초록 ▼

A structure used in the production of a face plate of a display includes a substrate assembly having a conductive surface at a first side thereof, one or more projections (e.g., spacers) extending from the first side of the substrate assembly, and electrophoretically deposited and patternable materi

A structure used in the production of a face plate of a display includes a substrate assembly having a conductive surface at a first side thereof, one or more projections (e.g., spacers) extending from the first side of the substrate assembly, and electrophoretically deposited and patternable material (e.g., photoresist), on the conductive surface and adjacent the projections. The patternable material may define openings to the conductive surface for use in deposition of one or more light emitting elements on the conductive surface. In another embodiment, the structure used in the production of a display may comprise a substrate assembly including a conductive surface, one or more nonconductive regions (e.g., one or more phosphor light emitting elements, black matrix material, nonconductive regions have a thickness less than about 15 microns) formed on the conductive surface, and electrophoretically deposited patternable material formed over the conductive surface and the one or more nonconductive regions. The patternable material may define openings to the conductive surface for use in formation of light emitting elements on the conductive surface.

대표청구항 ▼

A structure used in the production of a face plate of a display includes a substrate assembly having a conductive surface at a first side thereof, one or more projections (e.g., spacers) extending from the first side of the substrate assembly, and electrophoretically deposited and patternable materi

A structure used in the production of a face plate of a display includes a substrate assembly having a conductive surface at a first side thereof, one or more projections (e.g., spacers) extending from the first side of the substrate assembly, and electrophoretically deposited and patternable material (e.g., photoresist), on the conductive surface and adjacent the projections. The patternable material may define openings to the conductive surface for use in deposition of one or more light emitting elements on the conductive surface. In another embodiment, the structure used in the production of a display may comprise a substrate assembly including a conductive surface, one or more nonconductive regions (e.g., one or more phosphor light emitting elements, black matrix material, nonconductive regions have a thickness less than about 15 microns) formed on the conductive surface, and electrophoretically deposited patternable material formed over the conductive surface and the one or more nonconductive regions. The patternable material may define openings to the conductive surface for use in formation of light emitting elements on the conductive surface.