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Lid assembly for a processing system to facilitate sequential deposition techniques 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H05H-001/00
  • C23C-016/00
출원번호 US-0798251 (2001-03-02)
발명자 / 주소
  • Nguyen, Anh N.
  • Yang, Michael X.
  • Xi, Ming
  • Chung, Hua
  • Chang, Anzhong
  • Yuan, Xiaoxiong
  • Lu, Siqing
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Moser, Patterson & Sheridan
인용정보 피인용 횟수 : 104  인용 특허 : 172

초록

A lid for a semiconductor system, an exemplary embodiment of which includes a support having opposed first and second opposed surfaces. A valve is coupled to the first surface. A baffle plate is mounted to the second surface. The valve is coupled to the support to direct a flow of fluid along a path

대표청구항

A lid for a semiconductor system, an exemplary embodiment of which includes a support having opposed first and second opposed surfaces. A valve is coupled to the first surface. A baffle plate is mounted to the second surface. The valve is coupled to the support to direct a flow of fluid along a path

이 특허에 인용된 특허 (172)

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