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Enhanced optical transmission apparatus with improved aperture geometry 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01J-005/16
출원번호 US-0098970 (2002-03-14)
발명자 / 주소
  • Thio, Tineke
  • Linke, Richard A.
  • Pellerin, Kelly M.
  • Ebbesen, Thomas W.
  • Lezec, Henri J.
출원인 / 주소
  • NEC Laboratories America, Inc.
대리인 / 주소
    Scully, Scott, Murphy & Presser
인용정보 피인용 횟수 : 19  인용 특허 : 39

초록

An apparatus for enhanced light transmission is provided. The apparatus comprises a metal film having a first surface and a second surface, at least one aperture being provided in the metal film and extending from the first surface to the second surface. The at least one aperture comprises an entran

대표청구항

1. An apparatus for enhanced light transmission comprising: a metal film having a first surface and a second surface; at least one aperture provided in the metal film and extending from the first surface to the second surface, the at least one aperture comprising an entrance portion disposed on

이 특허에 인용된 특허 (39)

  1. Grobman Warren D. (Yorktown Heights NY) Nelson ; Jr. David A. (Carmel NY) Warlaumont John M. (Croton-on-Hudson NY), Alignment method and apparatus for x-ray or optical lithography.
  2. Goodman Douglas S. (Yorktown Heights NY), Confocal method and apparatus for focusing in projection lithography.
  3. Murai Fumio (Nishitama JPX) Okazaki Shinji (Urawa JPX) Yoda Haruo (Nishitama JPX) Shibata Yukinobu (Ibaraki JPX) Tsukizoe Akira (Koganei JPX), Electron beam lithography using an aperture having an array of repeated unit patterns.
  4. Ebbesen Thomas W. ; Grupp Daniel E. ; Thio Tineke ; Lezec Henri J.,FRX, Enhanced optical transmission apparatus utilizing metal films having apertures and periodic surface topography.
  5. Kim Tae Jin ; Krishnan Ajit ; Thio Tineke ; Lezec Henri Joseph,FRX ; Ebbesen Thomas W.,FRX, Enhanced optical transmission apparatus with improved inter-surface coupling.
  6. Karrai Khaled (Munich DEX), Far-field characterization of sub-wavelength sized apertures.
  7. Levine Jules D. (Dallas TX), Large area, fault tolerant solar energy converter.
  8. Simon H. J. (Toledo OH) Wang Yu (Toledo OH), Liquid crystal flat panel color display with surface plasmon scattering.
  9. Boysel Robert M., Membrane optical waveguide device and method of fabrication.
  10. Hotchkiss Gregory (Richardson TX) Levine Jules D. (Dallas TX) Sharrock Paul R. (Plano TX), Method and apparatus for affixing spheres to a foil matrix.
  11. Isaacson Michael (Ithaca NY) Lewis Aaron (Ithaca NY), Method and apparatus for production and use of nanometer scale light beams.
  12. Isaacson Michael (Ithaca NY) Lewis Aaron (Ithaca NY), Method and apparatus for production and use of nanometer scale light beams.
  13. Saito Kazuhiro (Tsukuba JPX) Yokoyama Hiroshi (Tsukuba JPX) Wakamatsu Takashi (Iwaki JPX), Method and device for improved photoelectric conversion.
  14. Gunther Rolf,DEX, Method and device for the determination of material-specific parameters of one or a few molecules by means of correlatio.
  15. Grupp Daniel E., Method for fabricating free-standing thin metal films.
  16. Deckman, Harry W.; Witzke, Horst; Wronski, Christopher; Yablonovitch, Eli, Method for making optically enhanced thin film photovoltaic device using lithography defined random surfaces.
  17. Hotchkiss Gregory B. (Dallas TX), Method for manufacture of solar cell with foil contact point.
  18. Yahalom Joseph (Haifa ILX), Method for preparation of mask for X-ray lithography.
  19. Tanaka Yoshiharu (Tokyo JPX) Kouno Eiichi (Tokyo JPX) Iwata Joji (Tokyo JPX), Method of alignment between mask and semiconductor wafer.
  20. Jensen Millard J. (Balch Springs TX) Levine Jules D. (Dallas TX), Method of anodizing and sealing aluminum.
  21. Quate Calvin F. (Stanford CA), Near field scanning optical and force microscope including cantilever and optical waveguide.
  22. Ebbesen Thomas W. ; Ghaemi Hadi F. ; Thio Tineke ; Wolff Peter A., Near-field scanning optical microscope having a sub-wavelength aperture array for enhanced light transmission.
  23. Wolff Peter A., Near-field scanning optical microscope probe exhibiting resonant plasmon excitation.
  24. Thaxter James B. (Townsend MA), Optical alignment of masks for X-ray lithography.
  25. Kim Tae Jin ; Thio Tineke ; Ebbesen Thomas Wren, Optical transmission control apparatus utilizing metal films perforated with subwavelength-diameter holes.
  26. Glass, Alastair M.; Liao, Paul F., Photodetector having a contoured, substantially periodic surface.
  27. Ishida Akito,JPX ; Sakata Yoshiteru,JPX ; Imahori Hiroshi,JPX ; Akiyama Tsuyoshi,JPX, Photoresponsive electrode and wet solar cell.
  28. Beecher, Jody; Scheufele, Frank; Voivodov, Kamen; Weinberger, Scot; Landgraf, William, Probes with hydrophobic coatings for gas phase ion spectrometers.
  29. Hanak Joseph J. (Birmingham MI), Process and apparatus for continuous production of lightweight arrays of photovoltaic cells.
  30. Hartman Robert A. (Chagrin Falls OH) Koch Paul E. (Chagrin Falls OH), Process and apparatus for continuous production of lightweight arrays of photovoltaic cells.
  31. Solin Stuart A. (Princeton Junction NJ), Process for forming a magnetoresistive sensor for a reading head.
  32. Simon Henry John, Sensor using long range surface plasmon resonance with diffraction double-grating.
  33. Anderson Lynn M. (Lyndhurst OH), Solar energy converter using surface plasma waves.
  34. Ebbesen Thomas W. ; Ghaemi Hadi F. ; Thio Tineke ; Wolff Peter A., Sub-wavelength aperture arrays with enhanced light transmission.
  35. Walt David R. (Lexington MA) Pantano Paul (Everett MA), Superresolution imaging fiber for subwavelength light energy generation and near-field optical microscopy.
  36. Wang Yu (40-57 Junction Blvd. Corona NY 11368), Surface plasmon high efficiency HDTV projector.
  37. King David A. (Palo Alto CA) Seher Jens-Peter (Stuttgart DEX), Surface plasmon resonance measuring instruments.
  38. Takasu Shinichiro (Tokyo JPX) Shinozaki Toshiaki (Yokohama JPX), System for transferring a fine pattern onto a target.
  39. Iwahashi Kenji (Kyoto JPX), X-ray reflective mask and system for image formation with use of the same.

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  1. Craighead, Harold G.; Webb, Watt W.; Xu, Huizhong; Zhu, Pangshun, Extraordinary light transmission apparatus and method.
  2. Berte, Marc V., High resolution thermography.
  3. Guha, Supratik; Gunawan, Oki, Holey electrode grids for photovoltaic cells with subwavelength and superwavelength feature sizes.
  4. Guha, Supratik; Gunawan, Oki, Holey electrode grids for photovoltaic cells with subwavelength and superwavelength feature sizes.
  5. Chagovetz, Alexander M.; Blair, Steven M.; Jensen, Randy L.; Lowder, Bryan J., Methods and compositions related to quantitative, array based methylation analysis.
  6. Maldonado,Juan R.; Coyle,Steven T., Multiple electron beam system with electron transmission gates.
  7. Guo, Junpeng, Nanostructure diffraction gratings for integrated spectroscopy and sensing.
  8. Okitsu, Masahiro; Ogura, Kazuyuki; Konno, Kenji; Hatano, Hiroshi, Optical element for condensing incident light.
  9. Nakada,Matsafumi; Thio,Tineke, Optical element for enhanced transmission of light and suppressed increase in temperature.
  10. Watanabe, Makoto; Bulgarevich, Dmitry; Shiwa, Mitsuharu, Optical element for terahertz waves.
  11. Lezec,Henri Joseph; Ebbesen,Thomas Wren, Optical transmission apparatus with directionality and divergence control.
  12. Hollingsworth, Russell E., Plasmon coupling apparatus and method.
  13. Ballato,John; Carroll,David L.; Dimaio,Jeffrey R., Plasmon-photon coupled optical devices.
  14. Ballato,John; Carroll,David L.; Dimaio,Jeffrey R., Plasmon-photon coupled optical devices.
  15. Blair, Steven M.; Diwekar, Mohit; Attavar, Sachin; Chagovetz, Alexander; Davis, Mark Alan; Dredge, John, Sub-wavelength metallic apertures as light enhancement devices.
  16. Lakowicz, Joseph R.; Chowdhury, Mustafa Habib; Sabanayagam, Chandran R., Subwavelength resolution optical microscopy.
  17. Stark,Peter Randolph Hazard, Surface plasmon enhanced illumination apparatus having non-periodic resonance configurations.
  18. Hollingsworth, Russell E.; Lanning, Bruce Roy, Surface plasmon noncontact electric field sensors and related methods.
  19. Kim,Dai Sik; Hohng,Sung Chul; Lienau,Christoph; Malyarchuck,Victor; Park,Jong Wan; Yoon,Yeo Chan; Ryu,Han Youl; Yoo,Kyeong Hwa, Surface plasmon optic devices and radiating surface plasmon sources for photolithography.
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