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Knowledge of the frequency hopping patterns in use by co-located frequency hopping radio systems is useful in reducing the likelihood of collisions between potentially interfering systems. Detection of the frequency hopping pattern is accomplished by determining the time interval between transmissio

Knowledge of the frequency hopping patterns in use by co-located frequency hopping radio systems is useful in reducing the likelihood of collisions between potentially interfering systems. Detection of the frequency hopping pattern is accomplished by determining the time interval between transmissions at a plurality of frequencies by the interfering system and by correlating the time interval to a frequency hopping pattern used by the interferer. The system type of the potentially interfering system can be determined by timing the interval between successive transmissions at a single frequency and correlating this interval or hop pattern duration to a system identifier. Many frequency hopping radio systems can carry out these methods without additional hardware.

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Knowledge of the frequency hopping patterns in use by co-located frequency hopping radio systems is useful in reducing the likelihood of collisions between potentially interfering systems. Detection of the frequency hopping pattern is accomplished by determining the time interval between transmissio

Knowledge of the frequency hopping patterns in use by co-located frequency hopping radio systems is useful in reducing the likelihood of collisions between potentially interfering systems. Detection of the frequency hopping pattern is accomplished by determining the time interval between transmissions at a plurality of frequencies by the interfering system and by correlating the time interval to a frequency hopping pattern used by the interferer. The system type of the potentially interfering system can be determined by timing the interval between successive transmissions at a single frequency and correlating this interval or hop pattern duration to a system identifier. Many frequency hopping radio systems can carry out these methods without additional hardware. d resonator reflecting optics forming an unstable resonator in each of orthogonal (x,y) cross-sectional beam axis directions for suppressing fluctuations in one or more output beam parameters, said beam propagating within the resonator substantially in a third direction (z). 2. The laser system of claim 1, wherein at least one of said resonator reflecting optics includes a spherical surface. 3. The laser system of claim 1, wherein at least one of said resonator reflecting optics includes a toriqual surface. 4. The laser system of claim 1, wherein a first resonator reflecting optic magnifies the beam in a first cross sectional beam axis direction (x), and a second resonator reflecting optic magnifies the beam in a second cross sectional beam axis direction (x±θ) angularly offset from the first cross sectional beam axis direction. 5. The laser system of claim 4, wherein one of said first and second resonator reflecting optics disperses the beam for narrowing a bandwidth of the beam. 6. The laser system of claim 1, wherein said at least one line-narrowing optic is disposed between said resonator reflecting optics. 7. The laser system of claim 1, wherein said resonator reflecting optics are shaped to provide a magnification of the beam of at least 2 in each of said orthogonal beam axis directions (x,y). 8. The laser system of claim 7, wherein said resonator reflecting optics are shaped to provide a magnification of the beam of not more than substantially 4 in each of said orthogonal beam axis directions (x,y). 9. The laser system of claim 1, wherein said resonator reflecting optics are shaped to provide a magnification of the beam of at least 3 in each of said orthogonal beam axis directions (x,y). 10. The laser system of claim 9, wherein said resonator reflecting optics are shaped to provide a magnification of the beam of not more than substantially 4 in each of said orthogonal beam axis directions (x,y). 11. The laser system of claim 1, wherein a first resonator reflecting optic magnifies the beam in both a first and a second orthogonal cross sectional beam axis directions (x,y). 12. The laser system of claim 11, wherein a second resonator reflecting optic disperses the beam for narrowing a bandwidth of the beam. 13. The laser system of claim 11, wherein said at least one line-narrowing optic is disposed between said resonator reflecting surfaces. 14. The laser system of claim 11, wherein said first resonator reflecting optic disperses the beam for narrowing a bandwidth of the beam. 15. An excimer or molecular fluorine laser system, comprising: a laser chamber filled with a gas mixture at least including a halogen-containing molecular species and a buffer gas; a plurality of electrodes including a pair of main electrodes and at least one preionization unit within the laser chamber, the main electrodes defining a discharge area therebetween; a pulsed discharge circuit connected to the electrodes including a pulse compression circuit and a high voltage power supply for supplying electrical energy in compressed electrical pulses to the electrodes within the laser chamber to energize the gas mixture; a fan for circulating the gas mixture through the discharge area; a heat exchanger at least for cooling the gas mixture; a resonator for generating an output beam including the discharge area within the laser chamber and resonator reflecting optics at either end and retro-reflecting the beam within the resonator; a first intracavity optic for narrowing a bandwidth of the output beam and configured to magnify the beam in a first cross-sectional beam axis direction (x) and to render the resonator unstable in the first direction (x); and a second intracavity optic configured to magnify the beam in a second cross-sectional beam axis direction (x±θ) angularly offset from the first cross-sectional beam axis direction and to render the resonator unstable in the second direction (x±θ), said beam propagating within the resonato r substantially in a third direction (z), and wherein the first and second intracavity optics thereby suppress fluctuations in one or more output beam parameters. 16. The laser system of claim 15, wherein said intracavity optics are configured to provide a magnification of the beam of at least 2 in each of said cross sectional beam axis directions (x,x±θ). 17. The laser system of claim 16, wherein said intracavity optics are configured to provide a magnification of the beam of not more than substantially 4 in each of said cross sectional beam axis directions (x,x±θ). 18. An excimer or molecular fluorine laser system, comprising: a laser chamber filled with a gas mixture at least including a halogen-containing molecular species and a buffer gas; a plurality of electrodes including a pair of main electrodes and at least one preionization unit within the laser chamber, the main electrodes defining a discharge area therebetween; a pulsed discharge circuit connected to the electrodes including a pulse compression circuit and a high voltage power supply for supplying electrical energy in compressed electrical pulses to the electrodes within the laser chamber to energize the gas mixture; a fan for circulating the gas mixture through the discharge area; a heat exchanger at least for cooling the gas mixture; a resonator for generating an output beam including the discharge area within the laser chamber and resonator reflecting surfaces at either end and retro-reflecting the beam within the resonator; at least one intracavity optic for narrowing a bandwidth of the output beam; a first intracavity optic configured to magnify the beam in a first cross-sectional beam axis direction (x) and to render the resonator unstable in the first direction (x); and a second intracavity optic configured to magnify the beam in a second cross-sectional beam axis direction (x±θ) angularly offset from the first cross-sectional beam axis direction and to render the resonator unstable in the second direction (x±θ), said beam propagating within the resonator substantially in a third direction (z), and wherein the first and second intracavity optics thereby suppress fluctuations in one or more output beam parameters. 19. The laser system of claim 18, wherein said intracavity optics are configured to provide a magnification of the beam of at least 2 in each of said cross sectional beam axis directions (x,x±θ). 20. The laser system of claim 19, wherein said intracavity optics are configured to provide a magnification of the beam of not more than substantially 4 in each of said cross sectional beam axis directions (x,x±θ). 21. An excimer or molecular fluorine laser system, comprising: a laser chamber filled with a gas mixture at least including a halogen-containing molecular species and a buffer gas; a plurality of electrodes including a pair of main electrodes and at least one preionization unit within the laser chamber, the main electrodes defining a discharge area therebetween; a pulsed discharge circuit connected to the electrodes including a pulse compression circuit and a high voltage power supply for supplying electrical energy in compressed electrical pulses to the electrodes within the laser chamber to energize the gas mixture; a fan for circulating the gas mixture through the discharge area; a heat exchanger at least for cooling the gas mixture; a resonator for generating an output beam including the discharge area within the laser chamber and resonator reflecting surfaces at either end and retro-reflecting the beam within the resonator; an intracavity optic for narrowing a bandwidth of the output beam and configured to magnify the beam in a first and a second orthogonal cross-sectional beam axis directions (x,y) for suppressing fluctuations in one or more output beam parameters, said beam propagating within the resonator substantially in a third direction (z). 22. The laser system of claim 21, wherein said surfac