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Semiconductor processing apparatus having lift and tilt mechanism 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01B-011/14
출원번호 US-0618707 (2000-07-18)
발명자 / 주소
  • Hanson, Kyle
  • Dix, Mark
  • Zila, Vladimir
  • Woodruff, Daniel J.
출원인 / 주소
  • Semitool, Inc.
대리인 / 주소
    perkins Coie LLP
인용정보 피인용 횟수 : 21  인용 특허 : 60

초록

A lift/tilt assembly for use in a semiconductor wafer processing device is set forth. The lift/tilt assembly includes a linear guide comprising a fixed frame and a moveable frame. A nest for accepting a plurality of semiconductor wafers is rotatably connected to the moveable frame. The nest rotates

대표청구항

A lift/tilt assembly for use in a semiconductor wafer processing device is set forth. The lift/tilt assembly includes a linear guide comprising a fixed frame and a moveable frame. A nest for accepting a plurality of semiconductor wafers is rotatably connected to the moveable frame. The nest rotates

이 특허에 인용된 특허 (60)

  1. Boyle Edward F. (Gig Harbor WA) Wilkins G. Scott (Gig Harbor WA), Apparatus for handling sensitive material such as semiconductor wafers.
  2. Sakaya Kazuhiro (Yokohama JPX) Kodama Shoichi (Tokyo JPX), Apparatus for transferring semiconductor wafers.
  3. Shiraiwa Hirotsugu (Hino JPX), Apparatus for transferring semiconductor wafers.
  4. Bergman Eric J. (Kalispell MT), Aqueous hydrofluoric acid vapor processing of semiconductor wafers.
  5. Bergman Eric J. (Kalispell MT), Aqueous hydrofluoric and hydrochloric acid vapor processing of semiconductor wafers.
  6. Davis Jeffrey A. (Kalispell MT) Curtis Gary L. (Kalispell MT), Automated semiconductor processing systems.
  7. Freerks Frederik W. (Cupertino CA) Ames Kenneth D. (San Jose CA), Cassette loader having compound translational motion.
  8. Thompson Raymon F. (Lakeside MT) Owczarz Aleksander (Kalispell MT), Centrifugal wafer carrier cleaning apparatus.
  9. Hunt James R. (Westminster CA) Balent Russell P. (Fountain Valley CA), Centrifugal wafer processor.
  10. Thompson Raymon F. (137 Sherry La. Kalispell MT 59901), Centrifugal wafer processor.
  11. Oehler Henry (Hennef DEX) Peth Norbert (Much DEX) Holpp Hans W. (Hennef DEX) Sass Wolfgang (Hennef DEX), Centrifuging installation.
  12. Matsushita Yoshinari (Hirakata JPX) Fukumoto Kenji (Hirakata JPX), Chemical vapor deposition reaction apparatus having isolated reaction and buffer chambers.
  13. Ishii Katsumi (Fujino JPX) Asano Takanobu (Yokohama JPX) Abe Masaharu (Sagamihara JPX) Yamaga Kenichi (Sagamihara JPX) Sakata Kazunari (Sagamihara JPX) Tanahashi Takashi (Machida JPX) Moriya Syuji (Y, Clean air apparatus.
  14. Shiraiwa Hirotsugu (Hino JPX), Conveyor apparatus.
  15. Toshima Masato M. (Sunnyvale CA) Salzman Phil M. (San Jose CA) Murdoch Steven C. (Palo Alto CA) Wang Cheng (San Jose CA) Stenholm Mark A. (San Jose CA) Howard James (San Jose CA) Hall Leonard (San Jo, Dual cassette load lock.
  16. Bergman Eric J. (120 Midale Kalispell MT 59901), Dynamic semiconductor wafer processing using homogeneous chemical vapors.
  17. Bergman Eric J. (Kalispell MT), Dynamic semiconductor wafer processing using homogeneous mixed acid vapors.
  18. Mori Noriaki (Hikone JPX), Elevator between transfer passages.
  19. Garric George (Perthes FRX) Lafond Andr (Nemours FRX), Fully automated and computerized conveyor based manufacturing line architectures adapted to pressurized sealable transpo.
  20. Asakawa Teruo (Yamanashi JPX) Ohsawa Tetsu (Kofu JPX), Handling apparatus for transferring carriers and a method of transferring carriers.
  21. Ohsawa Tetsu (Sagamihara JPX), Heat treating apparatus.
  22. Sieradzki Manny (Gloucester MA), High speed movement of workpieces in vacuum processing.
  23. Leonov Mark (Santa Clara CA) Kerba Emile N. (Los Altos CA) Aknin Jack (San Carlos CA), Holder mechanism for simultaneously tilting and rotating a wafer cassette.
  24. Ishii Katsumi (Fujino JPX) Mochizuki Yoshinori (Hachioji JPX), Horizontal/vertical conversion handling apparatus.
  25. Marohl Dan A., Magnetically coupled wafer extraction platform.
  26. Chiba Yuji (Isehara JPX) Fujioka Hidehiko (Atsugi JPX) Mizusawa Nobutoshi (Yamato JPX) Kariya Takao (Hino JPX) Shimoda Isamu (Zama JPX), Mask cassette and mask cassette loading device.
  27. Giles Brian A. (Honeoye Falls NY) Schwab Frederick J. (Churchville NY), Method and apparatus for cleaning semiconductor wafers.
  28. Tam Johann (Santa Clara CA), Method and apparatus for drying wafers.
  29. Hassan Javathu K. (Hopewell Junction NY) Mack Alfred (Poughkeepsie NY) Wojtaszek Michael R. (Poughkeepsie NY), Method and apparatus for handling workpieces.
  30. Asano Takanobu (Yokohama JPX) Iwai Hiroyuki (Sagamihara JPX) Ono Yuji (Sagamihara JPX), Method of loading and unloading wafer boat.
  31. Bayne Christopher J. (Lightwater GB2), Methods of and apparatus for transferring articles between carrier members.
  32. Bergman Eric J. (Kalispell MT) Reardon Timothy J. (Kalispell MT) Thompson Raymon F. (Lakeside MT) Owczarz Aleksander (Kalispell MT), Multi-station semiconductor processor with volatilization.
  33. Foulke Richard F. (Carlisle MA) Keohane Richard J. (Braintree MA), Particle-free storage for articles.
  34. Akimoto Masami,JPX ; Ogawa Shizuo,JPX ; Nagano Toshihiko,JPX, Resist processing apparatus having an interface section including two stacked substrate waiting tables.
  35. Owczarz Aleksander (Kalispell MT) Thompson Raymon F. (Kalispell MT), Robot loadable centrifugal semiconductor processor with extendible rotor.
  36. Hanson Kyle ; Dix Mark ; Zila Vladimir,CAX ; Woodruff Daniel J., Semiconductor processing apparatus having lift and tilt mechanism.
  37. Reardon Timothy J. (Kalispell MT) Meuchel Craig P. (Kalispell MT) Oberlitner Thomas H. (Kalispell MT), Semiconductor processing spray coating apparatus.
  38. Thompson Raymon F. (Kalispell MT) Berner Robert W. (Kalispell MT) Curtis Gary L. (Kalispell MT) Culliton Stephen P. (Bozeman MT) Wright Blaine G. (Kalispell MT) Byle Darryl S. (Kalispell MT) Pedersen, Semiconductor processing system with wafer container docking and loading station.
  39. Thompson Raymon F. (Kalispell MT) Berner Robert W. (Kalispell MT) Curtis Gary L. (Kalispell MT) Culliton Stephen P. (Bozeman MT) Wright Blaine G. (Kalispell MT), Semiconductor processing systems.
  40. Bergman Eric J. (Kalispell MT) Reardon Timothy J. (Kalispell MT) Thompson Raymon F. (Lakeside MT) Owczarz Aleksander (Kalispell MT), Semiconductor processor apparatus with dynamic wafer vapor treatment and particulate volatilization.
  41. Thompson Raymon F. (Kalispell MT) Owczarz Aleksander (Kalispell MT), Semiconductor processor with extendible receiver for handling multiple discrete wafers without wafer carriers.
  42. Powers Lyle R. (Boulder CO) Crill Rikk (Longmont CO), Semiconductor wafer cassette mapper with emitter and detector arrays for slot interrogation.
  43. Thompson Raymon F. (Lakeside MT) Berner Robert W. (Kalispell MT) Curtis Gary L. (Kila MT) Culliton Stephen P. (Kalispell MT) Wright Blaine G. (Whitefish MT), Semiconductor wafer processing system.
  44. Thompson Raymon F. (Kalispell MT) Gordon Robert W. (Seattle WA) Durado Daniel (Kalispell MT), Single wafer processor.
  45. Thompson Raymon F. (Kalispell MT) Owczarz Aleksander (Kalispell MT), Single wafer processor apparatus.
  46. Aigo Seiichiro (3-15-13 ; Negishi ; Daito-ku Tokyo JPX), Spin drier for semiconductor materials.
  47. Karl Gerald M. (Ontario NY), Spin drying apparatus.
  48. Harada Junji (Kumamoto JPX) Harada Ichiro (Kumamoto JPX) Nakamura Koji (Kumamoto JPX), Substrate processing method and substrate processing apparatus.
  49. Olbrich Herbert (Rutesheim DEX) Gentischer Joseph (Remshalden DEX) Fruhauf Wolfgang (Gerlingen DEX) Dorner Johann (Deizizau DEX) Breitschwerdt Gnther (Stuttgart DEX) Kunze-Concewitz Horst (Wiernsheim, System for manufacturing semiconductor substrates.
  50. Nguyen Loc H. (1617 Whittenburg Fort Worth TX 76134), Transfer apparatus for semiconductor wafers.
  51. Iwai Hiroyuki (Sagamihara JPX) Tanifuji Tamotsu (Yamato JPX) Asano Takanobu (Yokohama JPX) Okura Ryoichi (Kanagawa-ken JPX), Treatment apparatus.
  52. Nishi Hironobu (Sagamihara JPX), Vertical heat-treating apparatus.
  53. Asano Takanobu (Yokohama JPX) Kitayama Hirofumi (Aikawa JPX) Iwai Hiroyuki (Sagamihara JPX) Ono Yuuji (Sagamihara JPX), Vertical heat-treatment apparatus having a wafer transfer mechanism.
  54. Ishii Katsumi (Kanagawa JPX) Takikawa Masao (Sagamihara JPX), Wafer container and wafer aligning apparatus.
  55. Thompson Raymon F. (Kalispell MT) Owczarz Aleksander (Kalispell MT), Wafer holder with flexibly mounted gripping fingers.
  56. Thompson Steven R. (Somers MT) LaBere Rikki S. (Kalispell MT), Wafer transfer apparatus.
  57. Hertel Richard J. (Bradford MA) MacIntosh Edward D. (Gloucester MA), Wafer transfer system.
  58. Wiesler Mordechai ; Weiss Mitchell, Wafer transfer system having vertical lifting capability.
  59. Asano Takanobu (Yokohama JPX), Wafers transfer device.
  60. Kamikawa Yuuji (Uto JPX) Kuroda Kouki (Kurume JPX) Honda Yoshiyuki (Kumamoto JPX) Mukai Eiichi (Kurume JPX) Nishi Mitsuo (Kurume JPX), Washing system.

이 특허를 인용한 특허 (21)

  1. Chen,Linlin; Wilson,Gregory J.; McHugh,Paul R.; Weaver,Robert A.; Ritzdorf,Thomas L., Apparatus and method for electrochemically depositing metal on a semiconductor workpiece.
  2. Hanson,Kyle M., Apparatus and methods for electrochemical processing of microelectronic workpieces.
  3. Hanson,Kyle M.; Ritzdorf,Thomas L.; Wilson,Gregory J.; McHugh,Paul R., Apparatus and methods for electrochemical processing of microelectronic workpieces.
  4. McHugh, Paul R.; Wilson, Gregory J.; Woodruff, Daniel J., Apparatus and methods for electrochemical processing of microfeature wafers.
  5. McHugh, Paul R.; Wilson, Gregory J.; Woodruff, Daniel J., Apparatus and methods for electrochemical processing of microfeature wafers.
  6. Flitsch, Frederick A., Apparatus to support a cleanspace fabricator.
  7. Harris,Randy A.; Hanson,Kyle M., Apparatuses and method for transferring and/or pre-processing microelectronic workpieces.
  8. Hanson, Kyle M.; Klocke, John L., Chambers, systems, and methods for electrochemically processing microfeature workpieces.
  9. Klocke,John; Hanson,Kyle M, Chambers, systems, and methods for electrochemically processing microfeature workpieces.
  10. Klocke,John; Hanson,Kyle M, Chambers, systems, and methods for electrochemically processing microfeature workpieces.
  11. Woodruff,Daniel J.; Hanson,Kyle M., Electroplating apparatus with segmented anode array.
  12. Flitsch, Frederick A., Method and apparatus for an automated tool handling system for a multilevel cleanspace fabricator.
  13. Flitsch, Frederick, Method and apparatus to support a cleanspace fabricator.
  14. Flitsch, Frederick A., Method and apparatus to support process tool modules in a cleanspace fabricator.
  15. Flitsch, Frederick A., Method of forming a cleanspace fabricator.
  16. Ritzdorf,Thomas L.; Eudy,Steve L.; Wilson,Gregory J.; McHugh,Paul R.; Weaver,Robert A.; Aegerter,Brian; Dundas,Curt; Peace,Steven L., Methods and apparatus for processing microelectronic workpieces using metrology.
  17. Flitsch, Frederick A., Methods and apparatus for vertically orienting substrate processing tools in a clean space.
  18. Melching,Achim, Object storage device and climate-controlled cabinet.
  19. Walker, Andrew; Bean, Frederick R.; Vantran, John S., Portable power tool.
  20. Tanaka, Akira; Kishi, Takashi, Power supply apparatus for supplying electric power to substrate carrier container.
  21. Wilson, Gregory J.; McHugh, Paul R.; Hanson, Kyle M., System for electrochemically processing a workpiece.
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