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Method of manufacturing microneedle structures using soft lithography and photolithography 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B29C-035/08
  • B29C-033/40
출원번호 US-0808534 (2001-03-14)
발명자 / 주소
  • Arias, Francisco
  • Sherman, Faiz Feisal
  • Owens, Grover David
출원인 / 주소
  • The Procter & Gamble Company
대리인 / 주소
    Hersko, Bart S.
인용정보 피인용 횟수 : 88  인용 특허 : 64

초록

A method for manufacturing microneedle structures is disclosed using soft lithography and photolithography, in which micromold structures made of a photoresist material or PDMS are created. The micromold manufacturing occurs quite quickly, using inexpensive materials and processes. Once the molds ar

대표청구항

A method for manufacturing microneedle structures is disclosed using soft lithography and photolithography, in which micromold structures made of a photoresist material or PDMS are created. The micromold manufacturing occurs quite quickly, using inexpensive materials and processes. Once the molds ar

이 특허에 인용된 특허 (64)

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