초록 ▼

A slurry dilution system with an ultrasonic vibrator capable of diluting slurry in-situ to any desired level of concentration is proposed. Raw slurry and the de-ionized water fed into the slurry dilution system is mixed and homogenized by an ultrasonic vibrator and a mixer. The well-mixed slurry sol

A slurry dilution system with an ultrasonic vibrator capable of diluting slurry in-situ to any desired level of concentration is proposed. Raw slurry and the de-ionized water fed into the slurry dilution system is mixed and homogenized by an ultrasonic vibrator and a mixer. The well-mixed slurry solution is then delivered to a chemical-mechanical polishing station. When the chemical-mechanical station requires slurry of a different concentration, the raw slurry can be diluted to the desired level simply by changing the rate of flow of de-ionized water into the dilution system.

대표청구항 ▼

A slurry dilution system with an ultrasonic vibrator capable of diluting slurry in-situ to any desired level of concentration is proposed. Raw slurry and the de-ionized water fed into the slurry dilution system is mixed and homogenized by an ultrasonic vibrator and a mixer. The well-mixed slurry sol

A slurry dilution system with an ultrasonic vibrator capable of diluting slurry in-situ to any desired level of concentration is proposed. Raw slurry and the de-ionized water fed into the slurry dilution system is mixed and homogenized by an ultrasonic vibrator and a mixer. The well-mixed slurry solution is then delivered to a chemical-mechanical polishing station. When the chemical-mechanical station requires slurry of a different concentration, the raw slurry can be diluted to the desired level simply by changing the rate of flow of de-ionized water into the dilution system. ng system comprising: (i) from about 0.1% to about 8% available oxygen added as a peroxygen bleach compound selected from the group consisting of percarbonate, perborate, persulphate, and mixtures thereof; and (ii) from about 0.01% to about 15% peroxygen bleach activator selected from the group consisting of benzoylcaprolactam (BzCL), 4-nitrobenzoylcaprolactam, 3-chlorobenzoylcaprolactam, benzoyloxybenzenesulphonate (BOBS), nonanoyloxybenzenesulphonate (NOBS), phenylbenzoate (PhBz), decanoyloxybenzenesulphonate (C10-OBS), benzolyvalerolactam (BZVL), octanoyloxybenzenesulphonate (C8-OBS), perhydrolyzable exters, and mixtures thereof; wherein the mole ratio of peroxygen bleaching compound (as AvO) to bleach activator ranges from at least from about 20:1 to about 1:1. 7. A composition according to claim 1, wherein saiddiacyl peroxide is selected from the group consisting of dibenzoyl peroxide, benzoyl gluaryl peroxide, benzoyl succinyl peroxide, di-(2-methylbenzoyl)peroxide, diphthaloyl peroxide; and mixtures thereof. 8. A composition according to claim 1, wherein said chelant is selected from the group consisting of nitrilotriacetic acid and polyaminocarboxylic acids selected from the group consisting of ethylene diphosphonic acid, 1-hydroxyethane-1,1-diphosphonic acid, ethylenediaminotetracetic acid, ethylenetriamine pentacetic acid, ethylenediamine disuccinic acid, organo disphophonic, and mixtures thereof. 9. A composition according to claim 8, further comprising from about 0.9% to about 99% by weight of a pH adjusting component of a salt or salt/builder mixture selected from the group consisting of: (i) sodium or potassium carbonate or sesquicarbonate; (ii) sodium or potassium citrate; (iii) citric acid; (iv) sodium or potassium bicarbonate; (v) sodium or potassium borate; (vi) sodium or potassium hydroxide; (vii) phosphate builders; and (viii) mixture(s) thereof. 10. A composition according to claim 9 further comprising from about 0.001% to about 5% of a detersive enzyme. 11. A composition according to claim 6 further comprising a bleach catalyst selected from the group consisting of MnIV2(u-O)3(1,4,7-trimethyl-1,4,7-triacylononane)2-(PF6)2,MnIII2(u-O)1(u-OAc)2(1,4,7-tri-methyl-1,4,7-triacyclononane)2-(ClO4)2; MnIV4(u-O)6(1,4,7-triacyclononane)4-(ClO4)2; MnIIIMnIV4(u-O)1(u-OAc)2(1,4,7-trimethyl-1,4,7-triacyclononane)2-(ClO4)3; Mn(1,4,7-trimethyl-1,4,7-triazacyclononane(OCH3)3-(PF6); Co(2,2'-bispyridylamine)Cl2; Di-(isothiocyanato)bispyridylamine-cobalt (II); tridipyridylamine-cobalt (II) percholrate; Co(2,2-bispyridylamine)2-O2ClO4; Bis-(2,2'-bispyridylamine) copper(II) perchlorate; tris(di-2-pyridylamine)iron (II) perchlorate; Mn gluconate; Mn(CF3SO3)2; Co(NH3)5Cl; binuclear Mn complexed with tetra-N-dentate and bi-N-dentate ligands, N4MnIII(u-O)2MNIVN4)+and [Bipy2MnIII(u-O)2MnIVbipy2]-(ClO4)3and mixtures thereof. 12. A composition according to claim 10 further comprising from about 0.5% to about 12% SiO2. 13. A composition according to claim 1, wherein said solvent is selected from the group consisting of water, glycerol, dimethyl siloxane, sorbitol and mixtures thereof. 14. A composition according to claim 13, wherein said diacyl peroxide is dibenzyol peroxide. 15. A composition according to claim 14 further comprising from about 0.5% to about 20% of a dispersant polymer selected from the group consisting of