초록 ▼

A sputtering apparatus for depositing layers of material onto a substrate includes a vacuum chamber, a first target and a second target positioned within the vacuum chamber. A source of power is placed in electrical communication with the first target and the second target. A switch alternately conn

A sputtering apparatus for depositing layers of material onto a substrate includes a vacuum chamber, a first target and a second target positioned within the vacuum chamber. A source of power is placed in electrical communication with the first target and the second target. A switch alternately connects the source of power between the first target and the second target. The first target and the second target are different materials. The switch connects power to the first target when the transport mechanism positions the substrate near the first target and the switch connects power to the second target when the transport mechanism positions the substrate closer to the second target.

대표청구항 ▼

A sputtering apparatus for depositing layers of material onto a substrate includes a vacuum chamber, a first target and a second target positioned within the vacuum chamber. A source of power is placed in electrical communication with the first target and the second target. A switch alternately conn

A sputtering apparatus for depositing layers of material onto a substrate includes a vacuum chamber, a first target and a second target positioned within the vacuum chamber. A source of power is placed in electrical communication with the first target and the second target. A switch alternately connects the source of power between the first target and the second target. The first target and the second target are different materials. The switch connects power to the first target when the transport mechanism positions the substrate near the first target and the switch connects power to the second target when the transport mechanism positions the substrate closer to the second target. PbTiO3Thin Films by Chemical Beam Deposition", 1990, pp. 49-57, Mat. Res. Soc. Symp. Proc. vol. 200, Materials Research Society, Department of Materials Science & Engineering, North Carolina State University, Raleigh, North Carolina, U.S.A. Niu, Hoerman, Wessels, "Growth and microstructure of MgO thin films on Si(100) substrates by metal-organic molecular beam epitaxy" Jan., 2000, pp. 74-77, Applied Surface Science 161, Elsevier Science B.V., Department of Materials Science and Engineering and Materials Research Center, Northwestern University, Evanston, IL, U.S.A. Niu, Hoerman, Wessels, "Epitaxial thin films of MgO on Si using metalorganic molecular beam epitaxy" May 2000, pp. 2146-2152, J. Vac. Sci. Technol. B 18(4), Jul./Aug. 2000, American Vacuum Society, Department of Materials Science and Engineering and Materials Research Center, Northwestern University, Evanston, IL, U.S.A.