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Non-plasma in-situ cleaning of processing chambers using static flow methods 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23G-005/028
출원번호 US-0708243 (2000-11-08)
발명자 / 주소
  • Arno, Jose
  • Wang, Luping
  • Tom, Glenn M.
출원인 / 주소
  • Advanced Technology Materials, Inc.
대리인 / 주소
    Chappuis, MargaretFuierer, Marianne
인용정보 피인용 횟수 : 34  인용 특허 : 32

초록

An improved, non-plasma, static method for removing accumulated films and solid residues from interior surfaces of processing chambers used in thermal or plasma CVD treatment processes. The method includes introducing a reactive substance into a processing chamber while adjusting the pressure within

대표청구항

An improved, non-plasma, static method for removing accumulated films and solid residues from interior surfaces of processing chambers used in thermal or plasma CVD treatment processes. The method includes introducing a reactive substance into a processing chamber while adjusting the pressure within

이 특허에 인용된 특허 (32)

  1. Garrett Michael E. (Woking GB2), Apparatus for chilling fluids.
  2. Ollivier Louis A., Apparatus for delivering process gas for making semiconductors and method of using same.
  3. Zheng Dao-Hong (London GBX) Irven John (High Wycombe GBX) Paterson Alan J. F. (Crewe GBX) Tregear Daniel C. (Cambridge GBX), Apparatus for supplying high purity fluid.
  4. Friedt Jean-Marie (San Francisco CA), Bulk delivery of ultra-high purity gases at high flow rates.
  5. Baumann Richard S. (Glenbeulah WI) Raboin Ronald K. (Green Bay WI), Detachable burner assembly for gas-burning torch.
  6. Emmett George C. (Frederick MD), Detonation gas delivery unit.
  7. Yves Fourmont,FRX, Device for feeding a distribution network with gaseous fluid.
  8. Le Febre David A. ; Martin ; Jr. Thomas B., Fail-safe delivery valve for pressurized tanks.
  9. Eidsmore Paul G. (1700 Granite Creek Rd. Santa Cruz CA 95065), Fluid coupling assembly.
  10. Atkinson Louis D. (New Berlin WI) Rave Kevin M. (West Allis WI), Fluid pressure regulator establishing a stable output fluid pressure.
  11. Eidsmore Paul G. (Scotts Valley CA), Fluid-flow control valve.
  12. Eidsmore Paul G. (2 Blue Hill Ct. Scotts Valley CA 95066), Fluid-flow isolation and control apparatus and method.
  13. Cannet Gilles (Parmain FRX) Fano Emmanuel (La-Varenne-Saint-Hilaire FRX) Robin Alain (Paris FRX), Gas control and dispensing assembly and gas storage device equipped with such an assembly.
  14. Lhomer Gerard (Le Mesnil Saint Denis FRX) Theurant Gilbert (Vitry sur Seine FRX), Gas dispensing control assembly and gas bottle equipped with such an assembly.
  15. Kooy Richard J. (Western Springs IL) Coers Don Henry (Naperville IL), Method and system for storing cold liquid.
  16. Niino Reiji (Kofu JPX) Fujita Yoshiyuki (Kofu JPX) Lee Hideki (Nirasaki JPX) Imamura Yasuo (Yokohama JPX) Nishimura Toshiharu (Kofu JPX) Mikata Yuuichi (Kawasaki JPX) Miyazaki Shinji (Yokkaichi JPX) , Method of cleaning reaction tube.
  17. Mikata Yuichi,JPX, Method of manufacturing a semiconductor device in a CVD reactive chamber.
  18. Grayson Gary D., Passive low gravity cryogenic storage vessel.
  19. Junichiro Hashizume JP; Shigenori Ueda JP; Makoto Aoki JP, Plasma process method.
  20. Coffre Eric (Trappes FRX) Gary Daniel (Versailles FRX) di Giulio Christophe (Neuilly-sur-Seine FRX) Loiseau Grard (Bois D\Arcy FRX) Torelli Grard (Vanves FRX), Pressure reducer for pure gases.
  21. Eidsmore Paul G. (1700 Granite Creek Rd. Santa Cruz CA 95065), Pressure regulator.
  22. Eidsmore Paul G. (1700 Granite Creek Rd. Santa Cruz CA 95065), Pressure regulator.
  23. Wormser Alex F. (Marblehead MA), Pressure regulator.
  24. Semerdjian Roy V. ; Le Febre David A. ; Martin ; Jr. Thomas B., Pressurized container with restrictor tube having multiple capillary passages.
  25. Martin Richard L. (Covina CA), Pressurized gas flow control valve and assembly thereof with reducer regulator.
  26. Callahan Richard A. (Waitsfield VT), Process and apparatus for producing liquid carbon dioxide.
  27. Rockenfeller Uwe (Boulder City NV) Kirol Lance D. (Boulder City NV), Refrigerant recycling system.
  28. Amidzich Bradford G. (Oconomowoc WI), Self regulating valve assembly for controlling fluid ingress and egress from a transportable container which stores and.
  29. Tom Glenn M. (New Milford CT) McManus James V. (Danbury CT), Storage and delivery system for gaseous hydride, halide, and organometallic group V compounds.
  30. Eidsmore Paul G. (2 Blue Hill Ct. Scotts Valley CA 95066), Supply cylinder shut-off and flow control valve.
  31. Ollivier Louis A. (Palo Alto CA), Supply pressure compensated fluid pressure regulator and method.
  32. Knollmueller Karl O. (Hamden CT), Zeolite based arsine storage and delivery system.

이 특허를 인용한 특허 (34)

  1. Arena, Chantal; Werkhoven, Christiaan, Abatement of reaction gases from gallium nitride deposition.
  2. Arena, Chantal; Werkhoven, Christiaan, Abatement of reaction gases from gallium nitride deposition.
  3. Denis, Arnaud; Ligonesche, Renaud; Pisot, Philippe, Assembly including a pressurized gas storage tank and a control device for filling the tank with gas and/or extracting gas therefrom.
  4. Dimeo, Frank; Dietz, James; Olander, W. Karl; Kaim, Robert; Bishop, Steven; Neuner, Jeffrey W.; Arno, Jose; Marganski, Paul J.; Sweeney, Joseph D.; Eldridge, David; Yedave, Sharad; Byl, Oleg; Stauf, Gregory T., Cleaning of semiconductor processing systems.
  5. Lee, Wai Mun, Composition and method for treating semiconductor substrate surface.
  6. Lee, Wai Mun, Composition and method for treating semiconductor substrate surface.
  7. Horsky, Thomas N.; Milgate, III, Robert W., Controlling the flow of vapors sublimated from solids.
  8. Pisot, Philippe, Element for controlling filling and/or drawing of a pressurized gas, tank and circuit provided with such an element.
  9. Arena, Chantal; Werkhoven, Christiaan, Equipment for high volume manufacture of group III-V semiconductor materials.
  10. Denis, Arnaud; Ligonesche, Renaud; Pisot, Philippe, Fluid filling and/or extraction control device and tank including one such device.
  11. Arena, Chantal; Werkhoven, Christiaan, Gallium trichloride injection scheme.
  12. Arena, Chantal; Werkhoven, Christiaan, Gallium trichloride injection scheme.
  13. Arena, Chantal; Werkhoven, Christiaan, Gallium trichloride injection scheme.
  14. Arena, Chantal; Bertram, Jr., Ronald Thomas; Lindow, Ed; Werkhoven, Christiaan, Gas injectors including a funnel- or wedge-shaped channel for chemical vapor deposition (CVD) systems and CVD systems with the same.
  15. Taylor, Anthony Park, In-situ removal of semiconductor process residues from dry pump surfaces.
  16. Udischas, Richard J.; Muller, Denis; Schleser, Werner, Integrated valve regulator assembly and system for the controlled storage and dispensing of a hazardous material.
  17. Udischas, Richard J.; Muller, Denis; Schleser, Werner, Integrated valve regulator assembly and system for the controlled storage and dispensing of a hazardous material.
  18. Sweeney, Joseph D.; Yedave, Sharad N.; Byl, Oleg; Kaim, Robert; Eldridge, David; Feng, Lin; Bishop, Steven E.; Olander, W. Karl; Tang, Ying, Ion source cleaning in semiconductor processing systems.
  19. Horsky, Thomas N.; Milgate, III, Robert W.; Sacco, Jr., George P.; Jacobson, Dale C.; Krull, Wade A., Method and apparatus for extending equipment uptime in ion implantation.
  20. Horsky, Thomas N.; Milgate, III, Robert W.; Sacco, Jr., George P.; Jacobson, Dale C.; Krull, Wade A., Method and apparatus for extending equipment uptime in ion implantation.
  21. Gregg, John N.; Battle, Scott L.; Banton, Jeffrey I.; Naito, Donn K.; Laxman, Ravi, Method and apparatus to help promote contact of gas with vaporized material.
  22. Gregg, John N.; Battle, Scott L.; Banton, Jeffrey I.; Naito, Donn K.; Laxman, Ravi K., Method and apparatus to help promote contact of gas with vaporized material.
  23. Gregg, John N.; Battle, Scott L.; Banton, Jeffrey I.; Naito, Donn K.; Laxman, Ravi K., Method and apparatus to help promote contact of gas with vaporized material.
  24. Gregg, John N.; Battle, Scott L.; Banton, Jeffrey I.; Naito, Donn K.; Laxman, Ravi K., Method and apparatus to help promote contact of gas with vaporized material.
  25. Gregg, John N.; Battle, Scott L.; Banton, Jeffrey I.; Naito, Donn K.; Laxman, Ravi K., Method and apparatus to help promote contact of gas with vaporized material.
  26. Cook, Kevin S.; Manning, Dennis; McIntyre, Edward K.; Goldberg, Richard, Method for extending equipment uptime in ion implantation.
  27. DiMeo, Jr., Frank; Dietz, James; Olander, W. Karl; Kaim, Robert; Bishop, Steven E.; Neuner, Jeffrey W.; Arno, Jose I., Methods for cleaning ion implanter components.
  28. Arena, Chantal; Werkhoven, Christiaan, Methods for high volume manufacture of group III-V semiconductor materials.
  29. Buezis, James G.; Kasprzyk, Donald J., Pressure regulator with bleed orifice.
  30. Denis, Arnaud; Ligonesche, Renaud; Pisot, Philippe, Pressurized gas filling and distribution head and tank equipped with one such head.
  31. Cleary, John M.; Arno, Jose I.; Hendrix, Bryan C.; Naito, Donn; Battle, Scott; Gregg, John N.; Wodjenski, Michael J.; Xu, Chongying, Solid precursor-based delivery of fluid utilizing controlled solids morphology.
  32. Thierry, Rolf; Thierry, Frank; Osenga, George, Surface energy modified particles, method of making, and use thereof.
  33. Arena, Chantal; Werkhoven, Christiaan, Temperature-controlled purge gate valve for chemical vapor deposition chamber.
  34. Arena, Chantal; Werkhoven, Christiaan, Temperature-controlled purge gate valve for chemical vapor deposition chamber.
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