초록 ▼

A fiber optic cable having at least one interface being formed by a plurality of adjacent support members. Adjacent the interface is at least one retention area having an optical fiber component disposed therein. The retention area is disposed generally longitudinally and non-helically relative to a

A fiber optic cable having at least one interface being formed by a plurality of adjacent support members. Adjacent the interface is at least one retention area having an optical fiber component disposed therein. The retention area is disposed generally longitudinally and non-helically relative to an axis of the cable. The cable can also include a cable jacket substantially surrounding the support members, a cushioning zone adjacent the optical fiber component, a water-blocking component and/or an interfacial layer at least partially disposed between an outer surface of the support members and the cable jacket.

대표청구항 ▼

A fiber optic cable having at least one interface being formed by a plurality of adjacent support members. Adjacent the interface is at least one retention area having an optical fiber component disposed therein. The retention area is disposed generally longitudinally and non-helically relative to a

A fiber optic cable having at least one interface being formed by a plurality of adjacent support members. Adjacent the interface is at least one retention area having an optical fiber component disposed therein. The retention area is disposed generally longitudinally and non-helically relative to an axis of the cable. The cable can also include a cable jacket substantially surrounding the support members, a cushioning zone adjacent the optical fiber component, a water-blocking component and/or an interfacial layer at least partially disposed between an outer surface of the support members and the cable jacket. onal alignment element; and overcladding the waveguide to define a passive platform having an end of the waveguide exposed and in predetermined fixed relationship to the alignment element. 11. A method of manufacturing an active platform for a hybrid optical component comprising the steps of: providing an optical device from group III-V compounds; and masking and etching the group III-V compounds to form an alignment element which is a mirror image of an alignment element of a mating passive platform such that said active optical device can be positioned in aligned relationship to a passive optical device on the passive platform. 12. A hybrid optical component comprising: a passive platform including an optical element having an exposed end and an alignment element positioned in predetermined fixed relationship to said exposed end of said optical element; and an active platform comprising an active device and a substrate having an alignment element formed therein as a mirror image to said alignment element of said passive platform such that said active platform precisely interfits with said passive platform to align said active device with said exposed end of said optical element. 13. The hybrid optical component of claim 12 wherein said optical element is a waveguide. 14. The hybrid optical component of claim 13 wherein said active device is a solid state laser. 15. A method of manufacturing a hybrid optical component comprising the steps of: providing a first substrate; depositing a core having an index of refraction greater than said first substrate onto the first substrate; depositing a metallic layer having a thickness of from about 0.2 μm to about 5 μm onto the core; applying a pattern of photo-resist onto said metallic layer to define an optical element and an alignment element; etching away the exposed metallic layer; removing the photo-resist; etching away the exposed core to the substrate; masking the alignment element; overcladding the optical element to define a passive platform with a surface of the optical element exposed and in predetermined fixed relationship to the alignment element; providing an active optical device; masking and etching the active substrate to form an alignment element which is a mirror image of the alignment element of the passive platform; and coupling said active platform to said passive platform such that said active optical device is positioned in aligned relationship to the exposed surface of the optical element on the passive platform. 16. The method of claim 15 wherein said core depositing step is one of flame hydrolysis deposition and plasma-enhanced chemical vapor deposition. 17. The method of claim 16 wherein said etching of the core comprises reactive ion etching. 18. The method of claim 17 wherein said overcladding step comprises the steps of: applying a photo-resist to the alignment element; etching away the exposed metallic surface of the optical element; removing the photo-resist on the alignment element; and depositing an overclad layer having an index of refraction less than that of said core. 19. The method of claim 18 wherein depositing of a metallic layer comprises depositing a layer of silicon.