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Method and apparatus for collecting rare gas 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B01D-053/04
  • B01D-053/22
출원번호 US-0953480 (2001-09-14)
우선권정보 JP-0289102 (2000-09-22)
발명자 / 주소
  • Ishihara, Yoshio
  • Hayashida, Shigeru
  • Nagasaka, Toru
  • Kimijima, Tetsuya
  • Ohmi, Tadahiro
출원인 / 주소
  • Nippon Sanso Corporation
대리인 / 주소
    Merchant & Gould P.C.
인용정보 피인용 횟수 : 10  인용 특허 : 19

초록

There is provided a method and an apparatus for collecting a rare gas, which are capable of effectively collecting the rare gas contained in an exhaust gas exhausted from a rare gas using apparatus such as a plasma apparatus or the like, and moreover capable of securely supplying the rare gas having

대표청구항

1. A method for collecting rare gas which comprises collecting a rare gas contained in an exhaust gas exhausted from a rare gas using apparatus operated under decompression, the method comprising the step of: collecting said rare gas by separating said rare gas and impurities contained in said ex

이 특허에 인용된 특허 (19)

  1. Prasad Ravi ; Cook Pauline Jane ; Gottzman Christian Friedrich, Air separation system and method.
  2. Jain Ravi (Piscataway NJ) LaCava Alberto (South Plainfield NJ) Andrecovich Mark J. (Somerville NJ) MacLean Donald L. (Annandale NJ), Argon and nitrogen coproduction process.
  3. Stoner Glenn (Calhan CO) Reingold ; III Herbert E. (Annapolis MD) D\Amico Joseph S. (Linthicum MD) Knaebel Kent S. (Plain City OH), Enhanced helium recovery.
  4. Tamura Takaaki,JPX ; Kumagai Mikio,JPX, Enrichment of krypton in oxygen/nitrogen mix gas.
  5. Xu Jianguo (Fogelsville PA), High pressure feed membrane separation process.
  6. Prasad Ravi (East Amherst NY), High purity membrane nitrogen.
  7. Jensvold John A. ; Jeanes Thomas O., Membrane for separation of xenon from oxygen and nitrogen and method of using same.
  8. Ohmi Tadahiro,JPX ; Ishihara Yoshio,JPX, Method and apparatus for recovering rare gas.
  9. Naohiko Yamashita JP, Mixed gas concentration regulating method and concentration regulating apparatus.
  10. Thompson David R. (Grand Island NY), Multistage membrane control system and process.
  11. Li Yao-En ; Duchateau Eric L., Process and system for selective abatement of reactive gases and recovery of perfluorocompound gases.
  12. Li Yao-En ; Paganessi Joseph E. ; Vassallo David ; Fleming Gregory K., Process and system for separation and recovery of perfluorocompound gases.
  13. Crozel Didier (Paris FRX), Process for introducing a filling gas into an enclosure and installation for employing same.
  14. Choe Jung S. (Allentown PA) Agrawal Rakesh (Allentown PA) Auvil Steven R. (Macungie PA), Process for recovering helium from a multi-component gas stream.
  15. Choe Jung S. (Allentown PA) Auvil Steven R. (Macungie PA) Agrawal Rakesh (Allentown PA), Process for separating components of a gas stream.
  16. Bouard Pascal (Draveil FRX) Labrune Philippe (Saint Maur FRX) Villermet Alain (Viroflay FRX) Gastiger Michel (Orsay FRX), Process for the separation of a gaseous hydride or a mixture of gaseous hydrides with the aid of a membrane.
  17. Yang James Hsu-Kuang ; Chernyakov Iosif ; Hsiung Thomas Hsiao-Ling ; Schwarz Alexander, Recovery of perfluorinated compounds from the exhaust of semiconductor fabs using membrane and adsorption in series.
  18. Girard Jean-Marc,FRX ; Mail Alain,FRX ; Marot Yves,FRX, Selection device for providing one or the other of two gases to an apparatus.
  19. Sadakata Takayuki,JPX ; Yoshinaga Hiroshi,JPX ; Ozaki Katsuhiro,JPX, System and method for discharging gas.

이 특허를 인용한 특허 (10)

  1. Sakata, Yoichi, Cleaning solvent and cleaning method for metallic compound.
  2. Winchester, David Charles; Bosco, Matthew John; Klein, Gerald W.; West, Isaac Patrick; Samsal, Richard Linton; Dee, Douglas Paul; Johnson, Andrew David; Karwacki, Jr., Eugene Joseph, Method and equipment for selectively collecting process effluent.
  3. McConnell, Rachel Dianne; Hurst, Ann Marie; Shi, Xiaobo, Method for chemical mechanical planarization of a tungsten-containing substrate.
  4. Hufton, Jeffrey Raymond; Farris, Thomas Stephen; Golden, Timothy Christopher; Karwacki, Jr., Eugene Joseph, Method for recovering high-value components from waste gas streams.
  5. Kaushal, Sanjeev; Sugishima, Kenji; Rao, Donthineni Ramesh Kumar, Method of monitoring a semiconductor processing system using a wireless sensor network.
  6. Olander, W. Karl; Sweeney, Joseph D.; Wang, Luping, Semiconductor manufacturing facility utilizing exhaust recirculation.
  7. Olander,W. Karl; Sweeney,Joseph D.; Wang,Luping, Semiconductor manufacturing facility utilizing exhaust recirculation.
  8. Koshi, Yasunobu; Suzaki, Kenichi; Yoshino, Akihito, Substrate processing apparatus and method of manufacturing semiconductor device.
  9. Sakai, Masanori; Kagaya, Toru; Shima, Nobuhito, Substrate processing method for film formation.
  10. Kimoto, Masahiro; Koura, Terumasa; Fukuda, Yukio; Narazaki, Masaki; Hashimoto, Taiji; Sakai, Toru; Yokogi, Kazuo, Xenon retrieval system and retrieval device.
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