Mass fraction metering device
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IPC분류정보
국가/구분 |
United States(US) Patent
등록
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국제특허분류(IPC7판) |
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출원번호 |
US-0505276
(2000-02-16)
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발명자
/ 주소 |
- Patten, Andrew T.
- O'Banion, Thomas A.
- Valentine, Julie Ann
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출원인 / 주소 |
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대리인 / 주소 |
Duft, Setter, Ollila & Bornsen LLC
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인용정보 |
피인용 횟수 :
8 인용 특허 :
10 |
초록
▼
An energy metering device includes a volumetric flow meter or mass flow meter in combination with a gas analyzer that provides telemetry regarding the constituents of a natural gas flow stream. An interpreter analyzes this information and provides a real time output corresponding to the enthalpy of
An energy metering device includes a volumetric flow meter or mass flow meter in combination with a gas analyzer that provides telemetry regarding the constituents of a natural gas flow stream. An interpreter analyzes this information and provides a real time output corresponding to the enthalpy of combustion for the gas stream. This output is used to adjust or throttle the gas flow stream for purposes of delivering the flow stream according to a preselected parameter, which is related to desired operating conditions for a combustion device including a boiler or an engine.
대표청구항
▼
An energy metering device includes a volumetric flow meter or mass flow meter in combination with a gas analyzer that provides telemetry regarding the constituents of a natural gas flow stream. An interpreter analyzes this information and provides a real time output corresponding to the enthalpy of
An energy metering device includes a volumetric flow meter or mass flow meter in combination with a gas analyzer that provides telemetry regarding the constituents of a natural gas flow stream. An interpreter analyzes this information and provides a real time output corresponding to the enthalpy of combustion for the gas stream. This output is used to adjust or throttle the gas flow stream for purposes of delivering the flow stream according to a preselected parameter, which is related to desired operating conditions for a combustion device including a boiler or an engine. sensor as recited in claim 1, further including an aperture extending through said backing plate to allow detection of gauge pressure. 16. The sensor as recited in claim 1, further including an epitaxially deposited silicon layer on a sapphire diaphragm between the backing plate and the diaphragm, wherein said sensing element is formed thereon. 17. The sensor as recited in claim 16, wherein said sensing element includes a piezoresistive sensing element. 18. The sensor as recited in claim 16, further including a chemically resistant layer positioned between the silicon layer and the backing plate, wherein said chemically resistant layer acts as an electrical insulator. 19. The sensor as recited in claim 16, further including bond pads between said glass layer and said non-porous diaphragm. 20. The sensor as recited in claim 19, further including windows formed in said glass layer providing access to said bond pads. 21. The sensor as recited in claim 19, wherein said bond pads comprise a titanium layer and a diffusion barrier. 22. The sensor as recited in claim 1, wherein said sensing element includes a piezoresistive sensing element. 23. The sensor as recited in claim 1, further including a metalization layer between the non-porous diaphragm and the backing plate to block EMI/RFI from affecting the sensing element. 24. The sensor as recited in claim 1, further including a chemically resistant polymer adjacent to at least a portion of an outer edge of said non-porous diaphragm and said backing plate. 25. The sensor as recited in claim 1, wherein the non-porous diaphragm is comprised of a material selected from the group consisting of sapphire and diamond. 26. The sensor as recited in claim 1, wherein said sensing element includes a capacitive sensing element. 27. The sensor as recited in claim 1, further comprising: electrical leads coupled to the sensing element that extend through the backing plate; bond pads disposed between said glass layer and said non-porous diaphragm; and windows formed in said glass layer providing access to said bond pads, wherein said electrical leads are brazed to said bond pads. 28. The sensor as recited in claim 1, further comprising a primary seal member disposed on a periphery of the surface of the diaphragm. 29. The sensor as recited in claim 28, wherein the primary seal member is L-shaped so as to extend along from the periphery of the diaphragm surface to the side of the sensor. 30. The sensor as recited in claim 28, further comprising a secondary seal member disposed along the side of the backing plate and spaced from the primary seal member. 31. The sensor as recited in claim 1, wherein the surface of the non-porous diaphragm is coated with a material selected from the group consisting of epoxy, PTFE, PVDF, Paralyne, PEEK, and urethane, wherein the coating is applied to at least a portion of an outer edge of said non-porous diaphragm and said backing plate. 32. A sensor having a non-porous outer surface, said sensor comprising: a backing plate having an inner and outer surface; a non-porous diaphragm having an inner and outer surface; means for sensing at least one of temperature and pressure, said sensing means disposed over the inner surface of the diaphragm; and a glass layer, selected from a glass material having a melt temperature above 700° C., that is bonded by glassing to the inner surface of the backing plate and the inner surface of said non-porous diaphragm proximate an outside periphery thereof, thereby bonding said backing plate and said non-porous diaphragm, said glass layer having thickness dimension, wherein when the non-porous diaphragm flexes to a desired maximum flexure, a ported of the inner surface of the diaphragm engages an inner surface of the backing plate, wherein at least one of temperature and pressure near said non-porous diaphragm is detectable by said sensing means. 33. The sensor as recited in claim 32, wherein said glass layer includes a boros
이 특허에 인용된 특허 (10)
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Wusterbarth Michael A. ; Noyes Steven ; Greer Joe Russell, Gas flow rate measurement apparatus and method.
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Vars Curtis C. ; Yost Jason E., Gas mass flow control system.
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Fujiwara Seishi,JPX ; Komine Norio,JPX ; Jinbo Hiroki,JPX ; Suwa Toshitsugu,JPX, Manufacturing method of synthetic silica glass.
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Morris ; Jr. Corydon E. ; Morin Daniel L., Mass flow measurement device.
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Bump Scott S. ; Campbell Gary P. ; Dille Joseph C. ; White William W., Method and apparatus for detecting and controlling mass flow.
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Bump Scott S. ; Campbell Gary P. ; Dille Joseph C. ; White William W., Method and apparatus for detecting and controlling mass flow.
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Vander Heyden William H. (Mequon WI) Clingman ; Jr. ; deceased William H. (late of Dallas TX by Mary Jane Wheeler Clingman ; legal representative ), Method and apparatus for measuring ratio of mass flow rates and energy flow in a gas pipeline.
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Hornemann Johan Adrianus Tilmann,NLX, Method for determining the calorific value of a gas and/or the Wobbe index of a natural gas.
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Alonso Joey G. (3400 Princeton Way Anchorage AK 99508), Multiple phase coriolis mass meter.
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Vander Heyden William H. (Mequon WI), Volumetric flow corrector and method.
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