초록 ▼

A laser treatment apparatus for performing treatments on an affected part by irradiating the affected part with a laser beam for treatment is disclosed. This apparatus includes a laser oscillator, a cooling unit including a fan which cools the laser oscillator, a temperature sensor which directly or

A laser treatment apparatus for performing treatments on an affected part by irradiating the affected part with a laser beam for treatment is disclosed. This apparatus includes a laser oscillator, a cooling unit including a fan which cools the laser oscillator, a temperature sensor which directly or indirectly detects a temperature of the laser oscillator, and a control unit which drives the fan at roughly constant low speed when a detected temperature by the temperature sensor is below a predetermined reference value and at roughly constant high speed when the detected temperature is the predetermined reference value or more.

대표청구항 ▼

A laser treatment apparatus for performing treatments on an affected part by irradiating the affected part with a laser beam for treatment is disclosed. This apparatus includes a laser oscillator, a cooling unit including a fan which cools the laser oscillator, a temperature sensor which directly or

A laser treatment apparatus for performing treatments on an affected part by irradiating the affected part with a laser beam for treatment is disclosed. This apparatus includes a laser oscillator, a cooling unit including a fan which cools the laser oscillator, a temperature sensor which directly or indirectly detects a temperature of the laser oscillator, and a control unit which drives the fan at roughly constant low speed when a detected temperature by the temperature sensor is below a predetermined reference value and at roughly constant high speed when the detected temperature is the predetermined reference value or more. 00, Kitayama, 369/013; US-5473595, 19951200, Hayashi et al., 369/124; US-5481509, 19960100, Knowles, 369/030; US-5490125, 19960200, Takada et al., 369/054; US-5493548, 19960200, Kamioka, 369/048; US-5586093, 19961200, Honda et al., 369/032; US-5587978, 19961200, Endo et al., 369/032; US-5608707, 19970300, Ogawa et al., 369/084; US-5610893, 19970300, Soga et al., 369/084; US-5633839, 19970500, Alexander et al., 369/030; US-5732059, 19980300, Katsuyama et al., 369/084; US-5740134, 19980400, Peterson, 369/030; US-5777811, 19980700, Bodo, 360/015; US-5790498, 19980800, Jeong, 369/084; US-5792971, 19980800, Timis et al., 084/609; US-5959944, 19990900, Dockes et al., 369/030; US-5963530, 19991000, Ward, 369/084; US-6086380, 20000700, Chu et al., 369/030; US-6147940, 20001100, Yankowski, 369/030; US-6163508, 20001200, Kim et al., 369/004