IPC분류정보
국가/구분 |
United States(US) Patent
등록
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국제특허분류(IPC7판) |
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출원번호 |
US-0691747
(2000-10-18)
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발명자
/ 주소 |
- Wetzel, Todd G.
- Furlong, Edward R.
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출원인 / 주소 |
- Lockheed Martin Corporation
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대리인 / 주소 |
Katz, Erik R.Sutcliffe, Geoff L.Kilpatrick Stockton LLP
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인용정보 |
피인용 횟수 :
2 인용 특허 :
3 |
초록
▼
Flow separation detectors and, more particularly feedback sensor arrangements consisting of optical fiber tufts adapted to provide for the measurement of surface aerodynamic flow phenomena through the effects birefringence or transmitted light, and especially with regard to aerodynamic flow separati
Flow separation detectors and, more particularly feedback sensor arrangements consisting of optical fiber tufts adapted to provide for the measurement of surface aerodynamic flow phenomena through the effects birefringence or transmitted light, and especially with regard to aerodynamic flow separation which is encountered over a surface. Also facilitated is the detection of aerodynamic flow separation with a concurrent detection of encountered mechanical strain and stresses on the surface structure being monitored.
대표청구항
▼
Flow separation detectors and, more particularly feedback sensor arrangements consisting of optical fiber tufts adapted to provide for the measurement of surface aerodynamic flow phenomena through the effects birefringence or transmitted light, and especially with regard to aerodynamic flow separati
Flow separation detectors and, more particularly feedback sensor arrangements consisting of optical fiber tufts adapted to provide for the measurement of surface aerodynamic flow phenomena through the effects birefringence or transmitted light, and especially with regard to aerodynamic flow separation which is encountered over a surface. Also facilitated is the detection of aerodynamic flow separation with a concurrent detection of encountered mechanical strain and stresses on the surface structure being monitored. 9850400, Di Matteo et al., 356/375; US-4687325, 19870800, Corby, Jr., 356/001; US-4987432, 19910100, Landwehr, 356/376; US-5193120, 19930300, Gamache et al., 356/376; US-5237404, 19930800, Tanaka et al., 356/376; US-5444537, 19950800, Yoshimura et al., 356/376; US-5675407, 19971000, Geng, 356/147; US-6028672, 20000200, Geng, 356/376 s that are symmetrically inclined with respect to a plane of incidence including the predetermined direction; and a projection optical system to project the image of the pattern onto the substrate; wherein two diffracted beams differing in order generated from the pattern by irradiation of the light beams, pass through a same area on a pupil plane of the projection optical system substantially conjugate with one of the two portions. 10. An exposure apparatus that forms on a substrate an image of a pattern having linear features extending in at least a predetermined direction, said apparatus comprising: an illumination system that illuminates the pattern with light having an increased light density distribution within at least two sections relative to a portion defined along the predetermined direction on a pupil plane of the illumination system so that light beams from the at least two sections are directed to the pattern along at least one pair of paths that are symmetrically inclined with respect to a plane of incidence including the predetermined direction; and a projection optical system to project the image of the pattern onto the substrate; wherein two diffracted beams differing in order generated from the pattern by irradiation of the light beams, pass through a same area on a pupil plane of the projection optical system substantially conjugate with one of the at least two sections. 11. An exposure apparatus that forms on a substrate an image of a pattern having linear features extending in at least a predetermined direction, said apparatus comprising: an illumination system that illuminates the pattern with light having a decreased light intensity distribution within a portion defined along the predetermined direction on a pupil plane of the illumination system so that light beams from two portions symmetrically located with respect to the portion are directed to the pattern along a pair of paths that are symmetrically inclined with respect to a plane of incidence including the predetermined direction, said illumination system including a first filter to form the decreased light intensity distribution; and a projection optical system for projecting the image of the pattern onto the substrate through a second filter arranged at or in a vicinity of a Fourier transform plane of the projection optical system; wherein two diffracted beams differing in order generated from the pattern by irradiation of the light beams, pass through a same area on the Fourier transform plane substantially conjugate with one of the two portions. 12. A method of exposing a substrate through a projection optical system with a pattern having linear features extending in at least a predetermined direction, the method comprising: illuminating the pattern with light along a pair of paths that are symmetrically inclined with respect to a plane of incidence including the predetermined direction; and projection an image of the pattern onto the substrate; wherein a first diffracted beam generated from the pattern by irradiation of light along one path of the pair of paths and a second diffracted beam having different order from that of the first diffracted beam and generated from the pattern by irradiation of light along another path of the pair of paths, pass through a same area on a pupil plane of the projection optical system and apart from the optical axis thereof. 13. An apparatus that exposes an object with a pattern having linear features extending in at least a predetermined direction, the apparatus comprising: an illumination system that illuminates the pattern with light along a pair of paths that are symmetrically inclined with respect to a plane of incidence including the predetermined direction from at least two apertures provided on a stop and separated by a light shielding or light attenuating portion along the predetermined direction; and a projection optical system that projects an image of the pattern onto the object; wherein two diffracted beams differing in order generated from the pattern by irradiation of the light along the pair of paths, pass through a same area on a pupil plane of the projection optical system substantially conjugate with one of the at least two apertures. 14. An apparatus that exposes an object with a pattern having linear features extending in at least a predetermined direction, the apparatus comprising: an illumination system that illuminates the pattern with light along a pair of paths that are symmetrically inclined with respect to a plane of incidence including the predetermined direction passing through a stop that substantially blocks light along a path in a plane of incidence including the predetermined direction; and a projection optical system that projects an image of the pattern onto the object wherein a first diffracted beam generated from the pattern by irradiation of light along one path of the pair of paths and a second diffracted beam having different order from that of the first diffracted beam and generated from the pattern by irradiation of light alone another path of the pair of paths, pass through a same area on a pupil plane of the projection optical system and apart from the optical axis thereof. 15. An exposure apparatus comprising: a light source; a light condensing optical system that condenses light from said light source and applies the condensed light to a mask having a periodic pattern; a projection optical system that projects an image of said pattern illuminated by said condensed light onto a substrate; and an aperture member interposed between said light source and said mask, said aperture member being provided with two localized light transmitting areas arranged along a periodic direction of said periodic pattern so that light beams from two localized light transmitting areas are directed to the pattern along a pair of paths that are symmetrically inclined with respect to a plane of incidence including a direction perpendicular to the periodic direction; wherein two diffracted beams differing in order generated from the periodic pattern by irradiation of the light beams, pass through a same area on a pupil plane of the projection optical system substantially conjugate with one of the two localized light transmitting areas. 16. An exposure apparatus comprising: an illumination optical system that illuminates a pattern of a mask with light beams along a pair of paths that are symmetrically inclined with respect to a plane of incidence including a direction perpendicular to a periodic direction of the pattern from at least two apertures of a stop, each aperture providing a localized light transmitting area and being spaced, in the periodic direction, from an optical axis of the illumination optical system; and a projection optical system that projects an image of the pattern onto a predetermined plane; wherein two diffracted beams differing in order generated from the pattern by irradiation of the light beams, pass through a same area on a pupil plane of the projection optical system substantially conjugate with one of the at least two apertures. 17. An apparatus according to claim 16, wherein said illumination optical system has an optical integrator, said stop being adjacent to the optical intergrator. 18. An apparatus according to claim 16, wherein said stop has four apertures arranged at intervals of 90 degrees with respect to the optical axis of said illumination optical system. 19. A method of exposing a substrate with a pattern on a mask, comprising: arranging a stop having at least two apertures within an illumination system that illuminates the pattern with light beams from the apertures such that two of the apertures that define a pair of paths symmetrically inclined with respect to a plane of incidence including a direction perpendicular to a periodic direction of the pattern, are arranged along the periodic direction and apart from
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