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Film processing system 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-016/00
  • G01R-031/26
  • H01L-021/66
출원번호 US-0291871 (1999-04-14)
발명자 / 주소
  • Loan, James F.
  • Salerno, Jack P.
출원인 / 주소
  • CVD Systems, Inc.
대리인 / 주소
    Bowditch & Dewey, LLP
인용정보 피인용 횟수 : 13  인용 특허 : 54

초록 ▼

An apparatus for chemical vapor deposition includes a dispenser for dispensing a precursor to a vaporizer positioned within a vaporization chamber. A delivery conduit joins the vaporization with a process chamber. A flow meter is positioned within the delivery conduit for measuring the flow of precu

대표청구항 ▼

An apparatus for chemical vapor deposition includes a dispenser for dispensing a precursor to a vaporizer positioned within a vaporization chamber. A delivery conduit joins the vaporization with a process chamber. A flow meter is positioned within the delivery conduit for measuring the flow of precu

이 특허에 인용된 특허 (54)

  1. Reisman Arnold (Raleigh) Temple Dorota (Raleigh NC), Alternating cyclic pressure modulation process for selective area deposition.
    상세보기
  2. Gardiner Robin A. (Bethel CT) Van Buskirk Peter (Newtown CT) Kirlin Peter S. (Bethel CT), Apparatus and method for delivering reagents in vapor form to a CVD reactor, incorporating a cleaning subsystem.
    상세보기
  3. Hillman Joseph T. (Scottsdale AZ) Ramsey W. Chuck (Chandler AZ), Apparatus and method for improved delivery of vaporized reactant gases to a reaction chamber.
    상세보기
  4. Barbee Steven G. (Dutchess County NY) Conti Richard A. (Westchester County NY) Kostenko Alexander (Dutchess County NY) Sarma Narayana V. (Dutchess County NY) Wilson Donald L. (Orange County NY) Wong , Apparatus for chemical vapor deposition of aluminum oxide.
    상세보기
  5. Barbee Steven George ; Conti Richard Anthony ; Kostenko Alexander ; Sarma Narayana V. ; Wilson Donald Leslie ; Wong Justin Wai-Chow ; Zuhoski Steven Paul, Apparatus for chemical vapor deposition of aluminum oxide.
    상세보기
  6. Fan Chiko (810 El Quanito Dr. Danville CA 94526) Pearson Anthony (498 Los Pinos Way San Jose CA 95123) Chen J. James (2304 Maximilian Dr. Campbell CA 95008) White ; Jr. James L. (392 Eagle Trace Half, Apparatus for fluid delivery in chemical vapor deposition systems.
    상세보기
  7. Yuuki Akimasa,JPX ; Kawahara Takaaki,JPX ; Makita Tetsuro,JPX ; Yamamuka Mikio,JPX ; Ono Koichi,JPX ; Okudaira Tomonori,JPX, Apparatus for forming thin film by chemical vapor deposition.
    상세보기
  8. Kikkawa Toshihide (Kawasaki JPX) Tanaka Hitoshi (Kawasaki JPX) Ochimizu Hirosato (Kawasaki JPX), Apparatus for generating raw material gas used in apparatus for growing thin film.
    상세보기
  9. Shibuya Munehiro (Katano) Kitagawa Masatoshi (Hirakata) Kamada Takeshi (Ikeda) Hirao Takashi (Moriguchi) Nishizato Hiroshi (Narita JPX), Apparatus for producing a thin film of tantalum oxide.
    상세보기
  10. Klinedinst Keith A. (Marlborough MA) Lester Joseph E. (Lincoln MA), Apparatus for the controlled delivery of vaporized chemical precursor to an LPCVD reactor.
    상세보기
  11. Mihira Hiroshi (Kyoto JPX) Shimizu Tetsuo (Kyoto JPX) Hirahara Kazuhiro (Nigata JPX) Ishihara Toshinobu (Nigata JPX) Takaya Seiki (Kanagawa JPX), Apparatus for vaporizing and supplying organometal compounds.
    상세보기
  12. Page ; Jr. Theron V. (Lake Oswego OR) Boydston Thomas F. (Tualatine OR) Posa John G. (Tigard OR), Apparatus to provide a vaporized reactant for chemical-vapor deposition.
    상세보기
  13. Asaba Tetsuo (Odawara JPX) Makino Kenji (Yokohama JPX), Chemical vapor deposition method for forming a deposited film with the use of a liquid raw material and apparatus suitab.
    상세보기
  14. Benzing Jeffrey C. (Saratoga CA) McInerney Edward J. (San Jose CA) Susoeff Michael N. (San Jose CA), Cyclone evaporator.
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  15. Tomita Munenori (Annaka JPX), Gas feeder.
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  16. Komatsu Shoichi (Suwa JPX) Iwamatsu Seiichi (Suwa JPX), High pressure chemical vapor deposition.
    상세보기
  17. Omori Tsutae (Yamanashi JPX) Harada Kouji (Kumamoto JPX) Satoh Takami (Kumamoto JPX) Anai Noriyuki (Kumamoto JPX) Nomura Masafumi (Kumamoto JPX), Hydrophobic processing apparatus including a liquid delivery system.
    상세보기
  18. Omori Tsutae (Yamanashi-ken JPX) Harada Kouji (Kumamoto-ken JPX) Satoh Takami (Kumamoto-ken JPX) Anai Noriyuki (Kumamoto-ken JPX) Nomura Masafumi (Kumamoto-ken JPX), Hydrophobic treatment method involving delivery of a liquid process agent to a process space.
    상세보기
  19. DeSisto William J. (Alexandria VA) Rappoli Brian J. (Alexandria VA), In-situ monitoring and feedback control of metalorganic precursor delivery.
    상세보기
  20. Frankel Jonathan ; Shmurun Inna ; Sivaramakrishnan Visweswaren ; Fukshansky Eugene, Lid assembly for high temperature processing chamber.
    상세보기
  21. Murakami Seishi (Kofu JPX) Hatano Tatsuo (Nirasaki JPX), Liquid material supply apparatus and method.
    상세보기
  22. Miyamoto Hideaki (Miyanohigashi-machi JPX) Ishikawa Kohichi (Miyanohigashi-machi JPX) Kawano Takeshi (Miyanohigashi-machi JPX), Liquid material-vaporizing and supplying apparatus.
    상세보기
  23. Li Ting Kai ; Scott Dane C., Liquid vaporizer system and method.
    상세보기
  24. Yamaguchi Tooru,JPX ; Tsutahara Kouichirou,JPX ; Suenaga Takayuki,JPX, Liquid vaporizing apparatus.
    상세보기
  25. Sandhu Gurtej S. (Boise ID), Low-pressure chemical vapor deposition process for depositing high-density, highly-conformal titanium nitride films of l.
    상세보기
  26. Lee Gil S. (Baton Rouge LA) Song Joho (Baton Rouge LA), Low-temperature plasma-enhanced chemical vapor deposition of silicon oxide films and fluorinated silicon oxide films usi.
    상세보기
  27. Sivaramakrishnam Visweswaren ; Nguyen Bang C. ; Rao Gayathri ; Robles Stuardo ; Fong Gary L. ; Lim Vicente ; Lee Peter W., Method and apparatus for forming a thin polymer layer on an integrated circuit structure.
    상세보기
  28. Sukharev Valeriy K., Method and apparatus for forming dielectric films.
    상세보기
  29. Pierce John M. (Palo Alto CA) Lehrer William I. (Los Altos CA), Method and apparatus for low pressure chemical vapor deposition.
    상세보기
  30. Vaartstra Brian A. ; Atwell David, Method and apparatus for vaporizing liquid precursors and system for using same.
    상세보기
  31. Kirlin Peter S. (Brookfield) Binder Robin L. (Bethlehem) Gardiner Robin A. (Bethel CT), Method for delivering an involatile reagent in vapor form to a CVD reactor.
    상세보기
  32. Maniar Papu D. (Austin TX) Sitaram Arkalgud R. (Austin TX), Method for forming self-aligned silicide in a semiconductor device using vapor phase reaction.
    상세보기
  33. Nishizato Hiroshi (Kumamoto CA JPX) Sivaramakrishnan Visweswaren (Cupertino CA) Zhao Jun (Milpitas CA), Method for in-situ liquid flow rate estimation and verification.
    상세보기
  34. Nishizato Hiroshi (Kumamoto JPX) Sivaramakrishnan Visweswaren (Cupertino CA) Zhao Jun (Milpitas CA), Method for in-situ liquid flow rate estimation and verification.
    상세보기
  35. Klinedinst Keith A. (Marlborough MA) Lester Joseph E. (Lincoln MA), Method for the controlled delivery of vaporized chemical precursor to an LPCVD reactor.
    상세보기
  36. Barbee Steven G. (Dover Plains NY) Devine Gregory P. (Poughquag NY) Patrick William J. (Newburgh NY) Seeley Gerard (Wappingers Falls NY), Method for vacuum vapor deposition with improved mass flow control.
    상세보기
  37. Shioya Yoshimi (Yokohama JPX) Takagi Mikio (Kawasaki JPX), Method of growing silicate glass layers employing chemical vapor deposition process.
    상세보기
  38. Visser Jan (Eindhoven NLX), Method of providing a substrate with a surface layer from a vapor.
    상세보기
  39. Stauffer Craig M. (3066 Scott Blvd. Santa Clara CA 95054), Module in an integrated delivery system for chemical vapors from liquid sources.
    상세보기
  40. Elliott David J. (Wayland MA) Hollman Richard F. (Chelmsford MA) Yans Francis M. (Concord MA) Singer Daniel K. (Natick MA), Photoreactive surface processing.
    상세보기
  41. Riley Thomas J. (905 Richmar Dr. Westlake OH 44145), Polymeric film coating apparatus.
    상세보기
  42. Diem Michael (Orange CA) Fisk Michael A. (Anaheim CA) Goldman Jon C. (Orange CA), Process for low pressure chemical vapor deposition of refractory metal.
    상세보기
  43. Sarraf David B. (Elizabethtown PA) Miller David L. (State College PA), Rapid response vapor source.
    상세보기
  44. Aslami Mohd A. (Dhahran SAX), Reactants delivery system for optical waveguide manufacturing.
    상세보기
  45. Van Buskirk Peter C. (Newtown CT), Showerhead-type discharge assembly for delivery of source reagent vapor to a substrate, and CVD process utilizing same.
    상세보기
  46. Schaper Charles D., Thermal cycling module and process using radiant heat.
    상세보기
  47. Petro William G. (San Jose CA) Moghadam Farhad (Los Gatos CA), UV transparent oxynitride deposition in single wafer PECVD system.
    상세보기
  48. DuBuske Stanley (Lincroft NJ) Smith Willis M. (Fair Haven NJ) Daly Edward (Keyport NJ) Newman Albert F. (Sun City AZ) Branovich Louis E. (Howell NJ) Hager Adolph G. (Pt. Pleasant NJ), Vacuum deposition method.
    상세보기
  49. Graf Hans-Juergen (Oceanside CA) Fletcher Robert E. (Vista CA) Randtke Peter T. (San Marcos CA) Rhine Bruce E. (Encinitas CA) Monkowski J. R. (Encinitas CA), Vacuum vapor transport control.
    상세보기
  50. Atwell David R. (Boise ID) Westmoreland Donald L. (Boise ID), Vapor delivery system for solid precursors and method regarding same.
    상세보기
  51. McMenamin Joseph C. (Oceanside CA), Vapor mass flow control system.
    상세보기
  52. Sivaramakrishnam Visweswaren (Cupertino CA) Nishizato Hiroshi (Kumamoto CA JPX) Zhao Jun (Milpitas CA) Yokoyama Ichiro (Sakura JPX), Vaporization sequence for multiple liquid precursors used in semiconductor thin film applications.
    상세보기
  53. Shires Michael John (Reading EN) Bush Stephen Frederick (Reading EN), Vaporizing process.
    상세보기
  54. Izumi Hirohiko (Sagamihara JPX), .
    상세보기

이 특허를 인용한 특허 (13)

  1. Marsh, Eugene P.; Atwell, David R., Chemical vaporizer for material deposition systems and associated methods.
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  2. Marsh, Eugene P.; Atwell, David R., Chemical vaporizer for material deposition systems and associated methods.
    상세보기
  3. McLeod, Paul Stephen, Disc vapor lubrication.
    상세보기
  4. Inoue, Mitsuya; Kumagai, Yasunori; Sugita, Kippei, Film forming apparatus.
    상세보기
  5. Shimmura, Satoshi; Fukuoka, Tetsuo; Kitano, Takahiro, Hydrophobicizing apparatus, hydrophobicizing method and storage medium.
    상세보기
  6. McLeod, Paul Stephen, In-line, pass-by system and method for disc vapor lubrication.
    상세보기
  7. Sugita, Kippei; Hashimoto, Hiroyuki; Harada, Muneo, Method for depositing a film and film deposition apparatus.
    상세보기
  8. Lai, Chien-Hsin; Tseng, Tzu-Chin; Chang, Ying-Yi, Method for operating a chemical deposition chamber.
    상세보기
  9. Forrest, Stephen R.; McGraw, Gregory, Nozzle geometry for organic vapor jet printing.
    상세보기
  10. Hong, Jong-Won; Jeong, Min-Jae; Na, Heung-Yeol; Kang, Eu-Gene; Chang, Seok-Rak, Source gas supply unit, and deposition apparatus and method using the same.
    상세보기
  11. Nakada, Takayuki; Sada, Koichi; Matsuda, Tomoyuki, Substrate processing apparatus.
    상세보기
  12. Dhas, Arul; Kelley, Brannon; Guiliani, Jaswinder; Singhal, Akhil, Systems and methods for improving deposition rate uniformity and reducing defects in substrate processing systems.
    상세보기
  13. Smith, Colin F., Systems and methods for pressure-based liquid flow control.
    상세보기

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