초록 ▼

A preferred embodiment of the inventive fluid delivery system comprises a vertical liquid/vapor separator and riser assembly that comprises a multi-phase separator inlet, a vapor outlet and riser, and a liquid outlet port connected to a hydraulically-driven centrifugal pump. By controlling the opera

A preferred embodiment of the inventive fluid delivery system comprises a vertical liquid/vapor separator and riser assembly that comprises a multi-phase separator inlet, a vapor outlet and riser, and a liquid outlet port connected to a hydraulically-driven centrifugal pump. By controlling the operational speed of the pump, the level of the separated liquid within the separator can be controlled without the need for control valves. The vertical separator is capable of low pressure operation and large variations in controlled liquid levels within the separator, allowing the relatively slow reaction time pump to control the liquid level from low pressure wells penetrating low pressure reservoirs.

대표청구항 ▼

A preferred embodiment of the inventive fluid delivery system comprises a vertical liquid/vapor separator and riser assembly that comprises a multi-phase separator inlet, a vapor outlet and riser, and a liquid outlet port connected to a hydraulically-driven centrifugal pump. By controlling the opera

A preferred embodiment of the inventive fluid delivery system comprises a vertical liquid/vapor separator and riser assembly that comprises a multi-phase separator inlet, a vapor outlet and riser, and a liquid outlet port connected to a hydraulically-driven centrifugal pump. By controlling the operational speed of the pump, the level of the separated liquid within the separator can be controlled without the need for control valves. The vertical separator is capable of low pressure operation and large variations in controlled liquid levels within the separator, allowing the relatively slow reaction time pump to control the liquid level from low pressure wells penetrating low pressure reservoirs. apart from one another by a predetermined interval and are alternately distributed in a longitudinal direction. 29. The evaporator of a CPL cooling apparatus of claim 26, wherein the height of the patterns formed in a region excluding the channel region among the patterns formed in the second pattern region is higher or lower than the height of patterns formed in the channel region. 30. The evaporator of a CPL cooling apparatus of claim 13, wherein a plurality of patterns providing direction to the flow of the coolant are formed in the third pattern region such that the coolant flowing from the adjacent pattern region flows along the circumference or border of the cooling part and then turns toward the center of the cooling part. 31. The evaporator of a CPL cooling apparatus of claim 30, wherein each of the plurality of patterns formed in the third pattern region has a predetermined height, and the patterns are arranged in adjacent rows exactly adjacent to one another. 32. The evaporator of a CPL cooling apparatus of claim 30, wherein the height of the plurality of patterns is higher or lower than the patterns formed in the adjacent pattern region. 33. The evaporator of a CPL cooling apparatus of claim 13, wherein a plurality of patterns are distributed in the fourth pattern region such that the coolant flowing from the adjacent pattern region flows into the center of the cooling part, and simultaneously isotropically flows into the entire fourth pattern region. 34. The evaporator of a CPL cooling apparatus of claim 33, wherein each of the plurality of patterns formed in the fourth pattern region has a predetermined height. 35. The evaporator of a CPL cooling apparatus of claim 33, wherein the height of the plurality of patterns is higher or lower than the patterns formed in the adjacent pattern region. 36. The evaporator of a CPL cooling apparatus of claim 33, wherein the thicknesses of the plurality of patterns become smaller from the fourth pattern region to the fifth pattern region. 37. The evaporator of a CPL cooling apparatus of claim 13, wherein a plurality of patterns are distributed in the fifth pattern region such that the coolant flowing from the adjacent pattern region uniformly and quickly flows into the entire fifth pattern region. 38. The evaporator of a CPL cooling apparatus of claim 37, wherein the thickness of each of the plurality of patterns is the same as the patterns formed in the adjacent pattern region, or smaller than the patterns formed in the adjacent pattern region. 39. The evaporator of a CPL cooling apparatus of claim 38, wherein each of the plurality of patterns is a circular cylinder having a predetermined height. 4