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특허 상세정보

MyON담기
내보내기 페이스북 공유 카카오톡 공유

Sample inspection system

특허상세정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) G01N-021/00   
미국특허분류(USC) 356/237.4; 356/237.5
출원번호 US-0746415 (2000-12-21)
발명자 / 주소
출원인 / 주소
대리인 / 주소
    Parsons Hsue & de Runtz LLP
인용정보 피인용 횟수 : 14  인용 특허 : 37
초록
▼

A curved mirrored surface is used to collect radiation scattered by a sample surface and originating from a normal illumination beam and an oblique illumination beam. The collected radiation is focused to a detector. Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams on and off alternately. Beam position error ca...

대표
청구항
▼

A curved mirrored surface is used to collect radiation scattered by a sample surface and originating from a normal illumination beam and an oblique illumination beam. The collected radiation is focused to a detector. Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams on and off alternately. Beam position error ca...

이 특허에 인용된 특허 (37)

  1. Steigmeier Edgar F. (Hedingen CHX) Auderset Heinrich (Horgen CHX). Apparatus and method for detecting defects and dust on a patterned surface. USP1986074598997.
  2. Satake, Toshihiko; Hosaka, Yukio. Apparatus for continuously measuring the degree of milling of grains. USP1985094540286.
  3. Kato Noboru (Hadano JPX) Horai Izuo (Odawara JPX) Kimura Toshihiro (Fujisawa JPX) Koizumi Mitsuyoshi (Yokohama JPX). Apparatus for detecting extraneous substances on a glass plate. USP1993095245403.
  4. Kramer Donald L. (Indian Harbor Springs FL). Apparatus for reflectance measurement of fluorescent radiation and composite useful therein. USP1983074395126.
  5. West Robert N. (Chislehurst GBX). Apparatus for separating specular from diffuse radiation. USP1989084861164.
  6. Shiba Masataka (Yokohama JPX) Uto Sachio (Yokohama JPX) Koizumi Mitsuyoshi (Yokohama JPX). Foreign particle detecting method and apparatus. USP1987064669875.
  7. Uehara, Makoto; Sudo, Takeshi; Kanatani, Fujio. Horizontal position detecting device. USP1985124558949.
  8. Katzir Yigal (Holon ILX). Illumination system and inspection apparatus including same. USP1991105058982.
  9. Hayano Fuminori (Kamakura JPX) Imamura Kazunori (Tokyo JPX) Murata Sunao (Kawasaki JPX). Inspecting apparatus for determining presence and location of foreign particles on reticles or pellicles. USP1990104966457.
  10. Tsuji Toshihiko (Ayase JPX) Takeuchi Seiji (Kawasaki JPX) Miyazaki Kyoichi (Mitaka JPX) Yoshii Minoru (Tokyo JPX) Nose Noriyuki (Atsugi JPX) Mori Tetsuzo (Atsugi JPX). Inspection method and apparatus for inspecting a particle, if any, on a substrate having a pattern. USP1996015486919.
  11. Lin Lawrence H. (Alamo CA) Cavan Daniel L. (Woodside CA) Howe Robert B. (San Jose CA). Inspection system for array of microcircuit dies having redundant circuit patterns. USP199206RE33956.
  12. Morioka Hiroshi (Ebina JPX) Noguchi Minori (Yokohama JPX) Ohshima Yoshimasa (Yokohama JPX) Kembo Yukio (Yokohama JPX) Nishiyama Hidetoshi (Fujisawa JPX) Matsuoka Kazuhiko (Gunma JPX) Shigyo Yoshiharu. Method and apparatus for analyzing the state of generation of foreign particles in semiconductor fabrication process. USP1995105463459.
  13. Eremin Yuri A.,RUX ; Stover John C. ; Scheer Craig A.. Method and apparatus for distinguishing particles from subsurface defects on a substrate using polarized light. USP2001016169601.
  14. Okada Saburo (Kure JPX) Sumimoto Tetsuhiro (Kure JPX) Imade Masaaki (Kure JPX) Miyauchi Hidekazu (Kure JPX). Method and apparatus for inspecting surface conditions. USP1992065125741.
  15. Amir Israel (Ewing NJ) Higgins Frank P. (Ewing NJ). Method and apparatus for inspection of substrates. USP1990054929845.
  16. Sun James J.. Method and apparatus for surface inspection in a chamber. USP1999085940175.
  17. Koizumi Mitsuyoshi (Yokohama JPX) Ohshima Yoshimasa (Yokohama JPX) Tanaka Minoru (Yokohama JPX). Method of and apparatus for detecting foreign substances. USP1988044740079.
  18. Matsumoto Shunichi,JPX ; Shishido Hiroaki,JPX. Method of and apparatus for inspecting reticle for defects. USP2000076084664.
  19. Yamaguchi Kazuo (Sagamihara JPX) Kuni Asahiro (Nakamachi JPX) Akiyama Nobuyuki (Yokohama JPX) Endo Juro (Kumagaya JPX). Method of inspecting microscopic surface defects. USP1984054449818.
  20. Siu Bernard (732 N. Diamond Bar Blvd. Diamond Bar CA 91765). Microelectronics inspection system. USP1995065424838.
  21. Lu Huizong. Optical apparatus for determining the height and tilt of a sample surface. USP1999075929983.
  22. Bowen Arlen J. (Rochester MN) Erickson David L. (Rochester MN) Jewell Daniel W. (Pine Island MN) Koka Venkat R. (Rochester MN). Optical inspection system utilizing wedge shaped spatial filter. USP1992105155372.
  23. Yasutake Masatoshi (Chiba JPX) Fujino Naohiko (Hyogo JPX). Optical scanning system utilizing an atomic force microscope and an optical microscope. USP1997075650614.
  24. Nikoonahad Mehrdad (Menlo Park CA) Rigg Philip R. (Saratoga CA) Wells Keith B. (Santa Cruz CA) Calhoun David S. (Mountain View CA). Optical wafer positioning system. USP1996065530550.
  25. Vaught John L. (Palo Alto CA) Neukermans Armand P. (Palo Alto CA) Keldermann Herman F. (Berkeley CA) Koenig Franklin R. (Palo Alto CA). Particle detection on patterned wafers and the like. USP1990024898471.
  26. Jann Peter C. (Santa Clara CA) Gross Kenneth P. (San Carlos CA) Neukermans Armand P. (Palo Alto CA). Particle detector for rough surfaces. USP1993025189481.
  27. Ido Satoshi (Tokorozawa JPX) Fujinami Minpei (Iruma JPX) Kato Yasuo (Zama JPX) Sakitani Yoshio (Iruma JPX) Ozasa Susumu (Kashiwa JPX). Position detecting system. USP1986054589773.
  28. Vaez-Iravani Mehdi ; Stokowski Stanley ; Zhao Guoheng. Sample inspection system. USP2001036201601.
  29. Nakashige Yukiko (Hyogo JPX) Nishioka Tadashi (Hyogo JPX). Semiconductor wafer inspection apparatus. USP1995115465145.
  30. Vaez-Iravani Mehdi. Single laser bright field and dark field system for detecting anomalies of a sample. USP1998085798829.
  31. Knollenberg Robert G. (Boulder CO). Surface analysis system and method. USP1990014893932.
  32. Allen Nicholas (Bedford MA) Broudour Abdu (West Newton MA) Broude Sergey (Newton Centre MA) Chase Eric (Carlisle MA) Johnson Carl (Tewksbury MA) Miller Pascal (North Chelmsford MA) Ormsby Jay (Salem . Surface displacement detection and adjustment system. USP1997095672885.
  33. Clementi Lee D. ; Fossey Michael E.. Surface inspection system and method of inspecting surface of workpiece. USP1998015712701.
  34. Allen Nicholas C. (Bedford MA) Broude Sergey V. (Newton Centre MA) Chase Eric T. (Nashua NH) Miller Pascal (North Chelmsford MA) Ormsby Jay L. (Salem NH) Rostaing Bruno (Medford MA) Quackenbos Lloyd . Surface pit and mound detection and discrimination system and method. USP1995025389794.
  35. Quackenbos George S. (Newburyport MA) Ormsby Jay L. (Salem NH) Chase Eric T. (Andover MA) Broude Sergey V. (Acton MA) Nishine Koichi (Westford MA). Surface pit detection system and method. USP1988124794265.
  36. Gross Kenneth P. (San Carlos CA) Kren George J. (Los Altos Hills CA) Bevis Christopher F. (San Francisco CA). Surface scanner with thin film gauge. USP1995055416594.
  37. Fossey Michael E. ; Stover John C. ; Clementi Lee D.. Wafer inspection system for distinguishing pits and particles. USP2000096118525.

이 특허를 인용한 특허 피인용횟수: 14

  1. Scipio, Alston Ilford; Ekanayake, Sanji. Compressor bellmouth with a wash door. USP2017069670796.
  2. Meeks, Steven W.; Xu, Xiaoqian; Nguyen, Hung P.; Moghadam, Alireza Shahdoost; Ramachandran, Mahendra Prabhu. Detecting and classifying surface defects with multiple radiation collectors. USP2014098823935.
  3. Meeks,Steven W.. Double sided optical inspection of thin film disks or wafers. USP2007037190447.
  4. Vaez Iravani,Mehdi; Zhao,Guoheng; Stokowski,Stanley E.. Illumination apparatus and methods. USP2008017319229.
  5. Scipio, Alston Ilford; Ekanayake, Sanji. Method, system and apparatus for enhanced off line compressor and turbine cleaning. USP2015048998567.
  6. Bevis,Christopher F.; Dickerson,Gary. Methods and systems for optical and non-optical measurements of a substrate. USP2008047355709.
  7. Lewis, Isabella; Vaez-Iravani, Mehdi. Optical system for detecting anomalies and/or features of surfaces. USP2010037679735.
  8. Lewis,Isabella; Vaez Iravani,Mehdi. Optical system for detecting anomalies and/or features of surfaces. USP2008047365834.
  9. Marxer,Norbert; Gross,Kenneth P.; Altendorfer,Hubert; Kren,George. Process and assembly for non-destructive surface inspections. USP2009017477371.
  10. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng. Sample inspection system. USP2006107119897.
  11. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng. Sample inspection system. USP2006067064821.
  12. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng. Sample inspection system. USP2005056891611.
  13. Vaez Iravani, Mehdi; Biellak, Stephen. Systems and methods for inspecting wafers. USP2009117623229.
  14. Kadkly, Azmi; Biellak, Stephen; Vaez-Iravani, Mehdi. Systems configured to inspect a wafer. USP2010067746459.

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