IPC분류정보
국가/구분 |
United States(US) Patent
등록
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국제특허분류(IPC7판) |
|
출원번호 |
US-0287665
(2002-11-04)
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발명자
/ 주소 |
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출원인 / 주소 |
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대리인 / 주소 |
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인용정보 |
피인용 횟수 :
7 인용 특허 :
6 |
초록
▼
A non-delayed input signal is provided to a first comparator input and, a delayed input signal is applied to a second comparator input. An offset voltage is applied between the delayed and non-delayed signals at the comparator inputs. When an input pulse appears on the input signal, the non-delayed
A non-delayed input signal is provided to a first comparator input and, a delayed input signal is applied to a second comparator input. An offset voltage is applied between the delayed and non-delayed signals at the comparator inputs. When an input pulse appears on the input signal, the non-delayed input signal will rise immediately and maintain itself more positive than the delayed input, keeping the comparator output inactive. As long as the input signal is rising, the comparator output is maintained low, or inactive. When the non-delayed signal reaches its peak and turns downward, the delayed input signal is still rising and crosses over the first pulse, creating a change of state at the comparator output to a high or active state. The signal edge resulting from this change of start represents initial detection of an input pulse. The time of occurrence of this detection edge is substantially independent of the pulse amplitude. To extend the dynamic range of the pulse discriminator, multiple channels, each implemented to handle a distinct range of signal levels, may be included, and combined at their outputs. To improve accuracy for very low-level signals, and to reduce the incidence of false alarms, a separate detection threshold can be used to gate the comparator.
대표청구항
▼
A non-delayed input signal is provided to a first comparator input and, a delayed input signal is applied to a second comparator input. An offset voltage is applied between the delayed and non-delayed signals at the comparator inputs. When an input pulse appears on the input signal, the non-delayed
A non-delayed input signal is provided to a first comparator input and, a delayed input signal is applied to a second comparator input. An offset voltage is applied between the delayed and non-delayed signals at the comparator inputs. When an input pulse appears on the input signal, the non-delayed input signal will rise immediately and maintain itself more positive than the delayed input, keeping the comparator output inactive. As long as the input signal is rising, the comparator output is maintained low, or inactive. When the non-delayed signal reaches its peak and turns downward, the delayed input signal is still rising and crosses over the first pulse, creating a change of state at the comparator output to a high or active state. The signal edge resulting from this change of start represents initial detection of an input pulse. The time of occurrence of this detection edge is substantially independent of the pulse amplitude. To extend the dynamic range of the pulse discriminator, multiple channels, each implemented to handle a distinct range of signal levels, may be included, and combined at their outputs. To improve accuracy for very low-level signals, and to reduce the incidence of false alarms, a separate detection threshold can be used to gate the comparator. comprises at least one treatment step selected from the group consisting of 1) pretreating at least one of said aminoalcohol solution, said hydroxide base or said reaction mixture to reduce the content of oxidizing agents therein; and 2) pretreating said catalyst with an acid to remove oxidized copper therefrom, whereby after said treatment step the reaction mixture contains less than about 3000 ppm of oxidized copper. 2. The process of claim 1 wherein the mixture contains less than about 500 ppm of oxidized copper. 3. The process of claim 1 wherein the mixture contains less than about 100 ppm of oxidized copper. 4. The process of claim 1 wherein the mixture contains less than about 50 ppm of oxidized copper. 5. The process of claim 1 wherein the catalyst comprises a hydroxide-resistant support, an anchor metal deposited on the support, and an element selected from the group consisting of copper, cobalt, nickel, cadmium and mixtures thereof on or combined with the anchor metal. 6. The process of claim 1 wherein the catalyst comprises Raney copper. 7. The process of claim 1 wherein the catalyst comprises Raney copper and also comprises one or more of chromium, titanium, niobium, tantalum, zirconium, vanadium, molybdenum, manganese, tungsten, cobalt, and nickel. 8. The process of claim 1 wherein the concentration of dissolved molecular oxygen in the reactor mixture is less than about 5 ppm. 9. The process of claim 1 wherein the concentration of dissolved molecular oxygen in the reactor mixture is less than about 1 ppm. 10. The process of claim 1 wherein the concentration of dissolved molecular oxygen in the reactor mixture is less than about 0.5 ppm. 11. The process of claim 1 further comprising removing molecular oxygen-containing gas from the reactor. 12. The process of claim 11 wherein air is removed from the reactor by displacement with fluids, by displacement with another gas, by vacuum, or by a combination thereof. 13. The process of claim 1 wherein the reactor mixture comprises between about 5 ppm to about 50 ppm of an oxygen sequestering agent. 14. The process of claim 13 wherein the oxygen sequestering agent is hydrogen sodium sulfite. 15. The process of claim 1 wherein the reactor mixture comprises less than about 1000 ppm of chlorite, chlorate, perchlorate, and hypochlorite salts. 16. The process of claim 1 wherein the mixture comprises less than about 500 ppm of chlorite, chlorate, perchlorate, and hypochlorite salts. 17. The process of claim 1 wherein the mixture comprises less than about 200 ppm of chlorite, chlorate, perchlorate, and hypochlorite salts. 18. The process of claim 1 wherein the mixture comprises less than about 40 ppm of chlorite, chlorate, perchlorate, and hypochlorite salts. 19. The process of claim 1 wherein the strong hydroxide base comprises less than about 500 ppm of chlorite, chlorate, perchlorate, and hypochlorite salts. 20. The process of claim 1 wherein the strong hydroxide base comprises less than about 200 ppm of chlorite, chlorate, perchlorate, and hypochlorite salts. 21. The process of claim 1 wherein the strong hydroxide base comprises less than about 40 ppm of chlorite, chlorate, perchlorate, and hypochlorite salts. 22. The process of claim 1 further comprising exposing the catalyst to acid prior to contacting the catalyst with the strong hydroxide base and primary aminoalcohol. 23. The process of claim 22 wherein the acid comprises organic acid, inorganic acid, EDTA, or mixtures thereof. 24. The process of claim 1 further comprising exposing the catalyst to a reducing agent prior to contacting the catalyst with the strong hydroxide base and primary aminoalcohol. 25. The process of claim 24 wherein the reducing agent comprises one or more of sodium borohydride, formaldehyde, hydrazine, hydrogen, formic acid or salt thereof prior to contacting the catalyst with the strong hydroxide base and primary aminoalcohol. 26. The process of claim 24 wherein the reducing agent comprises formi
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