초록 ▼

A biopharmaceutical material cryopreservation system is provided that includes a flexible sterile container comprising a biocompatible polymeric material. The flexible sterile container contains biopharmaceuticals materials for freezing and cryopreservation. A freezing system is thermally coupled to

A biopharmaceutical material cryopreservation system is provided that includes a flexible sterile container comprising a biocompatible polymeric material. The flexible sterile container contains biopharmaceuticals materials for freezing and cryopreservation. A freezing system is thermally coupled to the biopharmaceutical materials via the flexible sterile container. The freezing system comprises a temperature sensor that monitors a temperature of the biopharmaceutical materials. Also, the freezing system comprises a feedback loop constructed to control a dendritic freezing front velocity, within the biopharmaceutical materials, in a range from approximately 5 millimeters per hour to approximately 250 millimeters per hour based on feedback information from the temperature sensor.

대표청구항 ▼

A biopharmaceutical material cryopreservation system is provided that includes a flexible sterile container comprising a biocompatible polymeric material. The flexible sterile container contains biopharmaceuticals materials for freezing and cryopreservation. A freezing system is thermally coupled to

A biopharmaceutical material cryopreservation system is provided that includes a flexible sterile container comprising a biocompatible polymeric material. The flexible sterile container contains biopharmaceuticals materials for freezing and cryopreservation. A freezing system is thermally coupled to the biopharmaceutical materials via the flexible sterile container. The freezing system comprises a temperature sensor that monitors a temperature of the biopharmaceutical materials. Also, the freezing system comprises a feedback loop constructed to control a dendritic freezing front velocity, within the biopharmaceutical materials, in a range from approximately 5 millimeters per hour to approximately 250 millimeters per hour based on feedback information from the temperature sensor. IC Designs", SPIE--Optical/Laser Microlithography VI, vol. 1927, pp. 2-16 (1993). Troccolo, P., et al., "Interferometric Measurement of Etch Depths in Phase Shift Masks", BACUS News, vol. 9, Issue 6, pp 1 & 4-6, Jun. 1993. Watanabe, H., et al., "Phase-Shifting Lithography: Maskmaking and its Application", J. Vac. Sci. Technol. B, vol. 11, No. 6, pp. 269-2674, Nov./Dec. 1993. Waas, T., et al., "Automatic Generation of Phase Shift Mask Layouts", Microelectronic Engineering, vol. 34, pp. 139-142 (1994). Langston, J., et al., "Extending Optical Lithography to 0.25um and Below", Solid State Technology, pp. 57-64, Mar. 1995. Nagahiro, Y., "Improved Mask Technique for Photolithography Applied to 0.25um LSI--Improvement of Resolution, Pattern Correction, Exposure Area", Nikkei Microdevices, pp. 1-6, Apr. 1995. Okamoto, Y., et al., "A New Phase Shifting Mask Technology for Quarter Micron Photolithography", SPIE, vol. 2512, pp. 311-318 (1995). Pierrat, C., et al., "Required Optical Characteristics of Materials for Phase-Shifting Masks", Applied Optics, vol. 34, No. 22, pp. 4923-4928, Aug. 1, 1995. Galan, G., et al., "Alternating Phase Shift Generation for Coplex Circuit Designs", SPIE, vol. 2884, pp. 508-519, Sep. 18-20, 1996. Kanai, H., et al., "Sub-Quarter Micron Lithography with the Dual-Trench Type Alternating P