초록 ▼

An apparatus for measuring the dynamic characteristics of the vehicle wheel alignment in non-contact fashion with high accuracy is disclosed. A laser light source (4) emits a laser beam of a predetermined geometric pattern toward the wheel side surface. A laser beam control device (6) controls the w

An apparatus for measuring the dynamic characteristics of the vehicle wheel alignment in non-contact fashion with high accuracy is disclosed. A laser light source (4) emits a laser beam of a predetermined geometric pattern toward the wheel side surface. A laser beam control device (6) controls the width of the laser beam in such a manner as to be radiated only in a predetermined range of the wheel side surface. Two laser light sources (120), (121) emit non-parallel laser beams. A photdetecting device (122) receives the two laser beams and converts them to two corresponding image data. A processing unit calculates the distance between the two images based on the two image data and calculates the wheel alignment based on the same distance.

대표청구항 ▼

An apparatus for measuring the dynamic characteristics of the vehicle wheel alignment in non-contact fashion with high accuracy is disclosed. A laser light source (4) emits a laser beam of a predetermined geometric pattern toward the wheel side surface. A laser beam control device (6) controls the w

An apparatus for measuring the dynamic characteristics of the vehicle wheel alignment in non-contact fashion with high accuracy is disclosed. A laser light source (4) emits a laser beam of a predetermined geometric pattern toward the wheel side surface. A laser beam control device (6) controls the width of the laser beam in such a manner as to be radiated only in a predetermined range of the wheel side surface. Two laser light sources (120), (121) emit non-parallel laser beams. A photdetecting device (122) receives the two laser beams and converts them to two corresponding image data. A processing unit calculates the distance between the two images based on the two image data and calculates the wheel alignment based on the same distance. and tilt target values concerning an exposure shot exposed normally immediately before the forced exposure. 7. The apparatus according to claim 1, wherein when said exposure unit performs forced exposure, said controller causes said exposure unit to continue an exposure sequence. 8. An exposure apparatus for transferring a projection pattern onto a substrate and exposing the substrate while scanning the substrate by a stage, said apparatus comprising: a controller for, when an exposure shot region on the substrate cannot converge during scan to a predetermined focus precision or leveling precision, a predetermined two-dimensional sync control precision, or a predetermined exposure amount control precision, determining the exposure shot as an error, and controlling the stage so as to move the substrate to a predetermined position upon determination of the error; and an exposure unit for forcibly transferring the projection pattern onto the substrate at the predetermined position in the exposure shot and exposing the substrate. 9. The apparatus according to claim 8, wherein the predetermined position includes at least one of a focus position and a leveling position. 10. The apparatus according to claim 8, wherein when said exposure unit performs forced exposure, the predetermined position includes focus and tilt target values derived from measurement results of global focus measurement and global tilt measurement that are executed for the substrate in advance. 11. The apparatus according to claim 8, wherein when said exposure unit performs forced exposure, the predetermined position includes focus and tilt target values concerning an exposure shot exposed normally immediately before the forced exposure. 12. The apparatus according to claim 8, wherein when said exposure unit performs forced exposure, said controller causes said exposure unit to continue an exposure sequence. 13. An exposure apparatus for transferring a projection pattern onto a substrate and exposing the substrate while scanning the substrate, said apparatus comprising: a controller for, when an exposure shot region cannot converge to a predetermined focus precision during scan, determining the exposure shot as an error, and controlling a shot beam from an exposure light source upon determination of the error, wherein said controller shields the shot beam from the exposure light source or stops an emission command upon determination of the error, and said controller retries exposure under the same condition when the shot beam is shielded or the emission command is stopped; a stage for moving the substrate to a predetermined position upon determination of the error; and an exposure unit for forcibly transferring the projection pattern onto the substrate and exposing the substrate at the predetermined position in the exposure shot, wherein said exposure unit executes forced exposure when a focusing error of the exposure light source is determined. 14. The apparatus according to claim 13, wherein when an exposure slit of said exposure unit has already entered an exposure area, said controller causes said exposure unit to complete exposure without shielding the shot beam or stopping the emission command even upon determination of the error. 15. The apparatus according to claim 13, wherein said controller automatically selects, upon determination of the error, whether said exposure unit retries exposure and/or executes forced exposure, and causes said exposure unit to execute an exposure sequence without pausing and/or suspending the exposure sequence. 16. The apparatus according to claim 13, wherein said controller determines an error when a current focus measurement value in the exposure shot exceeds a focus or tilt amount set as a threshold for error determination based on a previous measurement value. 17. The apparatus according to claim 16, further comprising a memory for storing an exposure shot position upon determination of the error for each su bstrate. 18. The apparatus according to claim 17, wherein said controller identifies generation of contamination of a wafer chuck on the basis of positional information of the exposure shot stored for each substrate. 19. The apparatus according to claim 18, wherein said controller performs at least one of pausing and suspending an exposure sequence by an exposure unit when contamination of the wafer chuck is identified. 20. The apparatus according to claim 19, wherein said controller has an interface for issuing a warning to an operator when contamination of the wafer chuck is identified. 21. A semiconductor device manufacturing method comprising the steps of: installing, in a semiconductor manufacturing factory, manufacturing apparatuses for performing various processes, including an exposure apparatus which has a stage for aligning a substrate surface to an imaging plane on the basis of a detection signal from a focus sensor, moves the substrate by the stage, transfers a projection pattern, and exposes the substrate, a controller for, when an exposure shot region on the substrate cannot converge to a predetermined precision, determining the exposure shot as an error, and controlling the stage so as to move the substrate to a predetermined position upon determination of the error and an exposure unit for forcibly transferring the projection pattern onto the substrate at the predetermined position in the exposure shot and exposing the substrate; and manufacturing a semiconductor device by using the manufacturing apparatuses in a plurality of processes. 22. The method according to claim 21, further comprising the steps of: connecting the manufacturing apparatuses by a local area network; and communicating information about at least one of the manufacturing apparatuses between the local area network and an external network outside the semiconductor manufacturing factory. 23. The method according to claim 22, further comprising performing one of accessing a database provided by a vendor or user of the exposure apparatus via the external network to obtain maintenance information of the manufacturing apparatus by data communication, and performing production management by data communication between the semiconductor manufacturing factory and another semiconductor manufacturing factory via the external network. 24. A semiconductor manufacturing factory comprising: manufacturing apparatuses for performing various processes including an exposure apparatus which has a stage for aligning a substrate surface to an imaging plane on the basis of a detection signal from a focus sensor, moves the substrate by the stage, transfers a projection pattern, and exposes the substrate, a controller for, when an exposure shot region on the substrate cannot converge to a predetermined precision, determining the exposure shot as an error, and controlling the stage so as to move the substrate to a predetermined position upon determination of the error and an exposure unit for forcibly transferring the projection pattern onto the substrate at the predetermined position in the exposure shot and exposing the substrate; a local area network for connecting said manufacturing apparatuses; and a gateway which allows the local area network to access an external network outside the factory, wherein information about at least one of said manufacturing apparatuses can be communicated. 25. A maintenance method for an exposure apparatus which has a stage for aligning a substrate surface to an imaging plane on the basis of a detection signal from a focus sensor, moves the substrate by the stage, transfers a projection pattern, and exposes the substrate, a controller for, when an exposure shot region on the substrate cannot convert to a predetermined precision, determining the exposure shot as an error, and controlling the stage so as to move the substrate to a predetermined position upon determination of the error and an exposure unit for forcibly transferring the projection pattern onto the substrate at the predetermined position in the exposure shot and exposing the substrate, and is installed in a semiconductor manufacturing factory, said method comprising the steps of: causing a vendor or user of the exposure apparatus to provide a maintenance database connected to an external network of the semiconductor manufacturing factory; authorizing access from the semiconductor manufacturing factory to the maintenance database via the external network; and transmitting maintenance information accumulated in the maintenance database to the semiconductor manufacturing factory via the external network. 26. The apparatus according to claim 1, further comprising a display, a network interface, and a computer for executing network software, wherein maintenance information of the exposure apparatus can be communicated via a computer network. 27. The apparatus according to claim 26, wherein the network software is connected to an external network of a factory in which the exposure apparatus is installed, provides on said display a user interface for accessing a maintenance database provided by a vendor or user of the exposure apparatus, and enables obtaining information from the database via the external network. 28. An exposure apparatus which executes an exposure sequence for exposing through a projection optical system a transfer pattern formed on a master onto a substrate by forming an exposure shot onto the substrate, said apparatus comprising: a detecting unit which detects a surface position of the substrate; a determination unit which determines the exposure shot as an error when a detection result by the detecting unit exceeds a preset allowable value; and an exposure unit which moves the substrate to a predetermined surface position and executes the exposure sequence when the determination unit determines the exposure shot as an error. 29. The exposure apparatus according to claim 28, wherein the predetermined surface position is determined based on one of a global focus measurement and a global tilting measurement obtained in advance of the exposure sequence. 30. The exposure apparatus according to claim 28, wherein said exposure unit forms a plurality of the exposure shots by repeating the exposure sequence, and the predetermined surface position is determined based on a detection result detected from exposed shots. 31. The exposure apparatus according to claim 28, further comprising means for causing an operator to determine subsequent exposure when a number of exposure shots exposed by said exposure unit exceeds a preset allowable value. 32. The exposure apparatus according to claim 28, further comprising means for causing an operator to determine subsequent exposure when shot times exposed by said exposure unit exceed a preset allowable value. 33. The exposure apparatus according to claim 28, further comprising means for judging a contamination condition of a chuck which holds the substrate, based on position information of the exposure shot exposed by moving the substrate to a predetermined surface position by said exposure unit. 34. An exposure apparatus which executes an exposure sequence for exposing through a projection optical system a transfer pattern formed on a master onto a substrate, said apparatus comprising: a detecting unit which detects a surface position of the substrate; and an exposure unit which moves the substrate to a predetermined surface position and executes the exposure sequence when a detection result by said detecting unit exceeds a preset allowable value, wherein the predetermined surface position is determined based on one of a global focus measurement and a global tilting measurement obtained in advance of the exposure sequence. 35. An exposure apparatus which executes an exposure sequence for repeatedly exposing through a projection optical system a transfer pattern formed on a master onto a substrate by formin