Semiconductor device and method of fabricating the same
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
H01L-021/00
H01L-021/302
H01L-023/48
H01L-029/04
출원번호
US-0606414
(2000-06-29)
우선권정보
JP-0191102 (1999-07-06)
발명자
/ 주소
Hirakata, Yoshiharu
Goto, Yuugo
Kobayashi, Yuko
Yamazaki, Shunpei
출원인 / 주소
Semiconductor Energy Laboratory Co., Ltd.
대리인 / 주소
Nixon Peabody LLP
인용정보
피인용 횟수 :
96인용 특허 :
25
초록▼
There is provided a high quality liquid crystal panel having a thickness with high accuracy, which is designed, without using a particulate spacer, within a free range in accordance with characteristics of a used liquid crystal and a driving method, and is also provided a method of fabricating the s
There is provided a high quality liquid crystal panel having a thickness with high accuracy, which is designed, without using a particulate spacer, within a free range in accordance with characteristics of a used liquid crystal and a driving method, and is also provided a method of fabricating the same. The shape of a spacer for keeping a substrate interval constant is made such that it is a columnar shape, a radius R of curvature is 2 μm or less, a height H is 0.5 μm to 10 μm, a diameter is 20 μm or less, and an angle α is 65° to 115°. By doing so, it is possible to prevent the lowering of an opening rate and the lowering of light leakage due to orientation disturbance.
대표청구항▼
There is provided a high quality liquid crystal panel having a thickness with high accuracy, which is designed, without using a particulate spacer, within a free range in accordance with characteristics of a used liquid crystal and a driving method, and is also provided a method of fabricating the s
There is provided a high quality liquid crystal panel having a thickness with high accuracy, which is designed, without using a particulate spacer, within a free range in accordance with characteristics of a used liquid crystal and a driving method, and is also provided a method of fabricating the same. The shape of a spacer for keeping a substrate interval constant is made such that it is a columnar shape, a radius R of curvature is 2 μm or less, a height H is 0.5 μm to 10 μm, a diameter is 20 μm or less, and an angle α is 65° to 115°. By doing so, it is possible to prevent the lowering of an opening rate and the lowering of light leakage due to orientation disturbance. 2; US-5551487, 19960900, Gordon et al., 141/001; US-5607861, 19970300, Komatsu et al., 436/050; US-5626740, 19970500, Seto et al., 205/789; US-5665312, 19970900, Sperber et al.; US-5700637, 19971200, Southern et al.; US-5756050, 19980500, Ershow et al., 422/100; US-5770151, 19980600, Roach et al., 422/063; US-5800992, 19980900, Fodor et al., 435/006; US-5807522, 19980900, Brown et al., 422/050; US-5882930, 19990300, Baier, 436/049; US-5895630, 19990400, Skaborn et al., 422/100; US-6090251, 20000700, Sundberg et al., 204/600; US-6101946, 20000800, Martinsky, 422/100; US-6269846, 20010800, Overbeck et al., 436/180; US-6323043, 20011100, Caren et al., 436/180; US-6428752, 20020800, Montagu, 422/104; US-6551557, 20030400, Rose et al., 422/100 ., 073/019; US-4693999, 19870900, Axelsson et al., 514/174; US-4718433, 19880100, Feinstein, 128/660; US-4728575, 19880300, Gamble et al., 428/402.2; US-4728578, 19880300, Higgins et al., 428/462; US-4731239, 19880300, Gordon, 424/009; US-4737323, 19880400, Martin et al., 264/004.3; US-4774958, 19881000, Feinstein, 128/660.01; US-4775522, 19881000, Clark, Jr., 424/009; US-4776991, 19881000, Farmer et al., 264/004.3; US-4781871, 19881100, West, III et al., 264/004.3; US-4789501, 19881200, Day et al., 252/645; US-4790891, 19881200, Halliday et al., 149/002; US-4822534, 19890400, Lencki et al., 264/004.3; US-4830858, 19890500, Payne et al., 424/450; US-4834964, 19890500, Rosen, 424/009; US-4844882, 19890700, Widder et al., 424/009; US-4863717, 19890900, Keana, 424/009; US-4865836, 19890900, Long, Jr., 424/005; US-4877561, 19891000, Iga et al., 264/004.3; US-4893624, 19900100, Lele, 128/399; US-4895719, 19900100, Radhakrishnan et al., 424/045; US-4898734, 19900200, Mathiowitz et al., 424/426; US-4900540, 19900200, Ryan et al., 424/009; US-4918065, 19900400, Stindl et al., 514/179; US-4919895, 19900400, Heldebrant et al., 422/129; US-4921706, 19900500, Roberts et al., 424/450; US-4927623, 19900500, Long, Jr., 424/005; US-4933121, 19900600, Law et al., 264/004.3; US-4938947, 19900700, Nicolau et a
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