초록 ▼

A papermaking process wherein calcium carbonate is included in a pulp suspension. The dissolution of the calcium carbonate in the papermaking system is substantially retarded by the introduction of carbon dioxide to said pulp suspension. The invention also provides processes for the production of pa

A papermaking process wherein calcium carbonate is included in a pulp suspension. The dissolution of the calcium carbonate in the papermaking system is substantially retarded by the introduction of carbon dioxide to said pulp suspension. The invention also provides processes for the production of paper or board in papermaking systems wherein solid calcium carbonate is present as a filler and/or pigment.

대표청구항 ▼

A papermaking process wherein calcium carbonate is included in a pulp suspension. The dissolution of the calcium carbonate in the papermaking system is substantially retarded by the introduction of carbon dioxide to said pulp suspension. The invention also provides processes for the production of pa

A papermaking process wherein calcium carbonate is included in a pulp suspension. The dissolution of the calcium carbonate in the papermaking system is substantially retarded by the introduction of carbon dioxide to said pulp suspension. The invention also provides processes for the production of paper or board in papermaking systems wherein solid calcium carbonate is present as a filler and/or pigment. K., "Diagnostics and control of radicals in an inductively coupled etching reactor," J. Vac. Sci. Technol., vol. 13, No. 3, May/Jun. 1995, pp. 8878-893. Tynan, GR., Bailey III, A.D., Campbell, G.A., Charatan, R., de Chambrier, A., Gibson, G., Hemker, D.J., Jones, K., Kuthi, A., Lee, C., and Wilcoxson, M., "Characterization of an Azimuthally Symmetric Helicon Wave High Density Plasma Source," Trikon Technologies, Inc., Japan, Jul. 1997. European Patent Office Communication Pursuant to Article 96(2) and Rule 51(2) EPC for Application No. 94307307.2-2208, mailed Jan., 1996. Patent Abstracts of Japan, Publication No. 11026433, Jan. 29, 1999 (Matsushita Electron Corp). Patent Abstracts of Japan, Publication No. 57045927 A, Mar. 16, 1982 (Fujitsu Ltd). Patent Abstracts of Japan, Publication No. 62052714 A, Mar. 7, 1987 (Olympus Optical Co., Ltd; Toagosei Chem Ind Co Ltd). Patent Abstracts of Japan, Publication No. 06196446 A, Jul. 15, 1994 (NEC Corp). Patent Abstracts of Japan, Publication No. 07288196 A, Oct. 31, 1995 (Tokyo Electron Ltd). Patent Abstracts of Japan, Publication No. 08017799 A, Jan. 19, 1996 (Plasma Syst: KK). Wolf, Stanley Ph.D. and Tauber, Richard Ph.D., "Silicon Processing for the VLSI Era," vol. 1, Process Technology, California, 1986, pp. 568-572.