such that while said dressing surface is urged against and slides along said polishing surface a portion of said resin is destroyed, whereby abrasive particles bound by this portion of said resin are released from said grindstone and additional abrasive particles bound by another portion of said resin are presented as said dressing surface. 22. The polishing apparatus according to claim 7, wherein t